Patents by Inventor Katsuto Taniguchi

Katsuto Taniguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210317323
    Abstract: The present invention relates to a composition and to a method of manufacturing a composition.
    Type: Application
    Filed: July 31, 2019
    Publication date: October 14, 2021
    Applicant: Merck Patent GmbH
    Inventors: Tadashi KISHIMOTO, Yuko ARAI, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI
  • Publication number: 20210208503
    Abstract: To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.
    Type: Application
    Filed: January 20, 2017
    Publication date: July 8, 2021
    Inventors: Motoki MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20210171718
    Abstract: [Problem] To provide a polysiloxanecapable of forming a cured film of a thick film with high heat resistance, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition. [Means for Solution] To provide a polysiloxane comprising a repeating unit represented by the following formula (Ib), wherein R2 is each independently hydrogen, alkyl, aryl, alkenyl, and the like, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 10, 2021
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Seishi SHIBAYAMA, Katsuto TANIGUCHI, Masanobu HAYASHI, Toshiaki NONAKA
  • Publication number: 20210116811
    Abstract: [Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a >N—C(?O)— or >N—C(?S)— structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.
    Type: Application
    Filed: April 25, 2018
    Publication date: April 22, 2021
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Katsuto TANIGUCHI
  • Publication number: 20210055657
    Abstract: To provide a photosensitive siloxane composition capable of forming a pattern having a desired taper angle and a desired linewidth. [Means] The present invention provides a photosensitive siloxane composition comprising: a polysiloxane having a structure represented by the following formula (ia?): (L is an alkylene or phenylene), a photoactive agent, and a solvent.
    Type: Application
    Filed: December 27, 2018
    Publication date: February 25, 2021
    Inventors: Naofumi YOSHIDA, Takashi FUKE, Megumi TAKAHASHI, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Patent number: 10916661
    Abstract: The present invention relates to providing a thin film transistor substrate containing a protective film, which can impart high driving stability. The thin film transistor substrate contains a thin film transistor and a protective film containing a cured product of a siloxane composition which covers the thin film transistor, wherein the thin film transistor has a semiconductor layer made of an oxide semiconductor, and wherein the siloxane composition contains polysiloxane, a fluorine-containing compound, and a solvent.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: February 9, 2021
    Assignee: Merck Patent GmbH
    Inventors: Yukiharu Uraoka, Yasuaki Ishikawa, Naofumi Yoshida, Katsuto Taniguchi, Toshiaki Nonaka
  • Publication number: 20200319557
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: March 27, 2020
    Publication date: October 8, 2020
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20200301277
    Abstract: [Object] To provide a negative type photosensitive composition developable with a low concentration alkali developer and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)acryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.
    Type: Application
    Filed: March 27, 2017
    Publication date: September 24, 2020
    Inventors: MOTOKI MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20200225583
    Abstract: To provide a positive type photosensitive composition capable of forming a cured film of a thick film with high heat resistance. A positive type photosensitive siloxane composition comprising a polysiloxane having a specific structure, a silanol condensation catalyst, a diazonaphtho-quinone derivative and a solvent.
    Type: Application
    Filed: September 24, 2018
    Publication date: July 16, 2020
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Seishi SHIBAYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20200201179
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Application
    Filed: March 2, 2020
    Publication date: June 25, 2020
    Inventors: MEGUMI TAKAHASHI, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
  • Patent number: 10678134
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: June 9, 2020
    Assignees: MERCK PATENT GMBH, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 10620538
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: April 14, 2020
    Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 10606173
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 31, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Megumi Takahashi, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
  • Publication number: 20200089117
    Abstract: To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.
    Type: Application
    Filed: June 4, 2018
    Publication date: March 19, 2020
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20200073241
    Abstract: [Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides apositive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a quaternaryammonium structureandthecapability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.
    Type: Application
    Filed: April 25, 2018
    Publication date: March 5, 2020
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Katsuto TANIGUCHI
  • Publication number: 20190319131
    Abstract: [Problem] To provide a thin film transistor substrate comprising a protective film, which can impart high driving stability. [Means for Solution] A thin film transistor substrate comprising a thin film transistor and a protective film comprising a cured product of a siloxane composition, covering said thin film transistor, wherein the thin film transistor has a semiconductor layer made of an oxide semiconductor, and wherein the siloxane composition comprises polysiloxane, a fluorine-containing compound, and a solvent.
    Type: Application
    Filed: November 27, 2017
    Publication date: October 17, 2019
    Inventors: Yukiharu URAOKA, Yasuaki ISHIKAWA, Naofumi YOSHIDA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20190211266
    Abstract: The present invention relates to a photosensitive composition, and a color conversion medium. The present invention further relates to a use of the photosensitive composition in a color conversion medium fabrication process, and to a use of the color conversion medium in an optical device. The invention furthermore relates to an optical device and method for preparing the color conversion medium and the optical device.
    Type: Application
    Filed: July 27, 2017
    Publication date: July 11, 2019
    Applicant: Merck Patent GmbH
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Teruaki SUZUKI
  • Publication number: 20190077961
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Application
    Filed: March 23, 2017
    Publication date: March 14, 2019
    Inventors: MEGUMI TAKAHASHI, Daishi YOKOYAMA, Naofumi YOSHIDA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20180284613
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: August 30, 2016
    Publication date: October 4, 2018
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20180017869
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Application
    Filed: February 3, 2016
    Publication date: January 18, 2018
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi