Patents by Inventor Katsuhiko Rindo

Katsuhiko Rindo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8716411
    Abstract: A method of producing an organopolysiloxane compound in which a poly(N-acylalkyleneimine) segment comprising repeating units represented by formula (1): wherein R1 is a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3, is bonded to a terminal end and/or a side chain of an organopolysiloxane segment, the method comprising: a step (a) of subjecting a cyclic imino ether compound represented by formula (I): wherein R1 is a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3, to ring opening polymerization in a solvent, thereby preparing a terminal reactive poly(N-acylalkyleneimine) solution; a step (b) of mixing a modified organopolysiloxane having an amino group at a terminal end and/or a side chain of its molecular chain and a solvent, thereby preparing a modified organopolysiloxane solution; a step (c) of mixing the terminal reactive poly(N-acylalkyleneimine) solution obt
    Type: Grant
    Filed: December 14, 2010
    Date of Patent: May 6, 2014
    Assignee: Kao Corporation
    Inventors: Takashi Kodate, Katsuhiko Rindo, Osamu Takiguchi
  • Publication number: 20120302705
    Abstract: A method of producing an organopolysiloxane compound in which a poly(N-acylalkyleneimine) segment comprising repeating units represented by formula (1): wherein R1 is a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3, is bonded to a terminal end and/or a side chain of an organopolysiloxane segment, the method comprising: a step (a) of subjecting a cyclic imino ether compound represented by formula (I): wherein R1 is a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3, to ring opening polymerization in a solvent, thereby preparing a terminal reactive poly(N-acylalkyleneimine) solution; a step (b) of mixing a modified organopolysiloxane having an amino group at a terminal end and/or a side chain of its molecular chain and a solvent, thereby preparing a modified organopolysiloxane solution; a step (c) of mixing the terminal reactive poly(N-acylalkyleneimine) solution obt
    Type: Application
    Filed: December 14, 2010
    Publication date: November 29, 2012
    Applicant: KAO CORPORATION
    Inventors: Takashi Kodate, Katsuhiko Rindo, Osamu Takiguchi
  • Publication number: 20120296052
    Abstract: A method of producing an organopolysiloxane compound in which a poly(N-acylalkyleneimine) segment comprising repeating units represented by formula (1): is bonded to a terminal end and/or a side chain of an organopolysiloxane segment, the method comprising: a step (a) of subjecting a cyclic imino ether compound represented by formula (I): to ring opening polymerization in a solution thereof which is obtained by mixing the cyclic imino ether compound and a solvent, thereby preparing a solution of a terminal reactive poly(N-acylalkyleneimine); a step (b) of dehydrating a solution which is obtained by mixing a modified organopolysiloxane having an amino group at a terminal end and/or a side chain of its molecular chain and a solvent, such that a water concentration of a mixed solution to be obtained by mixing the solution of the terminal reactive poly(N-acylalkyleneimine) obtained in step (a) and the resultant solution of the modified organopolysiloxane is regulated to be 150 mg/kg or less; and
    Type: Application
    Filed: December 14, 2010
    Publication date: November 22, 2012
    Applicant: KAO CORPORATION
    Inventors: Takashi Kodate, Katsuhiko Rindo, Osamu Takiguchi
  • Publication number: 20080132439
    Abstract: A cleaning agent composition for a treated tool comprising an alkyl glycoside, a glyceryl ether, a hydrocarbon and water, and a cleaning process using the cleaning agent composition. The cleaning agent composition is used upon washing a surface of a silicone-treated tool, a liquid crystal-treated tool, a copper plate, or the like.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 5, 2008
    Inventors: Akito Itoi, Eiji Kashihara, Katsuhiko Rindo, Ryoichi Hashimoto
  • Patent number: 7015182
    Abstract: A detergent composition for cleaning a precision part, comprising an organic solvent, 5 to 30% by weight of a glyceryl ether having an alkyl group or alkenyl group having 4 to 12 carbon atoms, and 5% by weight or more of water. The detergent composition can be used for cleaning a precision part such as a metal part, an electronic part, a semiconductor part or a liquid crystal display panel.
    Type: Grant
    Filed: April 4, 2003
    Date of Patent: March 21, 2006
    Assignee: Kao Corporation
    Inventors: Katsuhiko Rindo, Ryoichi Hashimoto, Masataka Negishi
  • Publication number: 20030191037
    Abstract: A detergent composition for cleaning a precision part, comprising an organic solvent, 5 to 30% by weight of a glyceryl ether having an alkyl group or alkenyl group having 4 to 12 carbon atoms, and 5% by weight or more of water. The detergent composition can be used for cleaning a precision part such as a metal part, an electronic part, a semiconductor part or a liquid crystal display panel.
    Type: Application
    Filed: April 4, 2003
    Publication date: October 9, 2003
    Inventors: Katsuhiko Rindo, Ryoichi Hashimoto, Masataka Negishi
  • Patent number: 6440429
    Abstract: An emulsified, water-in-oil type composition comprises the following components (A), (B), (C) and (D): (A) an oil phase, (B) a high molecular compound having orientation to oil-water interfaces, (C) a lower alcohol, and (D) water. A skin cosmetic preparation containing the emulsified, water-in-oil type composition is also disclosed.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: August 27, 2002
    Assignee: Kao Corporation
    Inventors: Makoto Torizuka, Hirohisa Suzuki, Kana Fujiwara, Takashi Oda, Nobushige Tanaka, Katsuhiko Rindo
  • Patent number: 5853611
    Abstract: The present invention relates to a polyether polymer having structural units represented by general formula (1), wherein R.sup.1 and R.sup.2 mean individually an alkyl group of 1-20 carbon atoms, which may have at least one hydroxyl group, and Y denotes an alkylene group of 1-10 carbon atoms, which may have a hydroxyl group, a preparation process thereof, and a moisturizer, a cosmetic composition and a detergent composition comprising this polymer. The cosmetic composition and detergent composition are excellent in moisture retention, keep up the moisturizing effect over a long period of time and give users a pleasant feeling.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: December 29, 1998
    Assignee: Kao Corporation
    Inventors: Hiroshi Kawamukai, Katsuhiko Rindo, Takashi Oda, Masaaki Moriyama, Hideyuki Hanazawa, Yasushi Kajihara
  • Patent number: 5389288
    Abstract: A liquid crystal display which can provide a homogeneous display by preventing an abnormal orientation of a liquid crystal around the spacers or between the spacers during energization, and which comprises spacer particles each having, at least on the surface thereof, a nonionic hydrophilic unit represented by the following formula (1): ##STR1## wherein R represents a C.sub.1 -C.sub.18 alkyl group, a C.sub.2 -C.sub.18 alkenyl group, a C.sub.6 -C.sub.18 aryl group, a C.sub.7 -C.sub.18 alkylaryl group, a C.sub.1 -C.sub.18 acyl group, a C.sub.2 -C.sub.18 alkylcarbamoyl group, a C.sub.2 -C.sub.18 acylcarbamoyl group or a C.sub.7 -C.sub.18 arylcarbamoyl group; R.sub.1 represents a linear or branched alkylene group having 2 to 4 carbon atoms wherein a hydroxyl group may be substituted for a hydrogen atom on the alkylene group; and m is a positive number of 1 to 100 on the average, with the proviso that the plural R.sub.1 's may be the same or different from each other.
    Type: Grant
    Filed: August 20, 1993
    Date of Patent: February 14, 1995
    Assignee: Kao Corporation
    Inventors: Katsuhiko Rindo, Tadashi Nishimori, Kazuo Kubota, Akira Yoshimatsu
  • Patent number: 5318852
    Abstract: Fine particles of a crosslinked vinyl polymer having a very high compressive modulus of elasticity, i.e., above 550 kg/mm.sup.2 but not higher than 800 kg/mm.sup.2, and being able to be effectively employed as a material capable of maintaining a minute gap constant, and a process for producing the same which comprises polymerizing 100 parts by weight of a vinyl monomer mixture consisting essentially of 20 to 90 parts by weight of m-divinylbenzene, 10 to 60 parts by weight of a vinyl monomer having a nitrile group and 0 to 50 by weight of a vinyl monomer other than m-divinylbenzene and vinyl monomers having a nitrile group in the presence of 3 to 10 parts by weight of a radical polymerization initiator belonging to the organic peroxides, in an aqueous medium.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: June 7, 1994
    Assignee: Kao Corporation
    Inventors: Tadashi Nishimori, Katsuhiko Rindo, Akira Yoshimatsu
  • Patent number: 5231527
    Abstract: A liquid crystal display having a structure such that two sheets of substrates each provided with a transparent electrode and an orientation film are disposed opposite to each other through a spacer particle, which has an elastic modulus in compression of 370 to 550 kg/mm.sup.2 at the 10% displacement of the particle diameter, and a liquid crystal layer is also provided. As a result of this structure for the liquid crystal display, a uniform display quality can be realized through a reduction in the cell gap deviation caused when use is made of a thin sheet substrate.
    Type: Grant
    Filed: January 27, 1992
    Date of Patent: July 27, 1993
    Assignees: Sharp Kabushiki Kaisha, Kao Corporation
    Inventors: Hiroshi Takanashi, Tadashi Nishimori, Katsuhiko Rindo, Akira Yoshimatsu