Abstract: It is an object of the present invention to provide a photosensitive composition capable of forming permanent holograms with low light scattering loss and high diffraction efficiency, and a method for forming a pattern. A photosensitive composition and a pattern formation method using the photosensitive composition are characterized in that the photosensitive composition used to form a pattern by pattern exposure includes: (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles.

Abstract: A diaminobenzene compound is disclosed which is represented by the formula (1). By reacting this compound with a tetracarboxylic acid (derivative), there can be obtained a polyimide which has charge carrier transport properties and is excellent in heat resistance, film strength and thin-film properties.

Abstract: Poly(5-aminoquinoxalines) having the general formula (1): In which R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, a phenyl group, a substituted phenyl group, a biphenyl group, a substituted biphenyl group, a thienyl group, a substituted thienyl group, a naphthyl group, a substituted naphthyl group, pyrrolyl group, a substituted pyrrolyl group, a furyl group, a substituted furyl group, an alkyl group, an alkoxyl, or an alkoxyl group; R3 and R4 each independently represent a hydrogen atom, an alkyl group, an alkoxyl group, a cyano group, a phenyl group, a substituted phenyl group, a biphenyl group, a substituted biphenyl group, a thienyl group, a substituted thienyl group, a pyrrolyl group, a substituted pyrrolyl group, a furyl group, a substituted furyl group, a naphthyl group, or a substituted naphthyl group; R5 represents a hydrogen atom, an alkyl group, an alkoxyl group, an acetyl group, a cyano group, a phenyl group, a substituted phenyl group, a biphenyl group,

Abstract: Poly(5-aminoquinoxalines) having the general formula (1): 1