Patents by Inventor Katsuhisa Mita

Katsuhisa Mita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for baking photoresist applied on substrate
    Patent number: 6051371
    Abstract: A photomask substrate, which is formed in a rectangular shape and on the surface of which photoresist is applied, is located above a lower heating plate so as to be separated from the lower heating plate by a proximity distance. The lower heating plate is provided with a heat unifying ring fixedly arranged thereon so as to surround the photomask substrate. The periphery of the heat unifying ring is provided with a taper section tapered at a predetermined angle to the periphery. The heat unifying ring has a container for containing the photomask substrate, at the central portion. An upper heating plate is arranged above the lower heating plate. The upper heating plate is provided with a baking chamber thereabove to cover the entire portion of the baking chamber section, thereby the baking chamber section can be shielded from the outside and free from the influence of the outside.
    Type: Grant
    Filed: July 21, 1998
    Date of Patent: April 18, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Katsuhisa Mita, Yasuo Matsuoka, Kenichi Taniyama, Michirou Takano, Tsuneo Akasaki, Kaoru Kanda
  • Apparatus for baking photoresist applied on substrate
    Patent number: 6033474
    Abstract: A photomask substrate, which is formed in a rectangular shape and on the surface of which photoresist is applied, is located above a lower heating plate so as to be separated from the lower heating plate by a proximity distance. The lower heating plate is provided with a heat unifying ring fixedly arranged thereon so as to surround the photomask substrate. The periphery of the heat unifying ring is provided with a taper section tapered at a predetermined angle to the periphery. The heat unifying ring has a container for containing the photomask substrate, at the central portion. An upper heating plate is arranged above the lower heating plate. The upper heating plate is provided with a baking chamber thereabove to cover the entire portion of the baking chamber section, thereby the baking chamber section can be shielded from the outside and free from the influence of the outside.
    Type: Grant
    Filed: July 22, 1998
    Date of Patent: March 7, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Katsuhisa Mita, Yasuo Matsuoka, Kenichi Taniyama, Michirou Takano, Tsuneo Akasaki, Kaoru Kanda
  • Apparatus for baking photoresist applied on substrate
    Patent number: 5817178
    Abstract: A photomask substrate, which is formed in a rectangular shape and on the surface of which photoresist is applied, is located above a lower heating plate so as to be separated from the lower heating plate by a proximity distance. The lower heating plate is provided with a heat unifying ring fixedly arranged thereon so as to surround the photomask substrate. The periphery of the heat unifying ring is provided with a taper section tapered at a predetermined angle to the periphery. The heat unifying ring has a container for containing the photomask substrate, at the central portion. An upper heating plate is arranged above the lower heating plate. The upper heating plate is provided with a baking chamber thereabove to cover the entire portion of the baking chamber section, thereby the baking chamber section can be shielded from the outside and free from the influence of the outside.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: October 6, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Katsuhisa Mita, Yasuo Matsuoka, Kenichi Taniyama, Michirou Takano, Tsuneo Akasaki, Kaoru Kanda