Patents by Inventor Katsumasa Yamamoto

Katsumasa Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160194454
    Abstract: The present invention aims to provide a condensation-curable silicone resin composition with excellent adhesion properties. The present invention also aims to provide a condensation-curable silicone resin cured product formed from the condensation-curable silicone resin composition and a sealed optical semiconductor element formed by using the condensation-curable silicone resin composition.
    Type: Application
    Filed: May 26, 2014
    Publication date: July 7, 2016
    Inventors: Noriaki FUKUDA, Katsumasa YAMAMOTO
  • Patent number: 9181400
    Abstract: The present invention provides a silicone resin composition having excellent adhesion. The present invention also aims to provide a cured silicone resin and a sealed optical semiconductor element each produced using the silicone resin composition.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: November 10, 2015
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Noriaki Fukuda, Shohei Sanada, Katsumasa Yamamoto
  • Publication number: 20150284515
    Abstract: The present invention provides a silicone resin composition having excellent adhesion. The present invention also aims to provide a cured silicone resin and a sealed optical semiconductor element each produced using the silicone resin composition.
    Type: Application
    Filed: October 16, 2013
    Publication date: October 8, 2015
    Inventors: Noriaki Fukuda, Shohei Sanada, Katsumasa Yamamoto
  • Patent number: 8540904
    Abstract: An ultraviolet absorbent substance includes a metal complex and a matrix, formed with at least one matrix material and/or polymerizable monomer as a precursor of a matrix material and containing said metal complex therein. One exemplary function of the ultraviolet absorbent substance is allowing visible light rays transmitted through satisfactorily while selectively blocking ultraviolet rays.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: September 24, 2013
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Yusaku Masuhara, Hidehiko Myoken, Katsumasa Yamamoto
  • Publication number: 20120313058
    Abstract: A composition for an ultraviolet absorbent substance which comprises at least one metal complex represented by formula (1) and at least one matrix material and/or polymerizable monomer as a precursor of a matrix material, and an ultraviolet absorbent substance comprising the composition: wherein Y1, Y2, Y3 and Y4 are each, independently of one another, NH, NR5, an oxygen atom or a sulfur atom, and R5 of NR5 assigned to Y1, Y2, Y3 or Y4 is an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 15 carbon atoms, which may have substituent(s).
    Type: Application
    Filed: December 10, 2010
    Publication date: December 13, 2012
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Yusaku Masuhara, Hidehiko Myoken, Katsumasa Yamamoto
  • Patent number: 8216768
    Abstract: A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: July 10, 2012
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Katsumasa Yamamoto, Hirofumi Yamaguchi, Michio Suzuki
  • Publication number: 20100233621
    Abstract: An object of the present invention is to provide photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and to provide a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product.
    Type: Application
    Filed: October 30, 2008
    Publication date: September 16, 2010
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Katsumasa Yamamoto, Hirofumi Yamaguchi, Michio Suzuki
  • Patent number: 6348300
    Abstract: A process for treating the periphery of an unexposed photosensitive resin plate, which comprises irradiation of light having a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The process of the present invention solves problems such as sticking of the peripheral resin of unexposed plates to packages, sticking of unexposed resin to a working table, exposure table or vacuum adhesion sheet, sticking of dust, and so on on the periphery of unexposed plates, and sticking of unexposed resin to hands when handling, while eliminating all defects in handling during the steps of making printing plates.
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: February 19, 2002
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Katsumasa Yamamoto, Takamitsu Ariki, Kosaku Onodera, Masaru Nampei
  • Patent number: 6150076
    Abstract: A process for treating the periphery of an unexposed photosensitive resin plate, which comprises irradiation of light having a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The process of the present invention solves problems such as sticking of the peripheral resin of unexposed plates to packages, sticking of unexposed resin to a working table, exposure table or vacuum adhesion sheet, sticking of dust, and so on on the periphery of unexposed plates, and sticking of unexposed resin to hands when handling, while eliminating all defects in handling during the steps of making printing plates.
    Type: Grant
    Filed: February 19, 1992
    Date of Patent: November 21, 2000
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Katsumasa Yamamoto, Takamitsu Ariki, Kosaku Onodera, Masaru Nampei
  • Patent number: 5834621
    Abstract: A novel sulfur-containing compound represented by the general formula (I): ##STR1## wherein n is an integer from 0 to 2; R represents a hydrogen atom, a vinyl group, a methacryloyl group, a vinylbenzyl group, a glycidyl group, an acryloyl group or an allyl group; and the case where n is 0 and R is a hydrogen atom is excluded, and a method for preparing said sulfur-containing compound. The novel sulfur-containing compound of the present invention can be copolymerized with various copolymerizable compounds to yield excellent hardened products of high refractive index. The novel sulfur-containing compound of the present invention can therefore be used as a very useful monomer for the production of optical materials, paints, adhesives, sealants, etc. having excellent properties.
    Type: Grant
    Filed: April 3, 1997
    Date of Patent: November 10, 1998
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Katsumasa Yamamoto, Masahito Nakano, Michio Suzuki
  • Patent number: 5145946
    Abstract: A process for preparing a polyarylene sulfide which comprises reacting an alkali metal sulfide compound and a polyhalo-substituted aromatic compound in an organic polar solvent in the presence of(A) an alkali metal salt of a phenolic aromatic carboxylic acid of the formula:(HO).sub.m --Ar--(COOM).sub.nwherein Ar is a di- to tetravalent aromatic group having 6 to 24 carbon atoms; M is an alkali metal; and m and n are each 1 or 2,(B) an alkali metal hydroxide and/or an alkali metal alcoholate, and optionally,(C) an alkali metal salt of an inorganic acid.
    Type: Grant
    Filed: August 5, 1987
    Date of Patent: September 8, 1992
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Tsuguo Fujii, Katsumasa Yamamoto, Junji Uda
  • Patent number: 5124736
    Abstract: Disclosed herein are a process and apparatus for developing photopolymer plates which are useful for flexographic printing on account of their rubber-like elasticity, capability for development by water washing, and good ink resistance. The process and apparatus are designed to circulate by force the washout solution during the development operation in order to minimize the aggregation of photopolymer particles suspending in the washout solution and to completely catch scum which occurs when the unexposed part of the polymer plate is rubbed off in the washout solution.
    Type: Grant
    Filed: November 30, 1990
    Date of Patent: June 23, 1992
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Katsumasa Yamamoto, Kyoichi Mizuno, Kosaku Onodera, Keizo Kawahara, Masaru Nanpei
  • Patent number: 4957980
    Abstract: A polyester resin composition having excellent gas barrier properties and transparency which comprises 100 parts by weight of a thermoplastic polyester resin (A), 1 to 100 parts by weight of a polyamide resin having metaxylylene group (B) and 0.01 to 50 parts by weight of a compatibilizing agent (C); and a polyester hollow molded article in the form of a single or multi-layered hollow molded article, wherein at least one of the layers is made of the above polyester resin composition.
    Type: Grant
    Filed: August 8, 1988
    Date of Patent: September 18, 1990
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Shigeo Kobayashi, Toshio Hiramatsu, Katsumasa Yamamoto, Nobuhiko Ichikawa
  • Patent number: 4663431
    Abstract: A process for preparing a polyarylene sulfide which comprises reacting an alkali metal sulfide compound and a polyhalo-substituted aromatic compound in an organic polar solvent in the presence of(A) an alkali metal salt of a phenolic aromatic sulfonic acid of the formula:(HO).sub.m --Ar--(SO.sub.3 M).sub.nwherein Ar is a di- to tetravalent aromatic group having 6 to 24 carbon atoms; M is an alkali metal; and m and n are each 1 or 2,(B) an alkali metal hydroxide and/or an alkali metal alcoholate, and optionally,(C) an alkali metal salt of sulfuric acid.
    Type: Grant
    Filed: May 2, 1986
    Date of Patent: May 5, 1987
    Assignee: Toyo Boseki Kabushiki Kaisha T/u Toyobo Co, Ltd.
    Inventors: Tsuguo Fujii, Katsumasa Yamamoto, Tetsuo Aratani, Yoshinori Uegaki