Abstract: A scroll compressor comprising a fixed scroll (15); an orbiting scroll (16) supported in a manner allowing for orbiting motion; a discharge port through which a fluid compressed by the two scrolls (15, 16) is discharged; an end plate step portion (16E) provided on an end plate of the orbiting scroll (16) formed so that a height of the end plate is higher on a center portion side in the direction of a spiral wrap and lower on an outer end side; and a wrap step portion (15E) provided on a wall portion of the fixed scroll (15) that corresponds to the end plate step portion (16E) so that a height of the wall portion is lower on the center portion side of the spiral and higher on the outer end side; wherein the orbiting scroll (16) is treated for surface hardening and the fixed scroll (15) is not treated for surface hardening.

Abstract: A chemically amplified radiation sensitive resin composition comprising at least (1) a base resin that is an alkali-soluble resin or an alkali-insoluble or slightly alkali-soluble resin protected by an acid dissociable protecting group wherein the amount of an ultrahigh molecular weight component whose weight average molecular weight determined by polystyrene standards as measured by gel permeation chromatography with multi angle laser light scattering method is one million or more is 1 ppm or less, (2) a photo-acid generator capable of generating an acid by irradiation of radiation, and (3) a solvent. This radiation sensitive resin composition is applied onto an object to be processed 2 to form a photoresist film 3. The photoresist film is exposed and then developed to form a fine resist pattern 4 with 0.2 ?m or less in pattern width. Thereafter, dry etching is conducted to form a gate electrode, hole shape patterning or grooved shape patterning of a semiconductor device.

Abstract: There are described compounds of the formula I ##STR1## in which R.sup.1 is (C.sub.1 -C.sub.10)-alkyl, (C.sub.1 -C.sub.8)-alkanoyl, (C.sub.6 -C.sub.10)-aryl or Het, each of which can be substituted by halogen, --OH, --NH.sub.2, --NH--CO--R.sup.7, --O--CO--R.sup.7 and --N--(R.sup.8).sub.2 where R.sup.7 =(C.sub.1 -C.sub.6)-alkyl and R.sup.8, independently of one another, is hydrogen or (C.sub.1 -C.sub.2)-alkyl or in which R.sup.1 is the radical of the formula II ##STR2## in which n is an integer from 3 to 10, m is zero to 3, R.sup.6, independently of one another, is (C.sub.1 -C.sub.6)-alkyl which is optionally substituted by halogen or --NH--CO--R.sup.7, where R.sup.7 =(C.sub.1 -C.sub.6)-alkyl, and X is absent or is (C.sub.1 -C.sub.10)-alkyl, and R.sup.2, R.sup.3, R.sup.4 or R.sup.5, independently of one another, are hydrogen, (C.sub.1 -C.sub.5) -alkyl, lithium, sodium, potassium or Si(R), where R=(C.sub.1 -C.sub.

Abstract: Imidobisphosphoric acids, process for their preparation, and use thereof.There are described compounds of the formula I ##STR1## in which R.sup.1 is (C.sub.1 -C.sub.10)-alkyl, (C.sub.1 -C.sub.8)-alkanoyl, (C.sub.6 -C.sub.10)-aryl or Het, each of which can be substituted by halogen, --OH, --NH.sub.2, --NH--CO--R.sup.7, --O--CO--R.sup.7 and --N--(R.sup.8).sub.2 where R.sup.7 =(C.sub.1 -C.sub.6)-alkyl and R.sup.8, independently of one another, is hydrogen or (C.sub.1 -C.sub.4)-alkyl or in which R.sup.1 is the radical of the formula II ##STR2## in which n is an integer from 3 to 10, m is zero to 3, R.sup.6, independently of one another, is (C.sub.1 -C.sub.6)-alkyl which is optionally substituted by halogen or --NH--CO--R.sup.7, where R.sup.7 =(C.sub.1 -C.sub.6)-alkyl, and X is absent or is (C.sub.1 -C.sub.10)-alkyl, and R.sup.2, R.sup.3, R.sup.4 or R.sup.5, independently of one another, are hydrogen, (C.sub.1 -C.sub.5)-alkyl, lithium, sodium, potassium or Si(R), where R=(C.sub.1 -C.sub.

Abstract: The heterocyclic iminobismethylenebisphosphonic acid derivatives of the general formula (I) ##STR1## wherein n is an integer of 0-5 and the group of the formula ##STR2## represents a 4-7 membered monocyclic or 7-11 membered condensed heterocyclic ring group which may be substituted by a halogen atom or a lower alkyl group and contains 1-2 nitrogen atoms their esters and salts thereof are described. The said compounds are useful as a bone resorption inhibitor, a dental calculus formation inhibitory agent or a polyvalent metal ion complex salt forming agent.