Abstract: There is provided a control apparatus 40 that controls a tilt of a sample, the control apparatus comprising an input section 41 that receives an input of inclination information representing inclination of the sample with respect to a ? axis; an adjustment amount determination section 43 that determines adjustment amounts of a ? value and a ? value for correcting a deviation amount between a scattering vector and a normal line to a sample surface or a lattice plane with respect to a ? value that varies, using the inclination information; and a drive instruction section 47 that drives a goniometer according to ? axis rotation of the sample, based on the determined adjustment amounts of the ? value and the ? value, during an X-ray diffraction measurement.

Abstract: There is provided a control apparatus 40 that controls a tilt of a sample, the control apparatus comprising an input section 41 that receives an input of inclination information representing inclination of the sample with respect to a ? axis; an adjustment amount determination section 43 that determines adjustment amounts of a ? value and a ? value for correcting a deviation amount between a scattering vector and a normal line to a sample surface or a lattice plane with respect to a ? value that varies, using the inclination information; and a drive instruction section 47 that drives a goniometer according to ? axis rotation of the sample, based on the determined adjustment amounts of the ? value and the ? value, during an X-ray diffraction measurement.

Abstract: To provide an X-ray analysis device and a method for optical axis alignment thereof by which measurement time is shortened and measurement cost may be reduced without optical axis alignment at each measurement using an analyzer. The X-ray analysis device includes a sample stage for supporting a sample, an N-dimensional detector, and an analyzer including analyzer crystals. A detection surface of the N-dimensional detector has first and second detection areas, a plurality of optical paths includes a first optical path that directly reaches the first detection area and a second optical path that reaches via the analyzer crystals, and the N-dimensional detector performs a measurement of the first optical path by X-ray detection of the first detection area, and performs a measurement of the second optical path by X-ray detection of the second detection area.

Abstract: An X-ray diffractometer for obtaining X-ray diffraction angles of diffracted X-rays by detecting with an X-ray detector diffracted X-rays diffracted at a sample when X-rays are emitted at the sample at each angle of the angles about a center point of goniometer circles, the X-ray diffractometer having a pinhole member provided with a pinhole, the pinhole allowing X-rays diffracted from the sample to pass so that the diffracted X-rays pass through the center point of the goniometer circle, and other diffracted X-rays are shielded by the pinhole member.

Abstract: To provide an X-ray analysis device and a method for optical axis alignment thereof by which measurement time is shortened and measurement cost may be reduced without optical axis alignment at each measurement using an analyzer. The X-ray analysis device includes a sample stage for supporting a sample, an N-dimensional detector, and an analyzer including analyzer crystals. A detection surface of the N-dimensional detector has first and second detection areas, a plurality of optical paths includes a first optical path that directly reaches the first detection area and a second optical path that reaches via the analyzer crystals, and the N-dimensional detector performs a measurement of the first optical path by X-ray detection of the first detection area, and performs a measurement of the second optical path by X-ray detection of the second detection area.

Abstract: At least two values of an X-ray irradiation width are set for a single specimen. A rocking curve is measured for each of the X-ray irradiation widths. A rocking curve width value is determined for each of the rocking curves. The values of the X-ray irradiation width and the values of the rocking curve width are plotted on a planar coordinate system having a vertical axis representing the rocking curve width value and a horizontal axis representing the X-ray irradiation width value, and a rocking curve width shift line is determined based on the plotted points. A gradient of the rocking curve width shift line is determined. A curvature radius of the specimen is determined based on the gradient. The amount of bowing of a single-crystal substrate under measurement can be measured without a need to move the single-crystal substrate for reliable measurement with a small amount of error.

Abstract: An X-ray diffractometer for obtaining X-ray diffraction angles of diffracted X-rays by detecting with an X-ray detector diffracted X-rays diffracted at a sample when X-rays are emitted at the sample at each angle of the angles about a center point of goniometer circles, the X-ray diffractometer having a pinhole member provided with a pinhole, the pinhole allowing X-rays diffracted from the sample to pass so that the diffracted X-rays pass through the center point of the goniometer circle, and other diffracted X-rays are shielded by the pinhole member.

Abstract: An X-ray analysis apparatus having a function for enabling a plurality of measurement methods to be implemented, the X-ray analysis apparatus having: a measurement system capable of implementing a plurality of measurement methods; measurement software for implementing, in a selective manner, each of the measurement methods; a material evaluation table for storing information relating to a material that may be measured, and a name of an evaluation performed on the material; an input device for inputting the information relating to the material; a wizard program for performing computation for selecting the name of an evaluation on the basis of the information relating to the material inputted using the input device; and a wizard program for selecting a corresponding measurement method on the basis of the selected name of the evaluation.

Abstract: An X-ray intensity correction method makes the background uniform by adjusting a raster element and an X-ray diffractometer. An X-ray intensity correction method for correcting the intensity of diffracted X-rays includes the steps of focusing X-rays on a sample for correction placed at a gonio center, entering fluorescent X-rays excited by the focused X-rays into a raster element formed by polycapillaries and having a unique focal point, detecting the fluorescent X-rays having passed through the raster element; and adjusting the arrangement of the raster element so that the fluorescent X-rays can uniformly be detected regardless of the detecting position. Since fluorescent X-rays are used, it is possible to adjust the position of the raster element because if the focal point of the raster element coincides with the gonio center, the intensity becomes uniform regardless of the detected position.

Abstract: There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.

Abstract: At least two values of an X-ray irradiation width are set for a single specimen. A rocking curve is measured for each of the X-ray irradiation widths. A rocking curve width value is determined for each of the rocking curves. The values of the X-ray irradiation width and the values of the rocking curve width are plotted on a planar coordinate system having a vertical axis representing the rocking curve width value and a horizontal axis representing the X-ray irradiation width value, and a rocking curve width shift line is determined based on the plotted points. A gradient of the rocking curve width shift line is determined. A curvature radius of the specimen is determined based on the gradient. The amount of bowing of a single-crystal substrate under measurement can be measured without a need to move the single-crystal substrate for reliable measurement with a small amount of error.

Abstract: There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.

Abstract: An X-ray beam conditioning device that has a crystal holder and a motor is provided. The crystal holder supports a first crystal block and a second crystal block, each of which diffracts X-ray by a specific diffraction angle. The motor can rotate the crystal holder around an axis extending at right angles to a plane including an optical axis of X-ray and can fixedly support the crystal holder at the rotated position. The crystal holder holds the first and second crystal blocks at such angles to each other such that both crystal blocks diffract X-ray. The optical axes of the two crystal blocks can be adjusted by rotating the crystal holder about the axis, that is, the only one axis.

Abstract: Wavelength dependence of diffraction X-ray intensity of a single crystal sample is measured using an X-ray incident optical system of simple structure so that the polarity of the single crystal sample can be judged. When the polarity of the {111} face of a GaAs single crystal sample (18) is judged, for example, an X-ray source (10) which can generate X-rays in a predetermined wavelength range including in the middle the wavelength at the K absorption end of Ga, i.e. an X-ray source of Au target, is employed. An X-ray beam (12) emitted from that X-ray source is reflected on a paraboloidal multilayer film mirror (14) to form a parallel beam (16) including an X-ray in a predetermined wavelength range. The sample (18) is irradiated with the parallel beam and the intensity of a diffraction X-ray therefrom is detected by an X-ray detector (22). Wavelength dependence of diffraction X-ray intensity is measured in the wavelength range including the wavelength at the absorption end by performing 2?/? scanning.

Abstract: Wavelength dependence of diffraction X-ray intensity of a single crystal sample is measured using an X-ray incident optical system of simple structure so that the polarity of the single crystal sample can be judged. When the polarity of the {111} face of a GaAs single crystal sample (18) is judged, for example, an X-ray source (10) which can generate X-rays in a predetermined wavelength range including in the middle the wavelength at the K absorption end of Ga, i.e. an X-ray source of Au target, is employed. An X-ray beam (12) emitted from that X-ray source is reflected on a paraboloidal multilayer film mirror (14) to form a parallel beam (16) including an X-ray in a predetermined wavelength range. The sample (18) is irradiated with the parallel beam and the intensity of a diffraction X-ray therefrom is detected by an X-ray detector (22). Wavelength dependence of diffraction X-ray intensity is measured in the wavelength range including the wavelength at the absorption end by performing 2?/? scanning.

Abstract: Described herein is an X-ray beam conditioning device that has a crystal holder and a motor. The crystal holder supports a first crystal block and a second crystal block, each of which diffracts X-ray by a specific diffraction angle. The motor can rotate the crystal holder around an axis extending at right angles to a plane including an optical axis of X-ray and can support the crystal holder and fixedly supporting the crystal holder at thus rotated position. The crystal holder holds the first and second crystal blocks at such angles to each other that both crystal blocks diffract X-ray. The optical axes of the two crystal blocks can be adjusted, merely by rotating the crystal holder about said axis, namely only one axis.

Abstract: Reciprocal-space mapping measurement of X-ray diffraction requires setting of the measuring range of 2?/? and setting of the measuring range of ?. When the measuring range of ? is designated in absolute angle, the absolute-angle-designated range is converted into a relative-angle-designated range to be acquired; preventing setting of a warped measuring region. When the measuring range of ? is designated in relative angle, it is acquired as it is. For the measuring range of 2?/?, any one of the absolute-angle-designated range and the relative-angle-designated range may be acquired.

Abstract: The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

Abstract: Reciprocal-space mapping measurement of X-ray diffraction requires setting of the measuring range of 2&thgr;/&ohgr; and setting of the measuring range of &ohgr;. When the measuring range of &ohgr; is designated in absolute angle, the absolute-angle-designated range is converted into a relative-angle-designated range to be acquired; preventing setting of a warped measuring region. When the measuring range of &ohgr; is designated in relative angle, it is acquired as it is. For the measuring range of 2&thgr;/&ohgr;, any one of the absolute-angle-designated range and the relative-angle-designated range may be acquired.

Abstract: The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.