Patents by Inventor Katsunori Kawamura

Katsunori Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
    Patent number: 7781602
    Abstract: The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: August 24, 2010
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Katsunori Kawamura, Satoru Kobayashi, Satoru Miyazawa, Kazuhiko Maeda
  • Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same
    Publication number: 20080194764
    Abstract: The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
    Type: Application
    Filed: November 16, 2007
    Publication date: August 14, 2008
    Applicant: Central Glass Company Limited
    Inventors: Haruhiko KOMORIYA, Shinichi SUMIDA, Katsunori KAWAMURA, Satoru KOBAYASHI, Satoru MIYAZAWA, Kazuhiko MAEDA
  • Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
    Patent number: 7399815
    Abstract: The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.
    Type: Grant
    Filed: July 25, 2006
    Date of Patent: July 15, 2008
    Assignee: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Haruhiko Komoriya, Kazuhiko Maeda
  • Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection file material using such copolymers
    Publication number: 20060264592
    Abstract: The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.
    Type: Application
    Filed: July 25, 2006
    Publication date: November 23, 2006
    Applicant: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Haruhiko Komoriya, Kazuhiko Maeda
  • Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
    Patent number: 7109383
    Abstract: The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: September 19, 2006
    Assignee: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Haruhiko Komoriya, Kazuhiko Maeda
  • Process for producing ?-substituted acrylic acid esters
    Patent number: 7067691
    Abstract: A process for producing an ?-substituted acrylic acid ester represented by the formula [1], wherein each of R1 and R2 is independently a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, includes reacting an ?-substituted acrylic acid anhydride represented by the formula [7], with 1,1-bis(trifluoromethyl)-1,3-diol represented by the formula [2].
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: June 27, 2006
    Assignee: Central Glass Co., Ltd.
    Inventors: Takeo Komata, Kei Matsunaga, Yoshiki Hirotsu, Satoru Miyazawa, Katsunori Kawamura
  • Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
    Publication number: 20060135744
    Abstract: The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane or oxacyclobutane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing high-molecular compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing high-molecular compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
    Type: Application
    Filed: March 24, 2004
    Publication date: June 22, 2006
    Applicant: Central Glass Company Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Katsunori Kawamura, Satoru Kobayashi, Kazuhiko Maeda
  • Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes
    Patent number: 6992210
    Abstract: A fluorine-containing cyclic ester is represented by the formula 1: wherein each R1 independently represents —H or —F, wherein R2 is one selected from the group consisting of —H, —F, —CF3, —OH, —COOH and —COOR4, where R4 is an alkyl group having a carbon atom number of 1–15, and wherein R3 is a substituent selected from the group consisting of —F, —CF3, and —R5C(CF3)2OR6, where R5 is one selected from the group consisting of CH2, C2H4, and OCH2, and R6 is H or an acid-labile protecting group.
    Type: Grant
    Filed: February 27, 2004
    Date of Patent: January 31, 2006
    Assignee: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Haruhiko Komoriya, Kazuhiko Maeda
  • Process for producing alpha-substituted acrylic acid esters
    Publication number: 20050165249
    Abstract: A process for producing an ?-substituted acrylic acid ester represented by the formula [1], wherein each of R1 and R2 is independently a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, includes reacting an ?-substituted acrylic acid anhydride represented by the formula [7], with 1,1-bis(trifluoromethyl)-1,3-diol represented by the formula [2].
    Type: Application
    Filed: December 21, 2004
    Publication date: July 28, 2005
    Applicant: Central Glass Company, Ltd.
    Inventors: Takeo Komata, Kei Matsunaga, Yoshiki Hirotsu, Satoru Miyazawa, Katsunori Kawamura
  • Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
    Patent number: 6858760
    Abstract: A fluorine-containing cyclic compound is represented by the formula 1: wherein each of R1, R2 and R3 independently represents a hydrogen, alkyl group, fluorine, fluoroalkyl group or hexafluorocarbinol group, wherein at least one of the hexafluorocarbinol groups may partly or totally be protected with a protecting group, and wherein the protecting group is (a) a straight-chain, branched or cyclic hydrocarbon group having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group and optionally contains a fluorine atom, oxygen atom, nitrogen atom or carbonyl bond.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: February 22, 2005
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Satoru Miyazawa, Katsunori Kawamura, Satoru Kobayashi, Kazuhiko Maeda
  • Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
    Publication number: 20040225159
    Abstract: A fluorine-containing cyclic compound is represented by the formula 1: 1
    Type: Application
    Filed: February 20, 2004
    Publication date: November 11, 2004
    Applicant: Central Glass Company, Ltd.
    Inventors: Haruhiko Komoriya, Satoru Miyazawa, Katsunori Kawamura, Satoru Kobayashi, Kazuhiko Maeda
  • Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processes
    Publication number: 20040180954
    Abstract: A fluorine-containing cyclic ester is represented by the formula 1: 1
    Type: Application
    Filed: February 27, 2004
    Publication date: September 16, 2004
    Applicant: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Haruhiko Komoriya, Kazuhiko Maeda
  • Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
    Publication number: 20040116750
    Abstract: The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, 1
    Type: Application
    Filed: September 26, 2003
    Publication date: June 17, 2004
    Applicant: Central Glass Company, Limited
    Inventors: Satoru Kobayashi, Katsunori Kawamura, Kazuhiro Yamanaka, Haruhiko Komoriya, Kazuhiko Maeda
  • Adhesive for bonding together polyvinylidene fluoride resin and substrate
    Patent number: 5795654
    Abstract: The invention provides an adhesive for bonding together a first substrate made of a polyvinylidene fluoride resin and a second substrate. This adhesive includes an elastic fluorohydrocarbon resin, an acrylic resin, a polyvinylidene fluoride resin, a polyisocyanate, and an organic solvent. This elastic fluorohydrocarbon resin is obtained by graft copolymerization of a fluorine-containing copolymer with a vinylidene fluoride monomer. This copolymer is prepared by copolymerizing at least one first fluorine-containing monomer with at least one unsaturated monomer that has peroxy bond. The adhesive itself is superior in durability, and bond strength between the first and second substrates is also superior.
    Type: Grant
    Filed: December 4, 1996
    Date of Patent: August 18, 1998
    Assignee: Central Glass Company, Ltd.
    Inventors: Toshio Koishi, Katsunori Kawamura, Seiiti Minegishi