Patents by Inventor Katsuo Koshimura

Katsuo Koshimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050277061
    Abstract: The object of the present invention is to provide a polymeric material without odors or fuming and with reduced stickiness of the worked surface of material for seals and workability during laser processing, and the flexographic printing plate and sealing material made of the polymeric material having excellent characteristics of laser processing and having sufficient carving depth. The polymeric material of the present invention is characterized in that the polymeric material is made by crosslinking a polymer composition comprising a polymer which contains an ethylene unit as a repeating unit in content of 45% or more by mass and an organic peroxide. Another object of the present invention is to provide a laminated body for laser processing with excellent workability upon laser processing and a flexographic printing plate with excellent printing performance and workability and a method for fabricating the same.
    Type: Application
    Filed: June 22, 2005
    Publication date: December 15, 2005
    Applicant: JSR CORPORATION
    Inventors: Takashi Nishioka, Katsuo Koshimura, Tadaaki Tanaka
  • Publication number: 20020018958
    Abstract: The object of the present invention is to provide a polymeric material without odors or fuming and with reduced stickiness of the worked surface of material for seals and workability during laser processing, and the flexographic printing plate and sealing material made of the polymeric material having excellent characteristics of laser processing and having sufficient carving depth. The polymeric material of the present invention is characterized in that the polymeric material is made by crosslinking a polymer composition comprising a polymer which contains an ethylene unit as a repeating unit in content of 45% or more by mass and an organic peroxide.
    Type: Application
    Filed: June 19, 2001
    Publication date: February 14, 2002
    Applicant: JSR CORPORATION
    Inventors: Takashi Nishioka, Katsuo Koshimura, Tadaaki Tanaka
  • Patent number: 6280905
    Abstract: A photosensitive resin composition which comprises (1) a particulate copolymer comprising 10-99.8% by mole of the unit of (i) an aliphatic conjugated diene monomer, 0.1-30% by mole of the unit of (ii) a monomer having one polymerizable unsaturated group and an amino group, 0.1-20% by mole of the unit of (iii) a monomer having at least two polymerizable unsaturated groups and 0-40% by mole of the unit of (iv) a copolymerizable other monomer having one polymerizable unsaturated group, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator typically represented by 9-fluorenone or 2-i-propylthioxanthone. A photosensitive resin composition is provided which can be developed by using water, has a low hardness and high resilience, and is excellent in balance of properties.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: August 28, 2001
    Assignee: JSR Corporation
    Inventors: Katsuo Koshimura, Tsukasa Toyoshima, Takashi Nishioka, Tadaaki Tanaka
  • Patent number: 6140017
    Abstract: A water-developable photosensitive resin composition which comprises:(1) a particulate copolymer comprising, as recurring units in the copolymer, (a) 10 to 95 mole % of an aliphatic conjugated diene unit, (b) 0.1 to 30 mole % of a monomer unit having at least one polymerizable unsaturated group and at least one functional group selected from the group consisting of carboxyl group, amino group, hydroxyl group, epoxy group, sulfonic acid group and phosphoric acid group, and (c) 0.1 to 20 mole % of a monomer unit having at least two polymerizable unsaturated groups;(2) at least one copolymer selected from the group consisting of (i) a block-like copolymer composed of two or more polymeric segments having a sulfonic acid group in at least one of the polymeric segments, (ii) a block-like copolymer composed of two or more polymeric segments having a polyurethane segment in at least one of the polymeric segments, and (iii) a copolymer of ethylene and an .alpha.
    Type: Grant
    Filed: March 10, 1998
    Date of Patent: October 31, 2000
    Assignee: JSR Corporation
    Inventors: Katsuo Koshimura, Tadaaki Tanaka, Noboru Shimada, Kenji Yasuda
  • Patent number: 5861232
    Abstract: The present invention provides a photosensitive resin composition which is superior in water-developing properties, resilience, strength of resin plate after exposure, elongation at break, and transparency of resin plate. The composition comprises:(1) a particulate copolymer obtained by polymerizing a monomer mixture comprising:(a) an aliphatic conjugated diene monomer,(b) a monomer represented by the following general formula (I): ##STR1## and (c) a monomer having at least two groups capable of addition-polymerizing;(2) a photopolymerizable unsaturated monomer;(3) an amino group-containing compound; and(4) a photopolymerization initiator.
    Type: Grant
    Filed: May 31, 1996
    Date of Patent: January 19, 1999
    Assignees: Nippon Paint Co., Ltd., Japan Synthetic Rubber Co., Ltd.
    Inventors: Kazunori Kanda, Koichi Ueda, Tadahiro Kakiuchi, Hisaichi Muramoto, Katsuo Koshimura, Kenji Yasuda, Hozumi Sato, Takashi Nishioka
  • Patent number: 5837421
    Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises:(1) a granular copolymer produced by polymerizing a monomer mixture comprising:(i) an aliphatic conjugated diene monomer;(ii) a monomer expressed by the general formula (I): ##STR1## (in which R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20);(iii) a monomer having at least two addition-polymerizable groups, and(iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable;(2) a photo-polymerizable unsaturated monomer;(3) an amino group-containing compound, and(4) a photo-polymerization initiator.
    Type: Grant
    Filed: July 31, 1997
    Date of Patent: November 17, 1998
    Assignees: Nippon Paint Co., Ltd., Japan Synthetic Rubber Co., Ltd.
    Inventors: Kazunori Kanda, Koichi Ueda, Tadahiro Kakiuchi, Hisaichi Muramoto, Kenji Yasuda, Hozumi Sato, Katsuo Koshimura, Takashi Nishioka
  • Patent number: 5736298
    Abstract: A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development.
    Type: Grant
    Filed: October 2, 1995
    Date of Patent: April 7, 1998
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Ohshima, Takashi Nishioka
  • Patent number: 5731128
    Abstract: The present invention provides a resin composition for flexographic printing plate, which is superior in rubber elasticity, hardness and elongation as well as water developability. The resin composition for flexographic printing plate capable of water developing, attains excellent rubber elasticity, hardness and elongation without deterioration of water developability, using as elastic particles copolymer elastic particles having whisker on the particle surface which forms an entanglement between particles.
    Type: Grant
    Filed: November 29, 1995
    Date of Patent: March 24, 1998
    Assignees: Nippon Paint Co., Ltd., Japan Synthetic Rubber Co., Ltd.
    Inventors: Kazunori Kanda, Koichi Ueda, Tadahiro Kakiuchi, Hisaichi Muramoto, Hozumi Sato, Katsuo Koshimura, Takashi Nishioka
  • Patent number: 5731129
    Abstract: A water-developable photosensitive resin composition which exhibits a small swelling, small reduction in strength and small dimension change when developed with water and which has an excellent balance of characteristics. Said composition comprises (1) a oarboxyl group-containing diene polymer, (2) a hydrogenated diene block polymer in which at least 80% of the double bonds in the recurring unit consisting of conjugated diene has been hydrogenated, (3) a photopolymerizable ethylenically unsaturated monomer, (4) an amino group-containing compound and (5) a photopolymerization initiator.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: March 24, 1998
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Oshima, Takashi Nishioka, Yoshiharu Hashiguchi