Patents by Inventor Katsuji Emura
Katsuji Emura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8142923Abstract: The battery of the invention has a positive-electrode layer 20, a negative-electrode layer 50, and an electrolytic layer 40 through which ionic conduction is performed between the two electrode layers. In this battery, the positive-electrode layer 20 and the negative-electrode layer 50 are laminated with each other and an insulating layer 30 is placed between the positive-electrode layer 20 and the negative-electrode layer 50. The insulating layer 30 has an area smaller than that of one of the positive-electrode layer 20 and the negative-electrode layer 50 and larger than that of the other. There is no place where the positive-electrode layer 20 and the negative-electrode layer 50 face each other through only the electrolytic layer 40. Even when the electrolytic layer 40 has a pinhole, the presence of the insulating layer 30 between the positive-electrode layer 20 and the negative-electrode layer 50 can suppress short-circuiting between the positive- and negative-electrode layers.Type: GrantFiled: November 15, 2007Date of Patent: March 27, 2012Assignee: Sumitomo Electric Industries, Ltd.Inventors: Katsuji Emura, Takashi Uemura, Hideaki Awata, Kentaro Yoshida, Mitsuyasu Ogawa, Rikizo Ikuta
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Patent number: 7946247Abstract: In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.Type: GrantFiled: May 8, 2007Date of Patent: May 24, 2011Assignee: Sumitomo Electric Industries, Ltd.Inventors: Hideaki Awata, Katsuji Emura, Kentaro Yoshida
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Publication number: 20110095121Abstract: A feeding mechanism, having a base station to which an elongate base material is continuously fed to be physically or chemically processed at a prescribed speed and from which the processed base material is continuously recovered, wherein tensile force T1 in a direction opposite to a feeding direction is applied at a supply side of the base station, frictional force F is applied at the base station and tensile force T2 in the feeding direction is applied at the recovery side of the base station, on said base material, with these forces satisfying the relation of F>T1>T2, is provided. A feeding mechanism for feeding a base material for performing physical or chemical processing with high accuracy while an elongate base material is continuously fed, particularly a feeding mechanism that suppresses thickness variation along the lengthwise direction or surface damage at a portion where a function is added of the processed base material, can be obtained.Type: ApplicationFiled: January 6, 2011Publication date: April 28, 2011Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Hideaki AWATA, Katsuji EMURA, Kentaro YOSHIDA, Nobuyuki OKUDA, Jun NAKAMURA
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Patent number: 7871667Abstract: In a previous experiment of a deposition work of depositing a film with a uniform thickness on a long strip base material in the longitudinal direction thereof, an elapsed time from the start of the deposition work and an output of a power supply at the elapsed time are measured. The resulting relation between the elapsed time and the output is stored in a storage device. Subsequent deposition on a long strip base material is performed by a method in which first, the output of the power supply is controlled to be stabilized at a desired value using a crystal oscillator thickness gauge in a pre-heating step before the start of the deposition work, and then, a base material transport device is driven to start the deposition work on the long strip base material after a desired deposition rate is obtained. After the start of the deposition work, the output of the power supply is controlled to coincide with the output at the elapsed time stored in the storage device.Type: GrantFiled: November 7, 2006Date of Patent: January 18, 2011Assignee: Sumitomo Electric Industries, Ltd.Inventors: Hideaki Awata, Katsuji Emura, Kentaro Yoshida
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Publication number: 20100028775Abstract: The battery of the invention has a positive-electrode layer 20, a negative-electrode layer 50, and an electrolytic layer 40 through which ionic conduction is performed between the two electrode layers. In this battery, the positive-electrode layer 20 and the negative-electrode layer 50 are laminated with each other and an insulating layer 30 is placed between the positive-electrode layer 20 and the negative-electrode layer 50. The insulating layer 30 has an area smaller than that of one of the positive-electrode layer 20 and the negative-electrode layer 50 and larger than that of the other. There is no place where the positive-electrode layer 20 and the negative-electrode layer 50 face each other through only the electrolytic layer 40. Even when the electrolytic layer 40 has a pinhole, the presence of the insulating layer 30 between the positive-electrode layer 20 and the negative-electrode layer 50 can suppress short-circuiting between the positive- and negative-electrode layers.Type: ApplicationFiled: November 15, 2007Publication date: February 4, 2010Applicant: SUMITOMO ELECTRIC INDUSTRIES , LTD.Inventors: Katsuji Emura, Takashi Uemura, Hideaki Awata, Kentaro Yoshida, Mitsuyasu Ogawa, Rikizo Ikuta
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Patent number: 7618744Abstract: A thin film lithium battery is provided which can realize a high yield by solving various problems caused by a pin hole formed in a solid electrolyte layer. A thin film lithium battery according to the present invention is a thin film lithium battery in which a positive electrode layer 20, a negative electrode layer 50, a solid electrolyte layer 40 provided therebetween, and a collector 10 electrically connected to at least one of the positive electrode layer 20 and the negative electrode layer 50 are laminated to each other. When this battery is viewed in plan along the lamination direction of the above individual layers, the positive electrode layer 20 and the negative electrode layer 50 are disposed at positions so as not to be overlapped with each other. By the structure as described above, even if a pin hole is formed in the solid electrolyte layer 40, short-circuiting between the two electrode layers 20 and 50, which is caused by this pin hole, can be prevented.Type: GrantFiled: September 12, 2006Date of Patent: November 17, 2009Assignee: Sumitomo Electric Industries, Ltd.Inventors: Takashi Uemura, Mitsuyasu Ogawa, Nobuhiro Ota, Katsuji Emura
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Publication number: 20080102363Abstract: A thin film lithium battery is provided which can realize a high yield by solving various problems caused by a pin hole formed in a solid electrolyte layer. A thin film lithium battery according to the present invention is a thin film lithium battery in which a positive electrode layer 20, a negative electrode layer 50, a solid electrolyte layer 40 provided therebetween, and a collector 10 electrically connected to at least one of the positive electrode layer 20 and the negative electrode layer 50 are laminated to each other. When this battery is viewed in plan along the lamination direction of the above individual layers, the positive electrode layer 20 and the negative electrode layer 50 are disposed at positions so as not to be overlapped with each other. By the structure as described above, even if a pin hole is formed in the solid electrolyte layer 40, short-circuiting between the two electrode layers 20 and 50, which is caused by this pin hole, can be prevented.Type: ApplicationFiled: September 12, 2006Publication date: May 1, 2008Applicant: Sumitomo Electric Industries, Ltd.Inventors: Takashi Uemura, Mitsuyasu Ogawa, Nobuhiro Ota, Katsuji Emura
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Publication number: 20080083506Abstract: A feeding mechanism, having a base station to which an elongate base material is continuously fed to be physically or chemically processed at a prescribed speed and from which the processed base material is continuously recovered, wherein tensile force T1 in a direction opposite to a feeding direction is applied at a supply side of the base station, frictional force F is applied at the base station and tensile force T2 in the feeding direction is applied at the recovery side of the base station, on said base material, with these forces satisfying the relation of F>T1>T2, is provided. A feeding mechanism for feeding a base material for performing physical or chemical processing with high accuracy while an elongate base material is continuously fed, particularly a feeding mechanism that suppresses thickness variation along the lengthwise direction or surface damage at a portion where a function is added of the processed base material, can be obtained.Type: ApplicationFiled: May 9, 2007Publication date: April 10, 2008Inventors: Hideaki Awata, Katsuji Emura, Kentaro Yoshida, Nobuyuki Okuda, Jun Nakamura
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Publication number: 20070261638Abstract: In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.Type: ApplicationFiled: May 8, 2007Publication date: November 15, 2007Inventors: Hideaki Awata, Katsuji Emura, Kentaro Yoshida
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Publication number: 20070110892Abstract: In a previous experiment of a deposition work of depositing a film with a uniform thickness on a long strip base material in the longitudinal direction thereof, an elapsed time from the start of the deposition work and an output of a power supply at the elapsed time are measured. The resulting relation between the elapsed time and the output is stored in a storage device. Subsequent deposition on a long strip base material is performed by a method in which first, the output of the power supply is controlled to be stabilized at a desired value using a crystal oscillator thickness gauge in a pre-heating step before the start of the deposition work, and then, a base material transport device is driven to start the deposition work on the long strip base material after a desired deposition rate is obtained. After the start of the deposition work, the output of the power supply is controlled to coincide with the output at the elapsed time stored in the storage device.Type: ApplicationFiled: November 7, 2006Publication date: May 17, 2007Inventors: Hideaki Awata, Katsuji Emura, Kentaro Yoshida
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Publication number: 20040070370Abstract: A method of operating a power supply system, and a power supply system, that serve to achieve efficient operation of power generating units and reduce operating time, are provided.Type: ApplicationFiled: August 27, 2003Publication date: April 15, 2004Inventor: Katsuji Emura