Patents by Inventor Katsuhiro Uehara

Katsuhiro Uehara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11279718
    Abstract: A method for producing an ureido group-containing organosilicon compound includes the following steps (I) and (II): (I): a step of obtaining a compound represented by formula (1) by reacting urea and an amino group-containing organosilicon compound represented by formula (3): wherein R1 represents an alkyl group having 1 to 10 carbon atoms or the like, R3 represents a hydrogen atom or the like, Me represents a methyl group, m represents an integer of 1 to 3, and n represents an integer of 1 to 12, wherein R2 represents a hydrogen atom or the like, and R1, Me, m, and n represent the same meaning as described above; and (II): a step of further reacting by supplying the amino group-containing organosilicon compound represented by formula (3) to a mixture containing a compound represented by formula (1) and urea.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: March 22, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Munenao Hirokami, Katsuhiro Uehara, Toru Iijima
  • Publication number: 20200087327
    Abstract: A method for producing an ureido group-containing organosilicon compound includes the following steps (I) and (II): (I): a step of obtaining a compound represented by formula (1) by reacting urea and an amino group-containing organosilicon compound represented by formula (3): wherein R1 represents an alkyl group having 1 to 10 carbon atoms or the like, R3 represents a hydrogen atom or the like, Me represents a methyl group, m represents an integer of 1 to 3, and n represents an integer of 1 to 12, wherein R2 represents a hydrogen atom or the like, and R1, Me, m, and n represent the same meaning as described above; and (II): a step of further reacting by supplying the amino group-containing organosilicon compound represented by formula (3) to a mixture containing a compound represented by formula (1) and urea.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 19, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Munenao HIROKAMI, Katsuhiro UEHARA, Toru IIJIMA
  • Patent number: 9193597
    Abstract: The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R? (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R? is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR?)4-x (wherein R and R? are each an alkyl group having 1 to 20 carbon atoms).
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: November 24, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Nagai, Takaaki Shimizu, Katsuhiro Uehara, Tohru Kubota
  • Publication number: 20120121493
    Abstract: The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R? (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R? is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR?)4-x (wherein R and R? are each an alkyl group having 1 to 20 carbon atoms).
    Type: Application
    Filed: July 7, 2010
    Publication date: May 17, 2012
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Nagai, Takaaki Shimizu, Katsuhiro Uehara, Tohru Kubota
  • Publication number: 20100119744
    Abstract: Disclosed are an ophthalmic lens, a cell or organ culture substrate, a container for a biological material and a transparent gel which have excellent wetting and sticking properties and do not require any surface treatment. An ophthalmic lens, cell or organ culture substrate, container for a biological material or transparent gel produced by polymerizing a cyclic siloxane compound represented by the formula (A): (A) wherein Ra are Rb independently represent a hydrogen or a monovalent hydrocarbon group which may be substituted by a fluorine; Rc represents an alkyl group having 1 to 6 carbon atoms or a phenyl group; X represents an organic group having an aliphatic unsaturated bond therein; and n is an integer of 1 to 10.
    Type: Application
    Filed: June 6, 2006
    Publication date: May 13, 2010
    Inventors: Yasuhiro Yokoyama, Toshimasa Sugie, Tohru Kubota, Katsuhiro Uehara
  • Publication number: 20090068081
    Abstract: This method for purifying chlorosilanes includes: introducing oxygen (O2) into the chlorosilanes containing a boron impurity and a phosphorous impurity in the presence of an aromatic aldehyde; treating the chlorosilanes to convert the impurities into high boiling compounds at the same time; and subjecting the chlorosilanes after having been treated to a distillation process or the like to separate the high boiling compounds of boron and phosphorous from the chlorosilanes. The high boiling compounds produced through the above described treatment are not decomposed into low boiling compounds by the heat applied after the high boiling compounds having been produced, so that the high boiling compounds can be easily separated from the chlorosilanes through treatment such as distillation. Accordingly, the boron impurity and the phosphorous impurity can be removed with a single process.
    Type: Application
    Filed: September 4, 2008
    Publication date: March 12, 2009
    Applicant: Shin -Etsu Chemical Co., Ltd.
    Inventors: Katsuhiro UEHARA, Tohru Kubota, Mitsuyoshi Osima
  • Patent number: 7405491
    Abstract: There is provided an electric power generating device which includes a generator which is constituted by an interior permanent magnet (IPM) synchronous generator, and is connected to a steam turbine without interposition of a reduction gear, cooling means which flows a liquid coolant used to cool the generator, and a frequency converter which converts an electric power generated by the generator into an electric power at a commercial frequency, and outputs the converted electric power, the cooling means includes a circulation passage to which a tank which is used to store the liquid coolant (oil), a cooler which cools the liquid coolant, and a pump which pressure-feeds the liquid coolant are connected, and through which the liquid coolant circulates, and this configuration enables the generator to operate at a high rotational speed, thereby efficiently utilizing the steam energy.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: July 29, 2008
    Assignee: Kobe Steel, Ltd.
    Inventors: Masaki Matsukuma, Yasuo Fukushima, Toshikazu Miyaji, Katsuhiro Uehara
  • Patent number: 7279589
    Abstract: A 1-(alkoxysilyl)ethyl-1,1,3,3-tetramethyldisiloxane is prepared by adding a vinyl-containing alkoxysilane in portions to 1,1,3,3-tetramethyldisiloxane in the presence of a rhodium compound, and effecting reaction.
    Type: Grant
    Filed: August 11, 2006
    Date of Patent: October 9, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuhiro Uehara, Tohru Kubota
  • Patent number: 7208263
    Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: April 24, 2007
    Assignee: Toray Industries, Inc.
    Inventors: Kumiko Asato, Shinji Tanaka, Toshiki Kito, Katsuhiro Uehara
  • Patent number: 7189868
    Abstract: Novel cyclic siloxane compounds have both an aliphatic unsaturation-containing organic group and fluorinated alkyl groups within the molecular structure. When used to form silicone fluids and rubbers, they are useful as a modifier for giving novel physical properties thereto and when used as polymerizable monomers, they are effective for improving the performance of polymers or forming polymers with novel physical properties.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: March 13, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuhiro Uehara, Tohru Kubota
  • Publication number: 20070037997
    Abstract: A 1-(alkoxysilyl)ethyl-1,1,3,3-tetramethyldisiloxane is prepared by adding a vinyl-containing alkoxysilane in portions to 1,1,3,3-tetramethyldisiloxane in the presence of a rhodium compound, and effecting reaction.
    Type: Application
    Filed: August 11, 2006
    Publication date: February 15, 2007
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuhiro Uehara, Tohru Kubota
  • Publication number: 20070035137
    Abstract: There is provided an electric power generating device which includes a generator which is constituted by an interior permanent magnet (IPM) synchronous generator, and is connected to a steam turbine without interposition of a reduction gear, cooling means which flows a liquid coolant used to cool the generator, and a frequency converter which converts an electric power generated by the generator into an electric power at a commercial frequency, and outputs the converted electric power, the cooling means includes a circulation passage to which a tank which is used to store the liquid coolant (oil), a cooler which cools the liquid coolant, and a pump which pressure-feeds the liquid coolant are connected, and through which the liquid coolant circulates, and this configuration enables the generator to operate at a high rotational speed, thereby efficiently utilizing the steam energy.
    Type: Application
    Filed: July 10, 2006
    Publication date: February 15, 2007
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Masaki Matsukuma, Yasuo Fukushima, Toshikazu Miyaji, Katsuhiro Uehara
  • Publication number: 20060264649
    Abstract: Novel cyclic siloxane compounds have both an aliphatic unsaturation-containing organic group and fluorinated alkyl groups within the molecular structure. When used to form silicone fluids and rubbers, they are useful as a modifier for giving novel physical properties thereto and when used as polymerizable monomers, they are effective for improving the performance of polymers or forming polymers with novel physical properties.
    Type: Application
    Filed: May 18, 2006
    Publication date: November 23, 2006
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuhiro Uehara, Tohru Kubota
  • Patent number: 7078150
    Abstract: Disclosed is a photosensitive resin printing plate material, which comprises at least a support, a photosensitive resin layer and a photocoloring layer, and in which the photocoloring layer is UV-transmissive before colored, and is colored through exposure to light having a wavelength of from 450 to 1500 nm to be substantially UV-non-transmissive. This is transparent and can reproduce any fine relief, not requiring an original picture film.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: July 18, 2006
    Assignee: Toray Industries, Inc.
    Inventors: Shinji Tanaka, Katsuhiro Uehara
  • Publication number: 20040182266
    Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.
    Type: Application
    Filed: December 30, 2003
    Publication date: September 23, 2004
    Inventors: Kumiko Asato, Shinji Tanaka, Toshiki Kito, Katsuhiro Uehara
  • Patent number: 6712081
    Abstract: A pressure processing device including a vessel having a body and an opening/closing member. A seal member is provided on a joining surface between the body and the opening/closing member, and a non-sliding joining surface is provided which is not slidably moved when the member is opened and closed. A device is provided including a diaphragm for housing an object to be processed, and a fluid introducing passage to the vessel provided so that a greater part of a fluid flowing into the vessel flows into the diaphragm. The diaphragm can be formed of heat insulating material, and a filter can be provided for removing particles installed on the side of the diaphragm into which a fluid flows. A plate having a labyrinth construction can be provided for trapping particles by parts on a surface thereof. A pressure processing device in which an object may be washed is also provided.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: March 30, 2004
    Assignee: Kobe Steel, Ltd.
    Inventors: Katsuhiro Uehara, Yoshihiko Sakashita, Takeshi Kanda, Takeo Nishimoto
  • Patent number: 6364953
    Abstract: A method for making an aerogel film includes the steps of performing a gelation reaction of a metal alkoxide on a substrate to prepare a substrate with a wet-gel film, and converting the wet-gel film into an aerogel film by a supercritical or sub-critical drying process of the substrate with the wet-gel film, wherein the degree of gelation of the wet-gel film is controlled to be a predetermined value at the start of the supercritical or sub-critical drying process. Aerogel films having uniform qualities are produced by the supercritical or sub-critical drying process in one lot.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: April 2, 2002
    Assignee: Kabushiki Kaisha Kobe Seiko Sho.
    Inventors: Nobuyuki Kawakami, Yoshito Fukumoto, Kenichi Inoue, Kohei Suzuki, Takashi Kinoshita, Katsuhiro Uehara
  • Patent number: 6334935
    Abstract: A (meth)acryloxy-bearing alkoxysilane is isolated and purified to a high purity by distilling a reaction solution containing the (meth)acryloxy-bearing alkoxysilane in a thin-layer distillation device at a temperature of 90-160° C. and a vacuum of 1-15 mmHg. The resulting alkoxysilane product does not give rise to the quality problem that the product will gradually whiten during storage owing to contact with air. The occurrence of self-polymerization of the alkoxysilane is restrained.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: January 1, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuhiro Uehara, Mikio Endo, Tohru Kubota, Satoshi Uchida, Kanji Murofushi
  • Publication number: 20010050217
    Abstract: A (meth)acryloxy-bearing alkoxysilane is isolated and purified to a high purity by distilling a reaction solution containing the (meth)acryloxy-bearing alkoxysilane in a thin-layer distillation device at a temperature of 90-160° C. and a vacuum of 1-15 mmHg. The resulting alkoxysilane product does not give rise to the quality problem that the product will gradually whiten during storage owing to contact with air. The occurrence of self-polymerization of the alkoxysilane is restrained.
    Type: Application
    Filed: June 18, 1999
    Publication date: December 13, 2001
    Inventors: KATSUHIRO UEHARA, MIKIO ENDO, TOHRU KUBOTA, SATOSHI UCHIDA, KANJI MUROFUSHI
  • Patent number: 5698029
    Abstract: A high-pressure container 1 as a furnace casing is equipped with insulating cylinder 2 of an inverted glass shape, and heater elements 18 individually mounted on heater mounting plates 16 arranged in parallel to section vertically the space for arranging the heater elements 18 at a given interval in the insulating cylinder 2.For the procedures of single crystal growth by heating in a high-pressure gas atmosphere, the insulating cylinder 2 and the heater mounting plates 16 can suppress the effects of spontaneous convection of a high-pressure gas and the effects of the radiation heat from an adjacent heater element, as less as possible, so that the temperature controllability of each heating zone can be improved whereby the vertical temperature distribution in the furnace can be controlled appropriately. Also, a heater element 18 of a larger aperture size can be maintained at a stably supported state, whereby a single crystal of a larger dimension can be grown.
    Type: Grant
    Filed: June 4, 1996
    Date of Patent: December 16, 1997
    Assignee: Kabushiki Kaisha Kobe Sekio Sho
    Inventors: Takao Fujikawa, Katsuhiro Uehara, Yoshihiko Sakashita, Hiroshi Okada, Takao Kawanaka