Abstract: According to an embodiment of the present disclosure, the cleaning apparatus includes a cleaning tank body having a body opening and a cleaning space; a lid provided to be openable and closable with respect to the body opening; a mounting stage provided in the cleaning space placing a shell of a wafer storage container; a first ejector that ejects a cleaning liquid into a storage space of the shell; a second ejector that ejects the cleaning liquid into an outer portion of the shell; a first discharge port that discharges the cleaning liquid ejected into the storage space of the shell; a second discharge port that discharges the cleaning liquid that has passed through the outer portion of the shell; and a particle counter that measures particles in the cleaning liquid discharged by the first discharge port.

Abstract: A wafer transferring apparatus for transferring a plurality of wafers from a first carrier to a second carrier, while the materials are maintained in their predetermined upright arrangement parallel to each other at a predetermined pitch. Each of the first and second carriers accommodates the wafers in a predetermined upright arrangement. A transporting section has a supporting member providing with a plurality of guide grooves arranged at a pitch the same as the predetermined pitch for moving the plurality of wafers up and down between a lowered position and a raised position. The guide grooves of the supporting member are engaged with upper peripheral portions of the respective wafers when the wafers are moved upward or downward. A holding section temporarily holds the plurality of wafers when the plurality of wafers are in their raised position.