Patents by Inventor Katsuko Ohta

Katsuko Ohta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
    Patent number: 5635328
    Abstract: Disclosed are a light-sensitive lithographic printing plate which comprises a support subjected to graining treatment and anodization treatment and a layer of a positive light-sensitive composition containing a o-quinonediazide compound, an alkali-soluble resin and a clathrate compound provided on the support, and a method of processing the same which comprises subjecting the plate to image exposure and then development processing with a developing agent containing an alkali metal silicate.
    Type: Grant
    Filed: August 16, 1994
    Date of Patent: June 3, 1997
    Assignees: Konica Corporation, Mitsubishi Chemical Corporation
    Inventors: Katuhiko Higashino, Kaori Fukumuro, Shinichi Matsubara, Mitsuru Sasaki, Katsuko Ohta, Fumiyuki Matsuo
  • Photopolymerizable composition
    Patent number: 5219709
    Abstract: A photopolymerizable composition comprising an addition polymerizable ethylenically unsaturated compound and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:(a) a squarylium dye containing a following formula (I), ##STR1## wherein each of R.sup.1 and R.sup.2 is a substituted or unsubstituted alkyl group or aryl group, and each of A and B is a substituted or unsubstituted benzene ring or naphthalene ring, and(b) a s-triazine compound having at least one halogenated methyl group.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: June 15, 1993
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Hideki Nagasaka, Katsuko Ohta
  • Photopolymerizable composition
    Patent number: 4966830
    Abstract: A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:(a) at least one sensitizer selected from the group consisting of a compound of the formula: ##STR1## wherein ring A is a substituted or unsubstituted benzene or naphthalene ring, X is a bivalent atom or bivalent group, R.sup.1 is an alkyl group, each of R.sup.2 and R.sup.3 is hydrogen, an alkyl group, an alkoxy group or an alkylthio group, or R.sup.1 and R.sup.2 bond to each other, and l is 0, 1 or 2, a compound of the formula: ##STR2## wherein R.sup.1 and R.sup.2 are as defined above, Ar is an aromatic group, and each of n and m is 0 or 1, a compound of the formula: ##STR3## wherein R.sup.1, R.sup.2, R.sup.3, ring A, X and l are as defined above, R.sup.4 is hydrogen, an acetyl group or ##STR4## wherein R.sup.1, R.sup.2, R.sup.3 and l are as defined above, and R.sup.
    Type: Grant
    Filed: July 12, 1988
    Date of Patent: October 30, 1990
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Hideki Nagasaka, Katsuko Ohta