Patents by Inventor Katsuji Shibata

Katsuji Shibata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7202283
    Abstract: The present invention provides a dissolution method for saturated polyester capable of recycling saturated polyester used in fibers, a film, a bottle and others with ease and a low cost, a solution decomposing saturated polyester and a decomposition method using the solution.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: April 10, 2007
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hisayo Masuda, Katsuji Shibata, Hiroyuki Izawa, Ayako Iwamaru
  • Patent number: 6962628
    Abstract: A method of treating a composite material of epoxy resin-cured product and inorganic matter to easily recover the resin components in a recyclable state without causing thermal decomposition. A method of separating the inorganic matter. The epoxy resin-cured product is treated with a treatment liquid which contains a decomposition catalyst for epoxy resin-cured products and an organic solvent to decompose and dissolve the epoxy resin-cured product. A composite material of epoxy resin-cured product and inorganic matter is also treated to decompose and dissolve the epoxy resin-cured product in the above-mentioned manner and the inorganic matter is then separated from the liquid.
    Type: Grant
    Filed: October 5, 2000
    Date of Patent: November 8, 2005
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Katsuji Shibata, Hiroshi Shimizu, Ayako Iwamaru, Takeshi Horiuchi
  • Publication number: 20050027023
    Abstract: The present invention provides a dissolution method for saturated polyester capable of recycling saturated polyester used in fibers, a film, a bottle and others with ease and a low cost, a solution decomposing saturated polyester and a decomposition method using the solution.
    Type: Application
    Filed: November 13, 2002
    Publication date: February 3, 2005
    Inventors: Hisayo Masuda, Katsuji Shibata, Hiroyuki Izawa, Ayako Iwamaru
  • Patent number: 6780894
    Abstract: The present invention provides a decomposition treatment liquid for a cured unsaturated polyester resin, comprising a phosphoric acid-type compound or salt thereof and an organic solvent as essential components. By using the treatment liquid of the invention, a cured unsaturated polyester resin can be easily decomposed or dissolved.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: August 24, 2004
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Katsuji Shibata, Hiroyuki Izawa, Ayako Matsuo
  • Publication number: 20020120019
    Abstract: The present invention provides a decomposition eminent liquid for a cured unsaturated polyester resin, comprising a phosphoric acid-type compound or salt thereof and an organic solvent as essential components. By using the treatment liquid of the invention, a cured unsaturated polyester resin can be easily decomposed or dissolved.
    Type: Application
    Filed: December 20, 2001
    Publication date: August 29, 2002
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Katsuji Shibata, Hiroyuki Izawa, Ayako Matsuo
  • Patent number: 6153359
    Abstract: An etching solution comprising (A) an amine as a solvent, (B) an alkali metal compound, and (C) an alcohol as a solvent, this etching solution being a non-aqueous solution. This etching solution is-effective for etching a cured epoxy resin layer for forming holes for interstitial via holes having a small diameter, in the production of a multilayer printed circuit board. This etching solution is particularly effective for etching a cured epoxy resin layer formed from a thermosetting epoxy resin composition including (a) an epoxy resin, (b) a crosslinking agent, and (c) a polyfunctional epoxy resin, which forms a thermosetting copper-clad adhesive resin sheet which covers an interlayer circuit plate of a multilayer printed circuit board.
    Type: Grant
    Filed: March 25, 1999
    Date of Patent: November 28, 2000
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroshi Shimizu, Nobuyuki Ogawa, Katsuji Shibata, Akishi Nakaso
  • Patent number: 5945258
    Abstract: A process for producing a multilayer printed circuit board produced characterized by using a special thermosetting epoxy resin composition comprising (a) an epoxy resin, (b) a crosslinking agent and (c) a polyfunctional epoxy resin, for forming a thermosetting copper-clad adhesive resin sheet, which cover an interlayer circuit plate, followed by etching of cured adhesive resin for forming holes for interstitial via holes (IVH) having a small diameter using a special etching solution comprising (A) an amine as a solvent, (B) an alkali metal compound, and (C) an alcohol as a solvent, is suitable for mass production of multilayer printed circuit boards having IVH excellent in connection reliability and electrical properties.
    Type: Grant
    Filed: May 30, 1996
    Date of Patent: August 31, 1999
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroshi Shimizu, Nobuyuki Ogawa, Katsuji Shibata, Akishi Nakaso
  • Patent number: 5391687
    Abstract: Ultra high molecular weight epoxy resins are produced in a short time by polymerizing a difunctional epoxy resin having two epoxy group per molecule and a dihydric phenol by heating the difunctional epoxy resin and the dihydric phenol which are present in quantities which provide a ratio of phenolic hydroxyl groups to epoxy groups of from 1:0.9 to 1:1.1, in an amide solvent, in the presence of a polymerization catalyst, and the ultra high molecular weight epoxy resins are linearly polymerized so highly as to have the capability of being formed into films having high strength.
    Type: Grant
    Filed: October 18, 1993
    Date of Patent: February 21, 1995
    Assignee: Hitachi Chemical Company Ltd.
    Inventors: Katsuji Shibata, Kazuhito Kobayashi, Nozomu Takano, Masami Arai, Ikuo Hoshi
  • Patent number: 5304399
    Abstract: An epoxy resin film which is so strong as to have a tensile strength of not less than 10 MPa and an elongation of not less than 5% is formed by using a substantially linear high molecular weight epoxy resin which is synthesized by polymerizing a difunctional epoxy resin having two epoxy groups per molecule and a dihydric phenol in an aprotic polar solvent, in the presence of a solvent, at a reaction temperature ranging from 80.degree. to 130.degree. C., the difunctional epoxy resin and the dihydric phenol being used in quantities which provide a ratio of phenolic hydroxyl groups to epoxy groups of from 1:0.9 to 1:1.1 and a proportion of the total of them of at most 50% by weight based on the total of them and the aprotic polar solvent.
    Type: Grant
    Filed: February 25, 1993
    Date of Patent: April 19, 1994
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Katsuji Shibata, Kazuhito Kobayashi, Nozomu Takano, Masami Arai, Ikuo Hoshi
  • Patent number: 5225268
    Abstract: An epoxy resin film which is so strong as to have a tensile strength of not less than 10 MPa and an elongation of not less than 5% is formed by using a substantially linear high molecular weight epoxy resin which is synthesized by polymerizing a difunctional epoxy resin having two epoxy groups per molecule and a dihydric phenol in an aprotic polar solvent, in the presence of a solvent, at a reaction temperature ranging from 80.degree. to 130.degree. C., the difunctional epoxy resin and the dihydric phenol being used in quantities which provide a ratio of phenolic hydroxyl groups to epoxy groups of from 1:0.9 to 1:1.1 and a proportion of the total of them of at most 50% by weight based on the total of them and the aprotic polar solvent.
    Type: Grant
    Filed: September 11, 1991
    Date of Patent: July 6, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Katsuji Shibata, Kazuhito Kobayashi, Nozomu Takano, Masami Arai, Ikuo Hoshi
  • Patent number: 5115089
    Abstract: Disclosed herein are processes for the preparation of polyimide-isoindroquinazolinediones and precursor thereof. These polymers are useful as heat-resistant electric insulation materials, surface coating films for electronic instrument parts and especially suitable for manufacturing a photoresist. The above precursor is produced by reacting a an alkylenebistrimellitate dianhydride, a diaminoamide compound and the other amine. The precursor is readily dehydrated and ring-closed to produce polyimide-isoindroquinazolinedione, which is often conveniently conducted by producing a varnish of the precursor, applying it onto adequate substrates such as silicon wafers, glass plates, metal plates, etc. and then subjecting the coated film to dehydration. The resulting films have excellent physical properties such as good adherence, high tensile strength, low elasticity, etc.
    Type: Grant
    Filed: September 16, 1988
    Date of Patent: May 19, 1992
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Masatoshi Yoshida, Katsuji Shibata, Mitsumasa Kojima, Hidetaka Satou, Toshihiko Kato, Yasuo Miyadera, Masami Yusa
  • Patent number: 4833204
    Abstract: An epoxy resin composition for a copper-clad laminate comprising an epoxy resin having at least two epoxy groups in one molecule, a phenolic compound having at least two functional groups in one molecule as a hardener, an imidazole compound having a masked imino group as a hardening accelerator, and one or more of nitrogen compounds selected from the group consisting of urea derivatives represented by the formula R.sup.1 --NH--CO--NH.sub.2, wherein R.sup.1 is hydrogen or an organic group; acid amide compounds; and guanidine derivatives, which is advantageously used for the material of a copper-clad laminate. Accordingly, the copper-clad laminate is especially used for the production of printed circuit boards, and its drilling property, peeling resistance of the copper foil, adhesive property, and heat resistance are improved remarkably. In addition, this epoxy resin composition has an excellent storing stability.
    Type: Grant
    Filed: September 6, 1988
    Date of Patent: May 23, 1989
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masami Yusa, Katsuji Shibata, Yasuo Miyadera
  • Patent number: 4824704
    Abstract: A 3-methylbutene-1 polymer composition comprising:(a) from 10 to 85% by weight of a 3-methylbutene-1 homopolymer or a copolymer of 3-methylbutene-1 with other .alpha.-olefin having from 2 to 18 carbon atoms, which has a heat of fusion of at least 7 cal/g as measured by a differential scanning calorimeter;(b) from 10 to 85% by weight of a copolymer of 3-methylbutene-1 with other .alpha.-olefin having from 2 to 18 carbon atoms, which has a heat of fusion of more than 1 cal/g and less than 7 cal/g as measured by a differential scanning calorimeter; and(c) from 3 to 40% by weight of an elastomeric copolymer of 3-methylbutene-1 with other .alpha.-olefin having from 2 to 18 carbon atoms or an elastomeric copolymer of at least two other olefins having from 2 to 18 carbon atoms, which shows no peak in fusion as measured by a differential scanning calorimeter.
    Type: Grant
    Filed: March 25, 1988
    Date of Patent: April 25, 1989
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Yoshinori Suga, Eiji Tanaka, Nobuo Enokido, Hidehito Kato, Katsuji Shibata
  • Patent number: 4509732
    Abstract: A document handling apparatus comprises a first conveyor means for conveying a document to a given location, a document stacking means for receiving documents conveyed by the first conveyor means and maintaining them at said location to form them into a stack, a stapling means for stapling the stack of documents, and a second conveyor means for conveying the stapled stack of documents out of said given location. The first or the second conveyor means comprises a conveyor roller or rollers, and an electromagnetic ball control device which brings a steel ball into abutment against or away from the conveyor rollers in response to an operation of an electromagnet.
    Type: Grant
    Filed: February 20, 1980
    Date of Patent: April 9, 1985
    Assignee: Ricoh Company, Ltd.
    Inventors: Tadaaki Kanno, Takeshi Ukai, Yutaka Akahoshi, Katsuji Shibata