Patents by Inventor Katsuo Komuro

Katsuo Komuro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Stencil, stencil design system and method for cell projection particle beam lithography
    Patent number: 7914954
    Abstract: Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: March 29, 2011
    Assignee: D2S, Inc.
    Inventors: Akira Fujimura, Takashi Mitsuhashi, Katsuo Komuro
  • Method and system for proximity effect and dose correction for a particle beam writing device
    Patent number: 7902528
    Abstract: A method of particle beam lithography includes selecting at least two cell patterns from a stencil, correcting proximity effect by dose control and by pattern modification for the at least two cell patterns, and writing the at least cell two patterns by one shot of the particle beam after proximity effect correction (PEC).
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: March 8, 2011
    Assignee: Cadence Design Systems, Inc.
    Inventors: Daisuke Hara, Katsuo Komuro, Takashi Mitsuhashi
  • Method and system for improvement of dose correction for particle beam writers
    Patent number: 7824828
    Abstract: A method and system for dose correction of a particle beam writer is disclosed. The method and system includes reading a file of writing objects that includes dose intensity, calculating a rate of dose intensity change between adjacent writing objects, selecting a writing object that may need accuracy improvement of dose correction based on the rate of dose intensity change, and improving accuracy of the dose correction of the writing object that is selected and its adjacent objects.
    Type: Grant
    Filed: February 22, 2007
    Date of Patent: November 2, 2010
    Assignee: Cadence Design Systems, Inc.
    Inventors: Akira Fujimura, Daisuke Hara, Katsuo Komuro, Takashi Mitsuhashi
  • Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography
    Publication number: 20100062349
    Abstract: Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.
    Type: Application
    Filed: September 9, 2008
    Publication date: March 11, 2010
    Applicant: D2S, Inc.
    Inventors: Akira Fujimura, Takashi Mitsuhashi, Katsuo Komuro
  • METHOD AND SYSTEM FOR IMPROVEMENT OF DOSE CORRECTION FOR PARTICLE BEAM WRITERS
    Publication number: 20080203324
    Abstract: A method and system for dose correction of a particle beam writer is disclosed. The method and system includes reading a file of writing objects that includes dose intensity, calculating a rate of dose intensity change between adjacent writing objects, selecting a writing object that may need accuracy improvement of dose correction based on the rate of dose intensity change, and improving accuracy of the dose correction of the writing object that is selected and its adjacent objects.
    Type: Application
    Filed: February 22, 2007
    Publication date: August 28, 2008
    Applicant: CADENCE DESIGN SYSTEMS, INC.
    Inventors: Akira Fujimura, Daisuke Hara, Katsuo Komuro, Takashi Mitsuhashi
  • Method and system for proximity effect and dose correction for a particle beam writing device
    Publication number: 20080116398
    Abstract: A method of particle beam lithography includes selecting at least two cell patterns from a stencil, correcting proximity effect by dose control and by pattern modification for the at least two cell patterns, and writing the at least cell two patterns by one shot of the particle beam after proximity effect correction (PEC).
    Type: Application
    Filed: November 21, 2006
    Publication date: May 22, 2008
    Applicant: Cadence Design Systems, Inc.
    Inventors: Daisuke Hara, Katsuo Komuro, Takashi Mitsuhashi