Abstract: A color filter is laminated via a resin layer on an electroluminescence device. The resin layer includes silicone resin as its main ingredient while having a thickness of 2 to 100 .mu.m. Thereby, possible color dislocation and reduction of the angle of visibility attributed to the gap between the electroluminescence device and the color filter are prevented. Furthermore, possible damage, dielectric breakdown, pixel dropout, and line defect due to the contact between the electroluminescence device and the color filter are reduced. A surface of the resin layer is changed in condition to make the resin layer have a lipophilic property to facilitate application of a material of the color filter thereto.

Abstract: To reduce the thickness of liquid crystal display device and enhance its performance by integrating the liquid crystal display element and light source. One surface of a substrate and one surface of a substrate are adhered with an adhesive layer through an intervening liquid crystal layer. On the other surface of the substrate, an EL light source is mounted, that is, a glass substrate on which a first electrode, a first insulation layer, a phosphor layer, a second insulation layer, and a second electrode are laminated in this sequence is bonded with an insulation layer. Therefore, the liquid crystal display device may be reduced in thickness and enhanced in performance.

Abstract: A vapor deposition apparatus for depositing thin film on substrates in which solid starting materials are used. In this apparatus, a carrier gas flows up and down in the same direction as gas convection, such that the effect of gas convection is minimized and film thickness and impurity concentration are uniform over the substrate surface. This uniformity is achieved by orienting a main reaction tube in a vertical direction, attaching two branch reaction tubes at the top of the main reaction tube, and venting carrier gas out the bottom of the main reaction tube. Alternately, the main reaction tube can be oriented horizontally, with the substrates being carried on a holder within a container having pores on its top and bottom.

Abstract: An apparatus for vapor deposition including a vapor deposition section to which at least one semiconductor material supply passage and at least one alkoxide material supply passage are connected, first heating means provided for the vapor deposition section and capable of maintaining the temperature thereof higher than that of the alkoxide supply passage, second heating means provided for the semiconductor material supply passage and capable of maintaining the temperature thereof higher than that of the vapor deposition section, and third heating means provided for the alkoxide material supply passage and capable of maintaining the temperature thereof constant, and a process for continuously forming a multilayered film on a substrate.

Abstract: A process is provided for preparing uniform and homogeneous thin films such as ZnS:M film on the substrates having a large area by CVD under a reduced pressure, wherein as many plural substrates as possible can be subjected to the CVD treatment in the same apparatus without decreasing a growth rate of the film. Accordingly, EL displays having a large area which possess a high quality and can be manufactured efficiently.

Abstract: Disclosed is an improvement of the chemical vapor deposition (CVD) process for preparing an electroluminescent device having a large area and a large size. The process includes forming a luminescent layer on a substrate by a reduced-pressure chemical vapor deposition method wherein a source material gas is introduced into a reaction chamber. The reaction chamber includes a screening means which screens the source material gas flow in the chamber to form a first area in which the gas is flowing and a second area in which the gas substantially does not flow. The screening means has apertures for connecting the first area and second area. the substrate is placed in the second area, to which the source material is supplied by means of gas diffusion.

Abstract: A process for preparing an electroluminescent device includes the steps of forming an insulating layer and a luminescent layer on a substrate, wherein the insulating and luminescent layers are respectively formed at different forming areas in the same deposition chamber.

Abstract: Disclosed is an improvement of a process for producing a thin film electroluminescent device wherein the luminescent film is formed by a CVD method. The improvement residues in that an unnecessary portion of the luminescent layer, which is inherently formed if the CVD method is employed, is removed by etching.

Abstract: A process for producing a photoelectric conversion film comprising heat-treating a coating (A) of a photoconductive material composed chiefly of at least one of CdSe, CdS, CdTe, CdS.sub.x Se.sub.1-x and CdS.sub.x Te.sub.1-x wherein x is a real number of less than 1, opposite from a coating (B) in proximity thereto, the coating (B) being made of a material composed chiefly of CdS and a Cd halide.

Abstract: An image readout element of an image readout sensor for reading image information comprises an insulation substrate which transmits light, a pair of electrodes opposite to each other which are deposited on the substrate, and a photoconductive layer coated on the substrate and the pair of electrodes, the photoconductive layer comprising particles showing photoconductive characteristics and a resin material for dispersing and binding the photoconductive particles. There are provided a plurality of the sensor element in a single image readout sensor, and one of each pair of electrodes is arranged in parallel with one of the other pairs of electrodes.

Abstract: A two-dimensional image read-out device comprising a photoconducting layer, a plurality of X stripe electrodes applied on one surface of the photoconducting layer and arranged parallel with each other, and a plurality of Y electrodes applied on the other surface of the photoconducting layer and arranged parallel with each other in a direction perpendicular to the X electrodes. Both the X and Y electrodes are made of electrically conductive material, and the X or Y electrodes through which light from an image enters are made of transparent or translucent material. The light-entering side of the two-dimensional image read-out device is covered with an opaque material which allows the passage of light only through the picture elements which are formed at the intersections of the X and Y electrodes.