Patents by Inventor Katsue Nishikawa

Katsue Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Epoxy resin composition containing unsaturated monomer, curing agent, photoinitiator and epoxy (meth) acrylate
    Patent number: 6277930
    Abstract: The present invention relates to an epoxy resin composition used for cap seal of a hard disc drive spindle motor, which hardly causes outgassing even when using in a hard disc for high-speed rotation and has high reliability. The composition comprises an epoxy resin having at least one glycidyl group in a molecule as a component (A), a monomer having at least one unsaturated bond group in a molecule (polyfunctional vinyl monomer or monofunctional vinyl monomer) as a component (B), an epoxy resin curing agent as a component (C), a photopolymerization initiator as a component (D), and a partially-esterified unsaturated epoxy resin wherein 10-90% of an epoxy equivalent of a bisphenol type epoxy resin is (meth)acrylated as a component (E).
    Type: Grant
    Filed: August 4, 1999
    Date of Patent: August 21, 2001
    Assignee: Loctite Corporation
    Inventor: Katsue Nishikawa
  • Process for preparing photosensitive resin composition
    Patent number: 5565302
    Abstract: The present invention provides a process of preparing a waterborne photosensitive resin composition, free of organic solvent, that can be developed with aqueous alkali solution. The method of the present invention is a process for preparing a waterborne photosensitive resin composition, that can form a photosensitive article developable with aqueous alkali solution, by adding an unsaturated compound, a surfactant and a photoinitiator to an aqueous emulsion, and agitating under conditions sufficient to absorb the unsaturated compound into the polymeric particles of the emulsion and to form a stable waterborne photosensitive resin composition.
    Type: Grant
    Filed: April 21, 1995
    Date of Patent: October 15, 1996
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Hiroshi Samukawa, Katsue Nishikawa, Yoshichi Hagiwara
  • Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same
    Patent number: 5319060
    Abstract: A method of preparing an unsaturated ester resin having improved storage stability is disclosed. An epoxy compound and polymerizable unsaturated monocarboxylic acid are reacted in the presence of a trivalent organic phosphorous catalyst. The catalyst is subsequently deactivated by oxidation. The resin may then be reacted with an acid anhydride.
    Type: Grant
    Filed: June 22, 1993
    Date of Patent: June 7, 1994
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Katsue Nishikawa, Yoshichi Hagiwara
  • Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same
    Patent number: 5281678
    Abstract: A method of preparing an unsaturated ester resin having improved storage stability is disclosed. An epoxy compound and polymerizable unsaturated monocarboxylic acid are reacted in the presence of a trivalent organic phosphorous catalyst. The catalyst is subsequently deactivated by oxidation. The resin may then be reacted with an acid anhydride.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: January 25, 1994
    Assignee: W. R. Grace & Co.
    Inventors: Katsue Nishikawa, Yoshichi Hagiwara