Abstract: A projector modulates light emitted from a light source and projects the light, the projector including an image acquiring unit, a modulating unit, a light adjusting mechanism, and a light adjusting control unit. The image acquiring unit acquires an image from an image source. The modulating unit modulates the light emitted from the light sources, based on the image acquired by the image acquiring unit. The light adjustment mechanism reduces an amount of light incident on the modulating unit from the light source. The light adjustment control unit performs light adjustment control by the light adjustment mechanism, based on the image acquired by the image acquiring unit. The light adjustment control unit performs control to increase the amount of light incident of the modulating unit when the light adjustment mechanism maintains a predetermined light-adjusted state.

Abstract: A projector modulates light emitted from a light source and projects the light, the projector including an image acquiring unit, a modulating unit, a light adjusting mechanism, and a light adjusting control unit. The image acquiring unit acquires an image from an image source. The modulating unit modulates the light emitted from the light sources, based on the image acquired by the image acquiring unit. The light adjustment mechanism reduces an amount of light incident on the modulating unit from the light source. The light adjustment control unit performs light adjustment control by the light adjustment mechanism, based on the image acquired by the image acquiring unit. The light adjustment control unit performs control to increase the amount of light incident of the modulating unit when the light adjustment mechanism maintains a predetermined light-adjusted state.

Abstract: A projector which modulates light emitted from a light source and projects the light, the projector including: an image acquiring unit for acquiring an image from an image source; a modulating unit for modulating the light emitted from the light sources, based on the image acquired by the image acquiring unit; a light adjustment mechanism for reducing an amount of light incident on the modulating unit from the light source; and a light adjustment control unit for performing light adjustment control by the light adjustment mechanism, based on the image acquired by the image acquiring unit; wherein the light adjustment control unit stops execution of the light adjustment control when at least one of an operating state of the projector and a state of the image acquired by the image acquiring unit meets a predetermined condition.

Abstract: A projector includes: a housing; an optical element accommodated in the housing; and an air supply unit configured to generate a flow of cooling air for cooling a cooling target element including the optical element, a dustproof area into which the cooling air can be introduced from the outside of the housing via a dustproof filter is formed inside the housing, the optical element is accommodated in the dustproof area of the housing, and the air supply unit includes a first air supply unit configured to introduce the cooling air from the outside of the housing to the dustproof area via the dustproof filter, and a second air supply unit accommodated in the dustproof area and configured to supply the cooling air introduced to the dustproof area by the first air supply unit toward the optical element.

Abstract: A projector which modulates light emitted from a light source and projects the light, the projector including: an image acquiring unit for acquiring an image from an image source; a modulating unit for modulating the light emitted from the light sources, based on the image acquired by the image acquiring unit; a light adjustment mechanism for reducing an amount of light incident on the modulating unit from the light source; and a light adjustment control unit for performing light adjustment control by the light adjustment mechanism, based on the image acquired by the image acquiring unit; wherein the light adjustment control unit stops execution of the light adjustment control when at least one of an operating state of the projector and a state of the image acquired by the image acquiring unit meets a predetermined condition.

Abstract: A projector includes: a housing; an optical element accommodated in the housing; and an air supply unit configured to generate a flow of cooling air for cooling a cooling target element including the optical element, a dustproof area into which the cooling air can be introduced from the outside of the housing via a dustproof filter is formed inside the housing, the optical element is accommodated in the dustproof area of the housing, and the air supply unit includes a first air supply unit configured to introduce the cooling air from the outside of the housing to the dustproof area via the dustproof filter, and a second air supply unit accommodated in the dustproof area and configured to supply the cooling air introduced to the dustproof area by the first air supply unit toward the optical element.

Abstract: A cantilever for use in a scanning probe microscope includes a lever portion having a probe portion made from a semiconductor substrate. The length and thickness directions of the lever portion are parallel to a top surface of the semiconductor substrate, and a width direction of the lever portion corresponds to a thickness direction of the semiconductor substrate. The probe portion is triangular or substantially triangular pyramid shaped having three faces, two of which are made of crystal and a remaining one of which is formed by an artificial process.

Abstract: A conductive cantilever having a conductive probe on its free end is supported by a piezoelectric element, which oscillates upon reception of an AC voltage from a first AC voltage supply unit. An AC voltage is applied between a conductive sample and the probe by a variable DC voltage supply unit and a second AC voltage supply unit. An AM demodulator demodulates a signal from a displacement meter at an angular frequency of the first AC voltage supply unit. A lowpass filter extracts a DC component from an output signal from the AM demodulator, and a synchronism detector extracts a component concerning to the angular frequency twice as high as that of the second AC voltage supply unit from the AM demodulator output signal. A Z controller controls a position of a tube scanner based on an output signal from the subtracter which subtracts an output signal of the synchronism detector from an output signal of the lowpass filter.

Abstract: A scanning probe microscope for measuring the electrical properties of the surface of a sample comprises a first sensor for detecting electrical information for the sample surface and outputting a first electrical signal corresponding thereto, the first sensor including an electrically conductive probe located near the surface of the sample, a second sensor for detecting the distance between the probe and the sample and outputting a second electrical signal corresponding thereto, an actuator for relatively moving the probe and the sample in a three-dimensional manner, a servo control mechanism for adjusting the distance between the probe and the sample to a desired value by servo control in accordance with the second electrical signal while the electrical information is being detected by the first sensor, and a processing unit for processing the first electrical signal.

Abstract: An SPM cantilever comprises a cantilever portion shaped as a thin plate and extending between a proximal end and a free end, a supporting portion attached to one surface of the cantilever portion on a side of the proximal end, and a probe projecting from the other surface of the cantilever portion on a side of the free end of the cantilever portion the supporting member, and the cantilever portion and the probe are made of different materials.

Abstract: A composite silicon-on-insulator substrate comprises first and second substrates and an oxide film interposed between them. The second substrate is partially removed, such that a lever-base section is formed. An oxide film is formed on the sides of the lever-base section. The second substrate has its thickness set to a predetermined value by wet anisotropic etching, such that a pre-lever section is formed and such that a probe-base section is formed at one end of the pre-lever section. An oxide film is formed on the pre-lever section and the probe-base section, such that a lever section with a desired thickness and a probe section with a sharpened tip are formed. A part of the first substrate is etched away, such that a support section is formed. The oxide film covering the lever section and the probe section is removed.

Abstract: A cantilever chip comprises a support section having a support face and an attachment face opposed to the support face, a cantilever supported on the support face of the support section, and a probe provided on a free-end portion of the cantilever. The width of the support face of the support section is less than the width of the attachment face such that a pointed end portion of the probe may scan a desired portion of a sample without influence due to the shape of a surface of the sample. First and second inclined faces extending in the longitudinal direction of the cantilever are formed between the support face and the attachment face.

Abstract: A piezoresistive layer extends in the middle of a cantilever extending from a support section. The cantilever is made of n type silicon and is covered with a silicon oxide film. Electrodes are connected to the both ends of the piezoresistive layer. A p type silicon region is formed at the free end of the cantilever, and includes a sharply pointed portion to provide a probe. An electrode is connected to a p.sup.+ type silicon region formed in the p type silicon region, and an electrode is connected to an n.sup.+ type silicon region formed in a position more than 10 .mu.m apart from the p type silicon region. A rectangular through hole is formed in the cantilever between the piezoresistive layer and the probe.

Abstract: An integrated AFM sensor includes a cantilever which has two beams extending from a support portion. The beams are integrated with each other at their ends to form a triangular free end, and a probe having a sharp distal end is arranged at the free end. The cantilever is formed by stacking a passivation layer, a piezoresistive layer, and a silicon layer. Electrodes electrically connected to the piezoresistive layer are formed at the fixed end of the cantilever through contact holes.

Abstract: A cantilever chip has a holding substrate, and a cantilever having the shape of a hollow triangle extends from the holding substrate. A probe is arranged at the distal end portion of the cantilever. An axis of the probe is inclined at a predetermined angle with respect to a normal extending from the surface of the cantilever. This angle is set such that the axis of the probe is perpendicular to a sample surface when the cantilever chip is mounted on an atomic force microscope.

Abstract: A cantilever chip has a hold substrate and a film member bonded to the substrate. The film member has a rectangular cantilever portion and a triangular cantilever portion having an inner portion removed. These portions are formed by patterning. Each of the portions has an end fixed to the hold substrate, and a free end provided with a probe. The film member has an alignment end used as a mark to determine the position of the side end face of the hold substrate at the time of the film being bonded to the substrate. The alignment end is divided by notches into the cantilever portions.