Patents by Inventor Katsuji Arawaka

Katsuji Arawaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7997697
    Abstract: A droplet discharge head including a nozzle substrate having nozzle openings, a cavity substrate having discharge chambers that communicate with the nozzle openings and discharge droplets from the nozzle openings, a reservoir substrate having a reservoir concave portion that serves as a reservoir which communicates commonly with the discharge chambers. The reservoir substrate is provided between the nozzle substrate and the cavity substrate and a resin thin film is formed on a whole inner face of the reservoir concave portion and on a bottom face of a second concave portion. The second concave portion is provided in a peripheral of the reservoir concave portion and has a depth which is smaller than the depth of the reservoir concave portion. The resin thin film is cut circularly so as to surround the reservoir concave portion, and a part of the resin thin film serves as a diaphragm buffering pressure variation. serves as a diaphragm buffering pressure variation.
    Type: Grant
    Filed: October 4, 2007
    Date of Patent: August 16, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Katsuji Arawaka, Kazufumi Oya
  • Publication number: 20080084451
    Abstract: A droplet discharge head, including: a nozzle substrate having a nozzle opening, the nozzle opening being provided in a plural number; a cavity substrate having a discharge chamber that communicates the nozzle opening and discharges a droplet from the nozzle opening, the discharge chamber is provided in a plural number, and each of the discharge chambers independently communicating with the corresponding nozzle opening; a reservoir substrate having a reservoir concave portion that serves as a reservoir which communicates commonly with the discharge chambers, the reservoir substrate being provided between the nozzle substrate and the cavity substrate; and a resin thin film formed on a whole inner face of the reservoir concave portion and on a bottom face of a second concave portion, the second concave portion being provided in a peripheral of the reservoir concave portion and having a depth smaller than a depth of the reservoir concave portion, wherein the resin thin film provided on the bottom face of the
    Type: Application
    Filed: October 4, 2007
    Publication date: April 10, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Katsuji ARAWAKA, Kazufumi OYA