Abstract: A surface defect inspection apparatus includes a light source that emits light to a first position on a surface of a target at an angle inclined with respect to the surface of the target, a first photodetector that detects first reflected light of the light from the light source, the first reflected light being reflected at the first position, a second photodetector that detects second reflected light of the light from the light source, the second reflected light being reflected at a second position, the second position being closer to the light source than the first position and being separated from the surface of the target by a given distance, and a determining unit that determines whether or not foreign matter is present on the surface of the target on a basis of detection results obtained from the first photodetector and the second photodetector.

Abstract: A surface defect inspection apparatus includes a light source that emits light to a first position on a surface of a target at an angle inclined with respect to the surface of the target, a first photodetector that detects first reflected light of the light from the light source, the first reflected light being reflected at the first position, a second photodetector that detects second reflected light of the light from the light source, the second reflected light being reflected at a second position, the second position being closer to the light source than the first position and being separated from the surface of the target by a given distance, and a determining unit that determines whether or not foreign matter is present on the surface of the target on a basis of detection results obtained from the first photodetector and the second photodetector.

Abstract: A measurement apparatus having a measurement light source for emitting measurement light, a projection unit on which reflected light formed when the measurement light is reflected from the mirror plane is projected as a projected light spot, an image pickup unit for picking up an image of the projection unit on which the reflected light is projected as the projected light spot, a control unit for controlling an inclination of the mirror plane and a measurement unit for measuring a quantity of movement of the projected light spot, which moves according to a change of the inclination of the mirror plane, on the basis of the image of the projection unit. This enables the measurement of a deflection characteristic of a mirror system having the mirror plane variable to arrange the inclination within a short period of time and with high accuracy.

Abstract: According to the present invention, there is provided a measurement apparatus having a measurement light source for emitting measurement light, a projection unit on which reflected light formed when the measurement light is reflected from the mirror plane is projected as a projected light spot, an image pickup unit for picking up an image of the projection unit on which the reflected light is projected as the projected light spot, a control unit for controlling an inclination of the mirror plane and a measurement unit for measuring a quantity of movement of the projected light spot, which moves according to a change of the inclination of the mirror plane, on the basis of the image of the projection unit. This enables the measurement of a deflection characteristic of a mirror system having the mirror plane variable to arrange the inclination within a short period of time and with high accuracy.

Abstract: According to the present invention, there is provided a measurement apparatus comprising a measurement light source for emitting measurement light onto a mirror plane, a projection unit on which reflected light formed when the measurement light emitted from the measurement light source is reflected from the mirror plane is projected and an image pickup unit for picking up an image of the projection unit on which the reflected light is projected. This enables the measurement of a deflection characteristic of the mirror system having the mirror plane variable to arrange an inclination within a short period of time and with high accuracy.

Abstract: An image-pickup-device testing method according to an aspect of the present invention, wherein processes are performed at one stage, the processes includes mounting a image pickup device under test on a test desk, performing an electrical test on the mounted image pickup device, then performing automatic focus adjustment, then performing an image test; then performing a flicker test; then fixing a lens, and then measuring assembly dimensions of the image pickup device under test.

Abstract: A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.

Abstract: A pattern inspection system, for inspecting a pattern formed on a base, such as a photo-mask, by means of laser beam scanning, which includes a device for detecting the body and edges of the pattern a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern and a device for eliminating pinholes and stains within a pattern.