Patents by Inventor Katsuhiro Matsumoto

Katsuhiro Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12156475
    Abstract: A piezoelectric device includes a substrate having opening portions, a vibrating plate provided to overlap with the substrate and having a plurality of vibrating regions overlapping with the opening portions in a plan view as seen from a thickness direction of the substrate, piezoelectric elements provided in the vibrating regions, and bypass wires provided outside of the vibrating regions of the vibrating plate and electrically coupled to the plurality of piezoelectric elements, wherein slits penetrating the bypass wires in the thickness direction are provided in the bypass wires.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: November 26, 2024
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Chikara Kojima, Koji Ohashi, Hironori Suzuki, Kanechika Kiyose, Katsuhiro Imai, Yasuyuki Matsumoto, Takahiro Kamijo
  • Publication number: 20120251760
    Abstract: A method for producing a glass substrate for a magnetic disk involving the use of a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
    Type: Application
    Filed: September 26, 2011
    Publication date: October 4, 2012
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Mizuho ISHIDA, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
  • Patent number: 8092280
    Abstract: The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or mor
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: January 10, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Mizuho Ishida, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
  • Publication number: 20100136372
    Abstract: The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 ?m and has a thickness of 400 ?m or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 ?m or less and has a thickness of 50 to 250 ?m, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 ?m or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or mor
    Type: Application
    Filed: December 1, 2009
    Publication date: June 3, 2010
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Mizuho ISHIDA, Norihito Shida, Katsuhiro Matsumoto, Kazuo Mannami
  • Publication number: 20090304976
    Abstract: A method for producing a glass substrate for magnetic disk, which is capable of effectively removing a crack is provided. In the method for producing a glass substrate for magnetic disk, there were provided a preparation step 1 of preparing a circular glass substrate having a main surface, a back surface opposing to the main surface, an inner side surface defining a through-hole penetrating from the main surface to the back surface and an outer side surface opposing to the inner side surface; a pre-polishing step 2A of polishing the inner side surface and the outer side surface of the glass substrate; a lapping step 3 of lapping the polished glass substrate; and a post-polishing step 2B of polishing the inner side surface and the outer side surface of the lapped glass substrate.
    Type: Application
    Filed: July 16, 2009
    Publication date: December 10, 2009
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Katsuhiro MATSUMOTO, Kazuo MANNAMI
  • Patent number: 6475575
    Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: November 5, 2002
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Hitoshi Mishiro, Hiroshi Arishima, Kaname Okada, Katsuhiro Matsumoto
  • Patent number: 4728764
    Abstract: A discharge gap measuring circuit measures the gap between a machining electrode and a workpiece in an electric discharge machining apparatus which uses a pulsed voltage as input. The circuit includes peak detecting means to measure the peak value of the voltage that develops between the machining electrode and the workpiece. Further, waiting time detecting means measure the time from the beginning of the input electrical pulse to the actual start of the discharge. An adder circuit combines the outputs of the two detecting circuits to produce a voltage representative of the actual gap. The output is used for controlling the position of the workpiece or the electrode to maintain the gap at a constant level so that a uniform workpiece finish and accelerated operation is obtained.
    Type: Grant
    Filed: January 31, 1985
    Date of Patent: March 1, 1988
    Assignee: NEC Corporation
    Inventors: Katsuhiro Matsumoto, Akira Fujii