Abstract: A lens apparatus includes a shift lens movable in a direction orthogonal to an optical axis of an imaging optical system, an actuator configured to drive the shift lens in a plane orthogonal to the optical axis, a memory storing instructions, and a processor configured to execute the instructions to control the actuator. The actuator includes a first actuator configured to drive the shift lens in a first direction within the plane, and a second actuator configured to drive the shift lens in a second direction within the plane. In driving the shift lens in a third direction different from the first direction and the second direction, the processor controls the actuator so that the first actuator and the second actuator are not simultaneously driven.

Abstract: A lens apparatus includes a tripod mount, a cylindrical member supported rotatably around an optical axis on the tripod mount, a roller housed in the tripod mount and including a rolling bearing and a shaft member engaged with the rolling bearing, a roller holding member configured to rotatably hold the roller, and a biasing member configured to bias the roller against the cylindrical member via the roller holding member.

Abstract: A lens apparatus includes a tripod mount, a cylindrical member supported rotatably around an optical axis on the tripod mount, a roller housed in the tripod mount and including a rolling bearing and a shaft member engaged with the rolling bearing, a roller holding member configured to rotatably hold the roller, and a biasing member configured to bias the roller against the cylindrical member via the roller holding member.

Abstract: Provided is a lens apparatus including: a movable frame configured to hold a lens; driving coils configured to move the movable frame during image blur correction; a guide barrel which is made of a non-magnetic conductive material, and is configured to support the driving coils; and a horizontal stripe noise reducing plate including: a flat surface portion located on one side of the driving coils in a direction of an optical axis of the lens; and an extending portion located on one side of each of the driving coils in a direction perpendicular to the optical axis, wherein the guide barrel is adjacent to the driving coils on another side of the driving coils in the direction perpendicular to the optical axis.

Abstract: A lens apparatus includes a conductive mount member, and a nonconductive fixed member fixed onto the mount member and having a conductive pattern.

Abstract: A lens apparatus includes a conductive mount member, and a nonconductive fixed member fixed onto the mount member and having a conductive pattern.

Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.

Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.

Abstract: A lens apparatus includes a tripod mount, a cylindrical member supported rotatably around an optical axis on the tripod mount, a roller housed in the tripod mount and including a rolling bearing and a shaft member engaged with the rolling bearing, a roller holding member configured to rotatably hold the roller, and a biasing member configured to bias the roller against the cylindrical member via the roller holding member.

Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.

Abstract: The lens barrel includes a first rotatable member rotatable to move a focusing lens in an optical axis direction, a first aperture stop unit including a first light-blocking member and a second rotatable member rotatable to move the first light-blocking member, a third rotatable member to be rotated by receiving a rotation of the first rotatable member, a first mechanism configured to, in the variation of magnification, convert a relative movement of the second and third rotatable members into a rotation of the second rotatable member, and a second mechanism configured to, in the focusing, transmit the rotation of the first rotatable member to the third rotatable member to rotate the third rotatable member and transmit the rotation of the third rotatable member to the second rotatable member to rotate the second rotatable member.

Abstract: A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance RaPS(MPa1/2) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1). 4.

Abstract: In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.

Abstract: A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.

Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.

Abstract: An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

Abstract: A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.

Abstract: The lens barrel includes a first rotatable member rotatable to move a focusing lens in an optical axis direction, a first aperture stop unit including a first light-blocking member and a second rotatable member rotatable to move the first light-blocking member, a third rotatable member to be rotated by receiving a rotation of the first rotatable member, a first mechanism configured to, in the variation of magnification, convert a relative movement of the second and third rotatable members into a rotation of the second rotatable member, and a second mechanism configured to, in the focusing, transmit the rotation of the first rotatable member to the third rotatable member to rotate the third rotatable member and transmit the rotation of the third rotatable member to the second rotatable member to rotate the second rotatable member.

Abstract: In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.

Abstract: A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance RaPS(MPa1/2) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1). 4.