Patents by Inventor Katsuhisa Ookawa

Katsuhisa Ookawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6428202
    Abstract: A method for inspecting a connection state of an electronic part and an apparatus for the same which permits judgement of the quality of the connection state at high accuracy without needing structural addition of through holes and pads for use in connection state inspection are provided. The has the steps of: heating a first specific position on the electronic part, measuring a temperature rise of a second specific position thermally coupled to the first specific position, and judging the quality of the connection state of the solder connecting portion by comparing the measured temperature rise and a reference temperature rise.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: August 6, 2002
    Assignee: NEC Corporation
    Inventors: Hideo Mitsuhashi, Katsuhisa Ookawa
  • Publication number: 20020013007
    Abstract: In a semiconductor wafer polishing end point detection method, a polishing progress state distribution on the surface of a semiconductor wafer by chemical and mechanical polishing in forming a metal wire is measured by using one or more measurement systems. The end point of polishing is detected on the basis of a measurement result, thereby obtaining an optimal polishing result. A semiconductor wafer polishing end point detection apparatus is also disclosed.
    Type: Application
    Filed: June 13, 2001
    Publication date: January 31, 2002
    Applicant: NEC CORPORATION
    Inventors: Koichi Hasegawa, Hideo Mitsuhashi, Katsuhisa Ookawa
  • Publication number: 20010036676
    Abstract: A semiconductor wafer polishing endpoint detection system and a method therefor can detect a polishing endpoint accurately. A first polishing endpoint detecting means compares the value of the first averaged gradient data and the first endpoint judgment threshold value for making judgment of end of polishing of wafer when the value of the first averaged gradient data is greater than or equal to the first endpoint judgment threshold value continuously for a predetermined number of times, when the value of the first averaged gradient data is greater than or equal to the first endpoint judgment threshold value for a number of times greater than or equal to a given number of times in total after the absolute value of the first averaged gradient data becomes greater than or equal to a given value, or when a ratio that the value of the first averaged gradient data becomes greater than or equal to the first endpoint judgment threshold value is greater than or equal to a predetermined ratio.
    Type: Application
    Filed: April 23, 2001
    Publication date: November 1, 2001
    Applicant: NEC CORPORATION
    Inventors: Hideo Mitsuhashi, Shinji Yamagata, Hiroshi Naka, Katsuhisa Ookawa