Abstract: Sulfonate salts have the formula: R1SO3—CH(Rf)-CF2SO3?M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.

Abstract: A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor.

Abstract: In a driver golf head (1) comprising a face (4) having a hitting surface, a sole (3) forming a lower portion, and a crown (5) forming an upper portion, the sole (3) is improved. The sole (3) in the position close to the face (4) was formed into an elastically deformable recess-projection shape, and part of the face (4) was formed into a projecting shape and integrated with the sole (3) to increase rigidity. Using a configuration with increased rigidity and decreased rigidity between the face (4) and sole to obtain an elastically deformable portion and providing a high-rigidity body (12) increased the repulsion force in the lower portion of the face and extended the traveling distance of the golf ball.

Abstract: Sulfonate salts have the formula: CF3—CH(OCOR)—CF2SO3?M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.

Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer.

Abstract: A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer.

Abstract: A seismic isolation apparatus features damping characteristics equivalent to or better than prior art, without burdening the environment. In this seismic isolation apparatus, a cylindrical cavity portion is formed at the middle of an outer side laminated body, which has a form in which respective pluralities of resiliently deformable rubber rings and metal rings for maintaining rigidity are alternately laminated. A helically formed coil spring is disposed in this cavity portion so as to be snugly fitted. An inner side laminated body, which has a form in which respective pluralities of resiliently deformable rubber plates and metal plates for maintaining rigidity are alternately laminated, is disposed at an inner peripheral side of the coil spring.

Abstract: There is provided an apparatus for measuring forces acted upon a tire in which a radial force and a peripheral force acting to the tire, which are required for the high precision measurement of a friction coefficient on a road surface, are simply measured in a high precision by detecting a magnetic field formed by a magnet fixed to a tread portion of the tire by a magnetic sensor fixed to a rim and measuring the forces acting to the tire from a variant pattern of a magnetic flux density detected un the rotation of the tire and without influencing upon the balance of the tire, which contributes to the high precision measurement of the friction coefficient on the road surface.

Abstract: A golf club is provided in which, whether the loft angle is small or large, backspin is reduced and there is no decrease in carry. A golf club construction is obtained wherein, in a driver club head (1) comprising a face section 4 having a striking surface, a sole section (3) forming the bottom, a crown section (2) forming the top and a back section (3a) forming the back portion, when the loft angle is small, the amount of backspin is reduced and performance is maintained, and even when the loft angle is large, the amount of backspin is reduced and a good carry distance is achieved.

Abstract: Photoacid generators are provided by O-arylsulfonyl-oxime compounds having formula (1) wherein R is H, F, Cl, NO2, alkyl or alkoxy, n is 0 or 1, m is 1 or 2, r is 0 to 4, r? is 0 to 5, k is 0 to 4, and G? and G? are S or —CH?CH—. Chemically amplified resist compositions comprising the photoacid generators have many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, and improved pattern profile after development. Because of high resolution, the compositions are suited for microfabrication, especially by deep UV lithography.

Abstract: Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.

Abstract: Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile after the development; and resist materials and patterning process using them. Provided are sulfonyldiazomethane compounds represented by formula (1): Also provides are photoacid generators containing the sulfonyldiazomethane compounds, and a chemical amplification resist material comprising (A) a resin which changes its solubility in an alkali developer by action of an acid, and (B) a sulfonyldiazomethane compound of formula (1) capable of generating an acid by exposure to radiation. Provided is a patterning process comprising steps of applying the above-described resist material onto a substrate to form a coating, heating the coating, exposing the coating, and developing the exposed coating in a developer after an optional heat treatment.

Abstract: Photoacid generators have formula (1) wherein R1 and R2 are alkyl, or R1 and R2, taken together, may form a C4-C6 ring structure with sulfur, R is hydrogen or alkyl, R′ is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y− is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness.

Abstract: In a driver golf head (1) comprising a face (4) having a hitting surface, a sole (3) forming a lower portion, and a crown (5) forming an upper portion, the sole (3) is improved. The sole (3) in the position close to the face (4) was formed into an elastically deformable recess-projection shape, and part of the face (4) was formed into a projecting shape and integrated with the sole (3) to increase rigidity. Using a configuration with increased rigidity and decreased rigidity between the face (4) and sole to obtain an elastically deformable portion and providing a high-rigidity body (12) increased the repulsion force in the lower portion of the face (4) and extended the traveling distance of the golf ball.

Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: A golf club is provided in which, whether the loft angle is small or large, backspin is reduced and there is no decrease in carry. A golf club construction is obtained wherein, in a driver club head (1) comprising a face section 4 having a striking surface, a sole section (3) forming the bottom, a crown section (2) forming the top and a back section (3a) forming the back portion, when the loft angle is small, the amount of backspin is reduced and performance is maintained, and even when the loft angle is large, the amount of backspin is reduced and a good carry distance is achieved.

Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: Herein disclosed is an image fiber imaging apparatus comprising an image guide fiber bundle having a plurality of optical fibers, a receiving end, at which one ends of said optical fibers are arranged, and a transmitting end, at which other ends of said optical fibers are arranged, said receiving end being directed to an object to receive an image of said object, said optical fibers transmitting said image received at said receiving end to said transmitting end, said image including a plurality of image portions, each corresponding to one of said optical fibers; a solid-state imaging device arranged at said transmitting end of said image guide fiber bundle for converting said image including a plurality of image portions transmitted by said optical fibers of said image guide fiber bundle into an image signal; an electrical spatial filter for filtering said image signal converted by said solid-state imaging device to output a filtered image signal; and a display unit for displaying said filtered image signal o