Patents by Inventor Katsunobu Ogura

Katsunobu Ogura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask exchanging method and exposure apparatus
    Patent number: 6885437
    Abstract: When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: April 26, 2005
    Assignees: Nikon Corporation, Sendai Nikon Corporation
    Inventors: Kenji Nishi, Katsunobu Ogura, Hidekazu Kikuchi
  • Mask exchanging method and exposure apparatus
    Publication number: 20040223132
    Abstract: When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.
    Type: Application
    Filed: February 20, 2004
    Publication date: November 11, 2004
    Applicants: Nikon Corporation, Sendai Nikon Corporation
    Inventors: Kenji Nishi, Katsunobu Ogura, Hidekazu Kikuchi