Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein X represents a group represented by following Formula (A): (wherein R1, R2, R3, and R4 may be the same or different and each represents a hydrogen atom, a halogen atom and the like; and R5 and R6 may be the same or different and each represent a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like; and Y represents a group represented by following Formula (C): (wherein R9 represents a halogen atom, an alkyl group optionally having substituent(s) and the like; and R10 represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like, and “n” represents an integer of 0 to 5].

Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].

Abstract: The present invention provides optical filters comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R3 represents a hydrogen atom or an alkyl group optionally having substituent(s), and Y represents a group represented by General Formula (A): (wherein R4 represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R5 represents a hydrogen atom, a halogen atom or the like, and R6, R7, R8 and R9 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group optionally having substituent(s) or the like)] and the like.

Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].

Abstract: The present invention provides a filter for electronic display devices comprising a metal complex of squarylium compound represented by General Formula (I): (wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like, R3 and R4 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s) and the like, and M represents a metal atom having coordination function, n represents an integer of 1 to 4).

Abstract: The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein X represents a group represented by following Formula (A): (wherein R1, R2, R3, and R4 may be the same or different and each represents a hydrogen atom, a halogen atom and the like; and R5 and R6 may be the same or different and each represent a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like; and Y represents a group represented by following Formula (C): (wherein R9 represents a halogen atom, an alkyl group optionally having substituent(s) and the like; and R10 represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like, and “n” represents an integer of 0 to 5].

Abstract: A plasma processing apparatus comprises a vacuum vessel, an anode and a cathode arranged in the vacuum vessel, and a discharge producing power source for intermittently producing main discharge between the anode and the cathode to process a substrate arranged in the proximity of the anode and the cathode. The discharge producing power source comprises a magnetic field setting device including magnetic coils arranged closely to the vacuum vessel and having pole pieces and alternate current power sources for the magnetic coils. The plasma processing apparatus is able to remarkably increase processing speeds and considerably reduce the temperature rise and damage therefrom of substrates to be processed. Moreover, the magnetic field setting device is arranged in a small size to make the plasma processing apparatus compact and small-sized.

Abstract: A vacuum processing apparatus comprising a load-lock chamber, a vacuum transferring chamber and a processing chamber respectively having evacuating systems for evacuating the respective chambers. The load-lock chamber has a first isolation valve for isolating and opening communication of the load-lock chamber with the atmosphere and a second isolating valve for isolating and opening communication of the load-lock chamber with the vacuum transferring chamber. The processing chamber comprises a vessel detachably located at an arranging aperture formed in a wall of the vacuum transferring chamber and closing the arranging aperture in an air-tight manner from the outside of the apparatus. A substrate arranging portion is arranged in the vacuum transferring chamber so as to be move toward and away from the vessel to form an air-tight chamber space in the vessel isolated from the vacuum transferring chamber when the substrate arranging portion has moved to the vessel.

Abstract: In a dry etching apparatus comprising a plurality of etching chambers each of which comprises a first and a second electrode member opposite to each other, an object is successively etched in each etching chamber, with the object supported on either the first or the second electrode member, under different distributions of etching rate. When the object is placed on the first electrode member in each etching chamber and a gas is introduced through an aperture formed on the second electrode member, each distribution of etching rate can be varied by changing a position of the aperture. A side wall member may be extended from a periphery of the second electrode member towards the first electrode member in each etching chamber to confine plasma within a space defined by the first and the second electrode members and the side wall member. The side wall member is varied in length and/or diameter from an etching chamber to another to realize the different distributions of etching rate.

Abstract: In order to monitor the status, such as a decreasing or an increasing thickness, of a layer in response to a single light beam produced from a chamber in which the layer is processed, as by etching or sputtering, by the use of plasma, a monitoring device splits, according to spectral regions, the beam into two components of intensities variable with time and calculates a difference between the intensities, a power of the difference, and a ratio between the intensities. The status is monitored by selecting the difference, power, and ratio. The spectral regions may be 3962 and 3050 A for an aluminum layer being etched and 3248 and 8115 A for a copper layer sputter-formed in argon. Preferably, the difference and the power are monitored a predetermined interval of time after start of etch. The ratio is used in combination with a plasma sputtering device.

Abstract: In a dry etching device comprising a first electrode supplied with an electrical voltage and a second electrode grounded, a dielectric plate is placed on the second electrode and includes means for positioning a specimen to be etched. The specimen is brought into electrical contact with the second electrode by the positioning means and is, therefore, substantially grounded during etching. The positioning means may be a through hole for receiving the specimen therein. Alternatively, the positioning member may be a conductive spring passing through the dielectric plate. A plurality of positioning members may be arranged in the dielectric plate.