Abstract: A wavelength variable interference filter includes a fixed substrate, a movable substrate that faces the first substrate, a fixed reflective film that is disposed between the fixed substrate and the movable substrate, and a movable reflective film that is disposed between the fixed reflective film and the movable substrate, in which the fixed substrate transmits light, the fixed reflective film includes silver, and a concentration of a hydroxyl group that the fixed substrate includes is 500 ppm or less or 1000 ppm or more.

Abstract: A wavelength variable interference filter includes a fixed substrate, a movable substrate that faces the first substrate, a fixed reflective film that is disposed between the fixed substrate and the movable substrate, and a movable reflective film that is disposed between the fixed reflective film and the movable substrate, in which the fixed substrate transmits light, the fixed reflective film includes silver, and a concentration of a hydroxyl group that the fixed substrate includes is 500 ppm or less or 1000 ppm or more.

Abstract: A movable substrate of a wavelength variable interference filter includes a movable portion and a groove which is provided outside of the movable portion, in a plan view when the movable substrate is seen from a substrate thickness direction, the groove includes a bottom surface having an even groove depth dimension and a side surface which is continued to the bottom surface, and the side surface is configured with arc-like first curved surface portion and second curved surface portion, in a cross-sectional view when the movable substrate is cut along the substrate thickness direction.

Abstract: A variable wavelength interference filter includes a first substrate having a fixed mirror, a second substrate bonded to the first substrate and having a movable portion and a movable mirror fixed to the movable portion, a third substrate bonded to the second substrate on the side opposite to the first substrate, and an electrostatic actuator which displaces the movable portion in a substrate thickness direction, wherein a penetration hole connecting a light exiting-side space between the first substrate and the second substrate and a light incident-side space between the second substrate and the third substrate to a space outside the filter is formed, and the penetration hole is sealed with a sealant which tightly closes each space in a reduced-pressure state.

Abstract: A wavelength tunable interference filter includes a fixed substrate, a movable substrate, a fixed reflective film provided on the fixed substrate, a movable reflective film provided on the movable substrate so as to face the fixed reflective film, and a first bonding portion that bonds the fixed substrate and the movable substrate to each other. The first bonding portion includes a resin layer provided on the fixed substrate, a metal layer that is provided on the fixed substrate so as to cover the resin layer and that has smaller plasticity than the resin layer, and another metal layer that is provided on the movable substrate and that is bonded to the metal layer.

Abstract: A movable substrate of a wavelength variable interference filter includes a movable portion and a groove which is provided outside of the movable portion, in a plan view when the movable substrate is seen from a substrate thickness direction, the groove includes a bottom surface having an even groove depth dimension and a side surface which is continued to the bottom surface, and the side surface is configured with arc-like first curved surface portion and second curved surface portion, in a cross-sectional view when the movable substrate is cut along the substrate thickness direction.

Abstract: A nozzle plate includes: a nozzle plate main body made of metal, the nozzle plate main body having nozzle rows formed of nozzles arranged in parallel and penetrating the nozzle plate main body in a thickness direction, wherein at the outer edge of the nozzles on a droplet discharge surface of the nozzle plate main body, a water-repellent film is provided, and primer treatment is performed on at least part of the periphery of the droplet discharge surface of the nozzle plate main body, the periphery outside the water-repellent film.

Abstract: A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.

Abstract: A variable wavelength interference filter includes a first substrate having a fixed mirror, a second substrate bonded to the first substrate and having a movable portion and a movable mirror fixed to the movable portion, a third substrate bonded to the second substrate on the side opposite to the first substrate, and an electrostatic actuator which displaces the movable portion in a substrate thickness direction, wherein a penetration hole connecting a light exiting-side space between the first substrate and the second substrate and a light incident-side space between the second substrate and the third substrate to a space outside the filter is formed, and the penetration hole is sealed with a sealant which tightly closes each space in a reduced-pressure state.

Abstract: A nozzle plate includes: a nozzle plate main body made of metal, the nozzle plate main body having nozzle rows formed of nozzles arranged in parallel and penetrating the nozzle plate main body in a thickness direction, wherein at the outer edge of the nozzles on a droplet discharge surface of the nozzle plate main body, a water-repellent film is provided, and primer treatment is performed on at least part of the periphery of the droplet discharge surface of the nozzle plate main body, the periphery outside the water-repellent film.

Abstract: A droplet discharging head includes: a nozzle substrate that has a plurality of nozzle holes; a cavity substrate that communicates with the nozzle holes and which has a plurality of independent discharge chambers, the discharge chambers generating pressure therein so as to discharge droplets through the nozzle holes; a reservoir substrate that has a reservoir concave section and is provided between the nozzle substrate and the cavity substrate, the reservoir concave section functioning a reservoir, the reservoir being shared for communicating with the discharge chambers; a resin thin film formed on an entire inner surface of the reservoir concave section by film deposition, the resin thin film not being formed in the reservoir substrate on a side of an adhesion interface with the nozzle substrate or the cavity substrate; and a bottom surface of the reservoir concave section functioning a diaphragm section, the diaphragm section including the resin thin film and buffering pressure fluctuation.

Abstract: To provide an electrostatic actuator that generates high pressure under a given voltage and includes an insulating film exhibiting excellent insulation resistance, a droplet discharge head that includes the electrostatic actuator and a method for manufacturing the droplet discharge head, a droplet discharge apparatus that includes the droplet discharge head and has excellent printing performance, and a device that includes the electrostatic actuator and has excellent driving performance. A diaphragm 12, a counter electrode 17 opposite to the diaphragm 12 with a gap interposed therebetween, and an insulating film 16 on a surface of the diaphragm 12 opposite to the counter electrode 17 are included. The insulating film 16 includes at least a dielectric film 16a formed of a substance having a higher relative dielectric constant than silicon oxide.

Abstract: A method for manufacturing a droplet ejection head includes a step of forming recessed sections for forming nozzles by etching half way through a first face of a silicon substrate, a step of bonding a first support substrate to the first face of the silicon substrate, a step of reducing the thickness of the silicon substrate by processing a second face of the silicon substrate that is opposite to the first face thereof, and making the recessed sections through holes, and a step of removing the first support substrate from the silicon substrate after the reduction of the thickness of the silicon substrate.

Abstract: A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.

Abstract: A droplet discharging head includes: a nozzle substrate that has a plurality of nozzle holes; a cavity substrate that communicates with the nozzle holes and which has a plurality of independent discharge chambers, the discharge chambers generating pressure therein so as to discharge droplets through the nozzle holes; a reservoir substrate that has a reservoir concave section and is provided between the nozzle substrate and the cavity substrate, the reservoir concave section functioning a reservoir, the reservoir being shared for communicating with the discharge chambers; a resin thin film formed on an entire inner surface of the reservoir concave section by film deposition, the resin thin film not being formed in the reservoir substrate on a side of an adhesion interface with the nozzle substrate or the cavity substrate; and a bottom surface of the reservoir concave section functioning a diaphragm section, the diaphragm section including the resin thin film and buffering pressure fluctuation.

Abstract: A method of manufacturing a nozzle plate 2 is disclosed. The nozzle plate 2 has a plurality of nozzle openings 22 through each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate 10) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substrate 50 for supporting the processing substrate onto one major surface of the processing substrate 50; and forming the plurality of nozzle openings 22 on the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate 50.

Abstract: The present invention includes a step of forming concave portions to be nozzle openings by an etching process on a substrate to be processed, a step of bonding a first support substrate to a surface of the concave-portion-formed process side, a step of subjecting the processed substrate to a thinning process from a surface of an opposite side of a surface bonded to the first support substrate so as to have a desired thickness, thereby opening an end of the concave portion, a step of bonding a second support substrate to a surface of the concave-portion-opened side, a step of separating the first support substrate from the processed substrate and bonding a third support substrate to the separated surface of the processed substrate, and a step of separating the second support substrate from the processed substrate.

Abstract: A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.

Abstract: An electrostatic actuator includes a silicon diaphragm, an opposing electrode opposing the diaphragm with intervention of a gap therebetween, and an insulating layer formed on a surface of the diaphragm, opposing the opposing electrode. A voltage is applied between the diaphragm and the opposing electrode. The insulating layer has a laminated structure including a dielectric layer formed of a material having a higher relative dielectric constant than silicon oxide, on the diaphragm, and a surface layer exhibiting higher reduction in surface charge density than that of the dielectric layer, formed on the dielectric layer.

Abstract: To provide an electrostatic actuator that generates high pressure under a given voltage and includes an insulating film exhibiting excellent insulation resistance, a droplet discharge head that includes the electrostatic actuator and a method for manufacturing the droplet discharge head, a droplet discharge apparatus that includes the droplet discharge head and has excellent printing performance, and a device that includes the electrostatic actuator and has excellent driving performance. A diaphragm 12, a counter electrode 17 opposite to the diaphragm 12 with a gap interposed therebetween, and an insulating film 16 on a surface of the diaphragm 12 opposite to the counter electrode 17 are included. The insulating film 16 includes at least a dielectric film 16a formed of a substance having a higher relative dielectric constant than silicon oxide.