Patents by Inventor Katsuhiro Matsumoto
Katsuhiro Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230359199Abstract: Various embodiments of the present disclosure provide an augmented reality (AR) vessel maneuvering system and method capable of intuitively and easily setting at least one of: a target position and an attitude of a vessel. The AR vessel maneuvering system includes processing circuitry configured to generate an image including a vessel object representing a vessel in a region corresponding to a viewpoint position and a line-of-sight direction, superimpose and display the image including the vessel object on an outside scene of the region corresponding to the viewpoint position and the line-of-sight direction, detect an operation on the vessel object displayed in the image, and output a command to a navigation device used for navigating the vessel to execute a navigation operation corresponding to the operation on the vessel object. The navigation device is a marine navigation device.Type: ApplicationFiled: July 12, 2023Publication date: November 9, 2023Inventors: Satoshi ADACHI, Eisuke SEKINE, Katsuhiro SUZUKI, Koji ATSUMI, Daisuke Matsumoto
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Patent number: 8544056Abstract: An image control apparatus is configured to input a plurality of image data associated with a plurality of image sources and to display a plurality of images on a same screen based on the plurality of image data. The image control apparatus includes an image quality determining unit configured to determine respective image qualities of the plurality of images based on a combination of image information associated with attributes of the plurality of image sources, and an image processing unit configured to process the plurality of image data to cause the plurality of images to have the respective image qualities determined by the image quality determining unit.Type: GrantFiled: October 31, 2007Date of Patent: September 24, 2013Assignee: Canon Kabushiki KaishaInventors: Tomoyuki Ohno, Takashi Yamamoto, Yuichi Matsumoto, Tomoyasu Yoshikawa, Teruki Kikkawa, Satoshi Hanamitsu, Tomoya Asanuma, Katsuhiro Miyamoto
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Publication number: 20120251760Abstract: A method for producing a glass substrate for a magnetic disk involving the use of a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.Type: ApplicationFiled: September 26, 2011Publication date: October 4, 2012Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Mizuho ISHIDA, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
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Patent number: 8092280Abstract: The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or morType: GrantFiled: December 1, 2009Date of Patent: January 10, 2012Assignee: Asahi Glass Company, LimitedInventors: Mizuho Ishida, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
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Publication number: 20100136372Abstract: The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or morType: ApplicationFiled: December 1, 2009Publication date: June 3, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Mizuho ISHIDA, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
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Publication number: 20090304976Abstract: A method for producing a glass substrate for magnetic disk, which is capable of effectively removing a crack is provided. In the method for producing a glass substrate for magnetic disk, there were provided a preparation step 1 of preparing a circular glass substrate having a main surface, a back surface opposing to the main surface, an inner side surface defining a through-hole penetrating from the main surface to the back surface and an outer side surface opposing to the inner side surface; a pre-polishing step 2A of polishing the inner side surface and the outer side surface of the glass substrate; a lapping step 3 of lapping the polished glass substrate; and a post-polishing step 2B of polishing the inner side surface and the outer side surface of the lapped glass substrate.Type: ApplicationFiled: July 16, 2009Publication date: December 10, 2009Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Katsuhiro MATSUMOTO, Kazuo MANNAMI
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Patent number: 6475575Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.Type: GrantFiled: August 6, 2001Date of Patent: November 5, 2002Assignee: Asahi Glass Company, LimitedInventors: Yoshiaki Ikuta, Shinya Kikugawa, Hitoshi Mishiro, Hiroshi Arishima, Kaname Okada, Katsuhiro Matsumoto
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Patent number: 4728764Abstract: A discharge gap measuring circuit measures the gap between a machining electrode and a workpiece in an electric discharge machining apparatus which uses a pulsed voltage as input. The circuit includes peak detecting means to measure the peak value of the voltage that develops between the machining electrode and the workpiece. Further, waiting time detecting means measure the time from the beginning of the input electrical pulse to the actual start of the discharge. An adder circuit combines the outputs of the two detecting circuits to produce a voltage representative of the actual gap. The output is used for controlling the position of the workpiece or the electrode to maintain the gap at a constant level so that a uniform workpiece finish and accelerated operation is obtained.Type: GrantFiled: January 31, 1985Date of Patent: March 1, 1988Assignee: NEC CorporationInventors: Katsuhiro Matsumoto, Akira Fujii