Patents by Inventor Katsunori Shimizu

Katsunori Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130150512
    Abstract: The purpose of the present invention is to provide a rubber composition with which it is possible to produce a tire that retains wear resistance and has excellent frictional force on ice, and a pneumatic tire using the rubber composition. The rubber composition of the present invention is a rubber composition comprising a diene rubber, carbon black and/or a white filler, and a master batch prepared by premixing a non-diene rubber and an organic peroxide, wherein a total content of carbon black and white filler is from 20 to 70 parts by mass per 100 parts by mass of diene rubber and a content of the non-diene rubber in the master batch is from 3 to 30 parts by mass per 100 parts by mass of the diene rubber.
    Type: Application
    Filed: August 19, 2011
    Publication date: June 13, 2013
    Applicant: THE YOKOHAMA RUBBER CO., LTD.
    Inventors: Satoshi Mihara, Katsunori Shimizu, Keisuke Maejima, Yayoi Akahori
  • Patent number: 7206381
    Abstract: An x-ray tube (1) irradiates an electron beam from a cathode (18) to impact a target (36) and emit x-rays. When the x-ray tube (1) operates, the magnet portion (40) is rotated every fixed time period and positioned at a prescribed rotation position. Due to the rotation of the magnet portion (40), the magnetic field formed by the permanent magnets (42) changes and the irradiation position on the target (36) of the electron beam moves. As a result, the electron beam is irradiated at a new position on the target (36) and the same amount of x-ray as the initial performance is generated.
    Type: Grant
    Filed: January 9, 2004
    Date of Patent: April 17, 2007
    Assignees: Toshiba Electron Tube & Devices Co., Ltd., Kabushiki Kaisha Toshiba
    Inventors: Takashi Shimono, Katsunori Shimizu
  • Publication number: 20050141669
    Abstract: An x-ray tube (1) irradiates an electron beam from a cathode (18) to impact a target (36) and emit x-rays. When the x-ray tube (1) operates, the magnet portion (40) is rotated every fixed time period and positioned at a prescribed rotation position. Due to the rotation of the magnet portion (40), the magnetic field formed by the permanent magnets (42) changes and the irradiation position on the target (36) of the electron beam moves. As a result, the electron beam is irradiated at a new position on the target (36) and the same amount of x-ray as the initial performance is generated.
    Type: Application
    Filed: January 9, 2004
    Publication date: June 30, 2005
    Applicants: Toshiba Electron Tube & Devices Co., Ltd, Kabushiki Kaisha Toshiba
    Inventors: Takashi Shimono, Katsunori Shimizu
  • Patent number: 4958956
    Abstract: A resilient wave reducing structure which reduces waves propagating on liquid surface from propagating over the reducing structure and a method of constructing the wave reducing structure. The wave reducing structure of the present invention may be used to form a calm water surface region for harbors, for areas where construction work is being done or for areas where marine sports are to be performed etc. The resilient wave reducing structure includes at least one energy absorbing device having a resilient body constructed on a bottom of the liquid bounding the region where waves have to be reduced and filled with surrounding ambient liquid. This reduces the amplitude of waves passing over it by consuming the wave energy while it deforms according to the pressure distribution change caused by the waves and by radiating its kinetic energy into the liquid and the ground surrounding it.
    Type: Grant
    Filed: September 23, 1987
    Date of Patent: September 25, 1990
    Assignee: Shimizu Construction Co., Ltd.
    Inventors: Masahiro Tanaka, Takumi Ohyama, Akihiko Hirayama, Tetsushi Kiyokawa, Seiji Ichii, Yutaka Katsura, Tadashi Ono, Katsunori Shimizu
  • Patent number: 4547260
    Abstract: In the fabrication of an aluminum or aluminum alloy wiring layer on a semiconductor device by dry etching using a gas containing chlorine species, a plasma exposure step inserted into the dry etching process in order to avoid the problems due to using a chlorine radical etchant. One half thickness of the aluminum layer, which is selectively masked by a resist mask film, on a semiconductor substrate is etched by a reactive ion etching technique using an etchant gas composed of CCl.sub.4 +BCl.sub.3, and then exposed to a plasma of a gas composed of CF.sub.4 +O.sub.2 generated by RF power. After the plasma exposure, the remaining thickness of the aluminum film is etched off under the same conditions as in the preceeding reactive ion etching. As the result, the amount of side etching is reduced to one half that of the case without the plasma exposure step, and corrosion originating from aluminum chlorides, products of the reactive ion etching, is eliminated.
    Type: Grant
    Filed: April 10, 1984
    Date of Patent: October 15, 1985
    Assignee: Fujitsu Limited
    Inventors: Tadakazu Takada, Katsunori Shimizu