Abstract: A thermosetting composition comprising the following components (A-1), (A-2), (B), and (C), and having the viscosity of 5 to 200 Pa·s at a shear rate of 10 s?1 at 25° C., and having the viscosity of 1 to 50 Pa·s at a shear rate of 100 s?1 at 25° C., as measured by JIS K7117-2: (A-1) an acrylate compound or a methacrylate compound in which a substituted or unsubstituted alicyclic hydrocarbon group including 6 or more ring carbon atoms is ester-bonded, (A-2) a compound represented by the following formula (I-1), (B) a spherical silica, (C) a white pigment.

Abstract: A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

Abstract: A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula wherein R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms; R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group; and n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0. Also, a positive photoresist composition including the (meth)acrylic polymer and a method of forming a photoresist pattern with the positive photoresist composition.

Abstract: A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

Abstract: A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of 0 to 3, provided that n and m are not simultaneously 0.

Abstract: Adamantane derivatives are provided including a phenolic hydroxyl group-containing adamantane derivative, a glycidyloxy group-containing adamantane derivative, and an adamantyl group-containing epoxy modified acrylate, which exhibit excellent transparency, light resistance, and heat resistance properties. Also provided are resin compositions containing the adamantane derivatives. Further provided are corresponding methods for producing the adamantane derivatives, as well as the resin compositions containing the same.

Abstract: Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ?O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2?p+q?16.

Abstract: Provided are an alicyclic structure-containing compound, a (meth)acrylate, and a method for producing the ester. The compound and the ester are useful as a monomer and the like for a photoresist used in semiconductor manufacturing and excellent in solubility, compatibility, defect reduction, roughness improvement, and the like, realized by using an alicyclic structure-containing compound containing a linking group having an ester bond and/or a linking group having an ether bond, a (meth)acrylate derived from the alicyclic structure-containing compound, and a method for producing the ester.

Abstract: An adamantane derivative capable of affording a cured product which is excellent in optical characteristics such as transparency and light resistance, durability such as long-term heat resistance, and electrical characteristics such as dielectric constant, a process for producing such an adamantane derivative, and a curable composition containing such an adamantane derivative, the adamantane derivative being represented by the general formula (I) shown below and having a group selected from an acrylate group, a methacrylate group and a trifluoromethacrylate group, where R1 represents a group selected from a hydroxyl group, an acrylate group, a methacrylate group and a trifluoromethacrylate group, R2 represents a group selected from a hydrogen atom, a methyl group and a trifluoromethyl group, k is an integer of 0 to 4 and n is an integer of 1 to 6.

Abstract: Provided is a cured resin of an adamantane derivative having a specific structure, which has excellent optical properties such as transparency and (long-term) light stability, long-term heat resistance, dielectric constant, and mechanical properties, and which can be utilized suitably in the field of electronic and optical materials.

Abstract: Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ?O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2?p+q?16.

Abstract: The present invention is an adamantane derivative which provides optical characteristics such as transparency, (long term) light resistance and the like, long term heat resistance, electric characteristics such as dielectric constant and the like, and good mechanical properties; a production method thereof; and a resin composition containing the above-mentioned adamantane derivative that is an adamantane derivative represented by general formulae (I) to (III); for example, a production method of an adamantane derivative represented by the general formula (III) by reacting an adamantane derivative represented by the general formula (II) with acrylates, a resin composition containing an adamantane derivative represented by the general formula (II) and an epoxy resin curing agent, and a resin composition containing an adamantane derivative represented by the general formula (III) and a thermopolymerization initiator or a photopolymerization initiator.

Abstract: Disclosed herein is an adamantane derivative represented by the following general formula (I): (wherein R represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; Y represents a hydrogen atom, a hydroxyl group, ?O formed by two Ys together, a carboxyl group, or a hydrocarbon group having 1 to 20 carbon atoms or a cyclic hydrocarbon group having 3 to 20 carbon atoms; m is 13 and n is 3, or m is 12 and n is 4; and p is an integer of one or more), a production method thereof, a resin composition containing the adamantane derivative, and a cured product thereof.

Abstract: A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.

Abstract: The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.

Abstract: The present invention provides a method of measuring skin blood flow on a test site using a blood flow meter. The method includes the steps of calibrating the probe of the blood flow meter, using a bio-simulating model to produce a thermo-EMF flow curve, attaching the probe to a site to be tested to generate an electromagnetic force for the test site, and determining the skin blood flow at the test site by comparing the electromagnetic force to the thermo-EMF curve. The method may also include the step of maintaining the temperature in the probe at a value slightly higher than that of the test site.