Patents by Inventor Katsuhito Kuroki

Katsuhito Kuroki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11876224
    Abstract: An object of the present invention is to provide a negative electrode active material having excellent charge/discharge characteristics (charge and discharge capacities, initial coulombic efficiency, and cycle characteristics). The object is achieved by providing a negative electrode active material containing: a silicon-based inorganic compound (a) composed of silicon (excluding zerovalent silicon), oxygen, and carbon; and silicon (zerovalent) (b). The equivalent constituent ratio [Q units/(D units+T units+Q units)] indicating the chemical bonding state (D units [SiO2C2], T units [SiO3C], Q units[SiO4]) of the silicon (excluding zerovalent silicon) present in the silicon-based inorganic compound (a) is within the range of from 0.30 to 0.80 inclusive.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: January 16, 2024
    Assignee: DIC Corporation
    Inventors: Peixin Zhu, Shinji Kato, Ryuuichi Kiyooka, Katsuhito Kuroki, Satoshi Katano, Takahito Ikuma
  • Publication number: 20200365893
    Abstract: An object of the present invention is to provide a negative electrode active material having excellent charge/discharge characteristics (charge and discharge capacities, initial coulombic efficiency, and cycle characteristics). The object is achieved by providing a negative electrode active material containing: a silicon-based inorganic compound (a) composed of silicon (excluding zerovalent silicon), oxygen, and carbon; and silicon (zerovalent) (b). The equivalent constituent ratio [Q units/(D units+T units+Q units)] indicating the chemical bonding state (D units [SiO2C2], T units [SiO3C], Q units[SiO4]) of the silicon (excluding zerovalent silicon) present in the silicon-based inorganic compound (a) is within the range of from 0.30 to 0.80 inclusive.
    Type: Application
    Filed: November 27, 2018
    Publication date: November 19, 2020
    Applicant: DIC Corporation
    Inventors: Peixin ZHU, Shinji KATO, Ryuuichi KIYOOKA, Katsuhito KUROKI, Satoshi KATANO, Takahito IKUMA
  • Patent number: 9382401
    Abstract: The problem to be solved is to provide a nondrying polymer hydrogel, which is not dried under atmospheric conditions and has excellent mechanical properties, and a method for producing the nondrying polymer hydrogel. A nondrying polymer hydrogel having both excellent nondrying properties and mechanical properties (e.g., excellent elongation properties, compression properties, and surface adhesiveness) can be produced by using a nondrying polymer hydrogel including a deliquescent substance in such a manner that the water vapor pressure shown by the polymer hydrogel is equal to or lower than the water vapor partial pressure in the atmosphere, in particular, by allowing a deliquescent substance to be contained at a high concentration in a polymer hydrogel having a network structure formed by a polymer of a water-soluble radically-polymerizable organic monomer having a specific chemical composition and a delaminated water-swellable clay mineral.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: July 5, 2016
    Assignees: DIC Corporation, Kawamura Institute of Chemical Research
    Inventors: Kazutoshi Haraguchi, Katsuhito Kuroki
  • Publication number: 20140343209
    Abstract: The problem to be solved is to provide a nondrying polymer hydrogel, which is not dried under atmospheric conditions and has excellent mechanical properties, and a method for producing the nondrying polymer hydrogel. A nondrying polymer hydrogel having both excellent nondrying properties and mechanical properties (e.g., excellent elongation properties, compression properties, and surface adhesiveness) can be produced by using a nondrying polymer hydrogel including a deliquescent substance in such a manner that the water vapor pressure shown by the polymer hydrogel is equal to or lower than the water vapor partial pressure in the atmosphere, in particular, by allowing a deliquescent substance to be contained at a high concentration in a polymer hydrogel having a network structure formed by a polymer of a water-soluble radically-polymerizable organic monomer having a specific chemical composition and a delaminated water-swellable clay mineral.
    Type: Application
    Filed: June 19, 2013
    Publication date: November 20, 2014
    Applicants: KAWAMURA INSTITUTE OF CHEMICAL RESEARCH, DIC Corporation
    Inventors: Kazutoshi Haraguchi, Katsuhito Kuroki