Patents by Inventor Katsukiyo Ishikawa

Katsukiyo Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5663019
    Abstract: A color filter is made easily and uniformly employing electrodeposition.A specific positive type photosensitive resin layer is formed on a transparent electrode formed on a transparent substrate and, then a step for exposing and developing to obtain a desired pattern and a step for forming a desired colored layer by electrodeposition are repeated without peeling of the resin layer.
    Type: Grant
    Filed: November 10, 1992
    Date of Patent: September 2, 1997
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Masashi Ohata, Atsushi Kawakami, Katsukiyo Ishikawa
  • Patent number: 5215782
    Abstract: There is disclosed a method for forming a ferrite coatings on a substrate, which comprises:(a) bringing a substrate into contact with water or an aqueous solution, and(b) adding a ferrous ion solution, an oxidizer solution and a pH controller so that pH and an oxidation-reduction potential may be included within the range specified by A (6, -440 mV), B (6, -130 mV), C (11, -430 mV) and D (11, -740 mV) in a pH - oxidation-reduction potential graph.
    Type: Grant
    Filed: March 23, 1990
    Date of Patent: June 1, 1993
    Assignee: Nippon Paint Co, Ltd.
    Inventors: Katsuaki Yoshioka, Masao Oishi, Takao Saito, Katsukiyo Ishikawa
  • Patent number: 5213946
    Abstract: A novel positive type photosensitive resinous composition comprising a base resin having in at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 are the same or different groups and each represents hydrogen atom, alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group and R.sub.1 and R.sub.2, taken together with the carbon atom, may be an alicyclic ring, the composition further comprising a group containing an acid-decomposable bond, the content of said iminosulfonate group being 1.times.10.sup.-5 to 3.times.10.sup.-3 equivalent/g of the base resin. The present composition, when irradiated with radiation with 200 to 400 nm wavelength, can generate strong sulfonic acid groups, and is specifically useful as a photoresist for a circuit board, integrated circuit and the like.
    Type: Grant
    Filed: June 18, 1991
    Date of Patent: May 25, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masamitsu Shirai, Masahiro Tsunooka, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 5213850
    Abstract: Disclosed is a process for plating a metallic deposit between functional pattern lines on a substrate, comprising (a) forming a cured film containing a catalyst for electroless plating on the substrate, (b) forming functional pattern lines on said cured film, and (c) conducting electroless plating.
    Type: Grant
    Filed: September 12, 1991
    Date of Patent: May 25, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Masashi Ohata, Katsukiyo Ishikawa
  • Patent number: 5186801
    Abstract: The present invention provides an improved process for forming a color filter for a color display. The process comprises:(a) forming a transparent electroconductive layer on a substrate,(b) forming a negative type photosensitive resin layer having a desired color by electrodeposition on the transparent electroconductive layer,(c) exposing the photosensitive resin layer to light through a negative mask having a desired pattern followed by developing to form a patterned color layer, and(d) effecting the steps (b) and (c) necessary times to form patterned layers having required colors.
    Type: Grant
    Filed: August 23, 1991
    Date of Patent: February 16, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Masashi Ohata, Katsukiyo Ishikawa
  • Patent number: 5181984
    Abstract: The present invention provides a process for forming a solder mask on an electric circuit board without any defects. The process comprises forming an electric circuit on a substrate, coating a negative type photosensitive solder resist on the obtained electric circuit board, and then exposing to light through a negative film followed by developing, characterized in that the negative type photosensitive solder resist is electrodepositable and said coating of the solder resist is conducted by electrocoating the resist on an electroconductive transfer substrate which is different from the electric circuit board and then transferring the coated film onto the electric circuit board.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: January 26, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Katsukiyo Ishikawa
  • Patent number: 5175076
    Abstract: A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises:(A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) and .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components;(B) a basic nitrogen atom-containing compound;(C) an ethylenically unsaturated monomer; and(D) a photopolymerization initiator.
    Type: Grant
    Filed: December 17, 1991
    Date of Patent: December 29, 1992
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Katsukiyo Ishikawa, Hidefumi Kusuda, Katsuji Konishi
  • Patent number: 5166036
    Abstract: The invention provides an aqueous electrodeposition coating composition for a positive working resist and an image-forming method using the same. The coating composition is very stable under storage conditions and is capable of resulting in a positive working resist which is specifically useful in the preparation of a printed circuit board with mini-via-holes.
    Type: Grant
    Filed: July 9, 1991
    Date of Patent: November 24, 1992
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Takeshi Ikeda, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 5055374
    Abstract: The invention provides an aqueous electrodeposition coating composition for a positive working resist and an image-forming method using the same. The coating composition is very stable under storage conditions and is capable of resulting in a positive working resist which is specifically useful in the preparation of a printed circuit board with mini-via-holes.
    Type: Grant
    Filed: August 2, 1989
    Date of Patent: October 8, 1991
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Takeshi Ikeda, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 4999274
    Abstract: The invention provides a positive type photosensitive resinous composition comprising a resin obtained by the reaction of a polyepoxide compound, an aromatic or heterocyclic carboxylic acid bearing a phenolic hydroxyl group(s) and 1,2-quinondiazido sulfonic acid halide with the use of those three components in a defined proportion, which is useful for microfabrication photo-resist and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion to supporting substrates, when developed, non-exposed area are extremely resistive toward swelling.
    Type: Grant
    Filed: October 27, 1988
    Date of Patent: March 12, 1991
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 4977053
    Abstract: Disclosured is a toner comprising colored particles and a magnetic shell coated thereon, wherein said colored particles are composed of a binder resin and a coloring agent, and said magnetic shell is formed from an iron-oxide type magnetic material. The toner can be fixable at a low temperature or a low pressure, but the toner particles do not agglomerate with each other during long-term storage.
    Type: Grant
    Filed: September 29, 1989
    Date of Patent: December 11, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masao Ohishi, Katsuaki Kida, Katsukiyo Ishikawa, Takao Saito, Kouichi Nagata
  • Patent number: 4946757
    Abstract: The invention provides a photosensitive resin composition specifically useful for microfabrication resist films and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion, and moreover, when developed, non-exposed parts being of extremely less swelling nature.
    Type: Grant
    Filed: October 27, 1988
    Date of Patent: August 7, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 4920187
    Abstract: Disclosed is a process for preparing polymer particles having monodisperse particle size comprising:adding a dispersion stabilizer, a polymerizable monomer and a polymerization initiator to an organic solvent to conduct polymerization, wherein said organic solvent has a solubility parameter (SP value) higher than that of the resultant polymer by at least 1.0 and said dispersion stabilizer is soluble in said organic solvent and has a free radical reactive group of 10.sup.-3 to 1 mmol/g; andremoving said organic solvent.
    Type: Grant
    Filed: January 4, 1988
    Date of Patent: April 24, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akio Kashihara, Chikayuki Otsuka, Katsukiyo Ishikawa
  • Patent number: 4911957
    Abstract: Disclosed is a method of forming a ferrite film on particulate and/or fibrous substrate by adding an oxidizer solution and a ferrous ion solution to a deoxidized solution containing particulate and/or fibrous substrates to form a thin ferrite film on the particulate and/or fibrous substrates, wherein an addition amount of the ferrous ion solution is controlled such that an oxidation-reduction potential of the deoxidized solution keeps approximately a center point between the oxidation side and the reduction side, when a pH value of the dioxidized solution is adjusted to a constant value between pH 6 and 10.
    Type: Grant
    Filed: September 22, 1988
    Date of Patent: March 27, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masao Oishi, Takao Saito, Katsukiyo Ishikawa
  • Patent number: 4902592
    Abstract: A process for preparing a color display comprising the following steps:(a) preparing an uncolored base plate comprising a base plate, an electroconductive layer formed on said base plate and a photosensitive resin layer formed thereon, said photosensitive resin layer being patterned by exposing to light through a mask and developing it to let a portion of the electroconductive layer to be colored appear,(b) forming a color layer by electrodeposition on the portion of the electroconductive layer to be colored,(c) transferring the color layer onto a transfer plate, and(d) further transferring and fixing the color layer onto a transparent substrate from the transfer plate,wherein if the color display is colored with more than one color, the processes (a) to (d) are repeated for the other colors, but once said uncolored base plate is formed, the processes (b) to (d) are repeated.
    Type: Grant
    Filed: July 18, 1988
    Date of Patent: February 20, 1990
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Masashi Ohata, Katsukiyo Ishikawa
  • Patent number: 4869995
    Abstract: A positive type photosensitive resinous composition which is specifically useful in a photoresist for printed circuit board, integrated circuit board and the like and in a lithographic plate is provided.The resinous composition is characterized by comprising a resin having in its side chains or at the end portions of main chain at least one iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 each is selected from hydrogen atom, an alkyl, an acyl, a phenyl, a naphthyl, an anthryl and a benzyl group, or R.sub.1 and R.sub.2 may, taken together, form an alicyclic ring, the iminosulfonate content being 1.5.times.10.sup.-4 to 2.5.times.10.sup.-3 equivalent/g and the resin being free from glycidyl group or the like which may cause polymerization in the presence of sulfonic acid.
    Type: Grant
    Filed: May 27, 1988
    Date of Patent: September 26, 1989
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masamitsu Shirai, Masahiro Tsunooka, Makoto Tanaka, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 4853092
    Abstract: The first embodiment of the present invention is a process for producing a multicolor display comprising the following steps (a) a transfer panel which has thereon electroconductive layers insulated with each other is immersed in an electrodeposition bath, in which a voltage is applied to one or more of said electroconductive layers to be colored with a same color to form the color layer thereon, (b) said step (a) is repeated with the other colors to form a multicolor layer, and (c) said multicolor layer is transferred onto a transparent substrate. The second embodiment of the present invention is an improved process of the first embodiment, wherein both the multicolor layer and the electroconductive layer are transferred onto the transparent substrate.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: August 1, 1989
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akira Matsumura, Yasuo Nozaki, Katsukiyo Ishikawa
  • Patent number: 4837046
    Abstract: Disclosed is a method for forming a ferrite film comprising, flowing downward or spraying an aqueous oxidizing agent solution on a substrate in a deoxidized atmosphere and simultaneously supplying an aqueous deoxidized solution containing at least ferrous ions, to effect a ferrite crystallization reaction on the substrate. This ferrite film is used for magnetic recording media, photomagnetic recording media, magnetic heads, etc.
    Type: Grant
    Filed: August 7, 1987
    Date of Patent: June 6, 1989
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masao Oishi, Takao Saito, Katsukiyo Ishikawa, Masanori Abe, Yutaka Tamaura
  • Patent number: 4816365
    Abstract: An electrostatic recording dry toner made up of a uniform mixture of (A) precolored resin particles consisting essentially of thermoplastic resin and colorant and having an average size of 5 to 15.mu., (B) spherical resin particles having an average size of 0.01 to 2.00.mu. and having on their surfaces a charge controlling agent or cationic or anionic resin, and (C) silica particles having an average size of 1.mu. or less, is provided. The present dry toner can produce copies with high picture qualities at a higher transfer ratio even in a long run continuous reproduction.
    Type: Grant
    Filed: May 28, 1986
    Date of Patent: March 28, 1989
    Assignee: Nippon Paint Co., Ltd.
    Inventor: Katsukiyo Ishikawa
  • Patent number: RE33108
    Abstract: The invention provides a method for preparing a printed circuit board with plated-through-holes, using a specifically prepared photoresist material and a combination of exposure, development and etching means. This method is particularly useful for the preparation of a printed circuit board with plated-through-holes bearing a high density circuit pattern.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: November 7, 1989
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Katsukiyo Ishikawa, Kanji Nishijima, Mamoru Seio