Abstract: There is provided a fluorine-containing compound purification method for obtaining a high-purity fluorine-containing compound by efficiently separating and removing hydrogen chloride from a fluorine-containing compound that contains hydrogen chloride, i.e., from a crude fluorine-containing compound. The fluorine-containing compound purification method of the present invention comprises the following steps (1) and (2) in this order: step (1): a step of adding dimethyl ether to a crude fluorine-containing compound that contains a fluorine-containing compound and hydrogen chloride in a molar ratio (dimethyl ether (mol)/hydrogen chloride (mol)) of dimethyl ether to hydrogen chloride being 1.3 or more to prepare a mixture (1) of the crude fluorine-containing compound and dimethyl ether; and step (2): a step of separating and removing a mixture (2) of hydrogen chloride and dimethyl ether from the mixture (1).

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.

Abstract: A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.

Abstract: There is provided a fluorine-containing compound purification method for obtaining a high-purity fluorine-containing compound by efficiently separating and removing hydrogen chloride from a fluorine-containing compound that contains hydrogen chloride, i.e., from a crude fluorine-containing compound. The fluorine-containing compound purification method of the present invention comprises the following steps (1) and (2) in this order: step (1): a step of adding dimethyl ether to a crude fluorine-containing compound that contains a fluorine-containing compound and hydrogen chloride in a molar ratio (dimethyl ether (mol)/hydrogen chloride (mol)) of dimethyl ether to hydrogen chloride being 1.3 or more to prepare a mixture (1) of the crude fluorine-containing compound and dimethyl ether; and step (2): a step of separating and removing a mixture (2) of hydrogen chloride and dimethyl ether from the mixture (1).

Abstract: An object of the present invention is to provide a process for forming concavo-convex patterns which uses a resist-forming material having excellent oxygen etching resistance and long working life and which enables to carry out the imprinting (mold pressing) with good rectangular shape properties at normal temperature. The process for forming a concavo-convex pattern of the present invention comprises a step (1) of applying a solution containing a silsesquioxane compound of Composition Formula (A) below to a surface of a workpiece to form a thin film, a step (2) of pressing a stamper having a concavo-convex pattern to the thin film; and a step (3) of separating the stamper from the thin film; R1R2Si2O3??(A) wherein R1 and R2 are each independently a specific group.

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.

Abstract: There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2?CH—COO—R—NCO??(1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).

Abstract: A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.

Abstract: The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.

Abstract: The invention aims to provide a method whereby (meth)acrylate derivatives having an isocyanate group can be obtained in high yield by dehydrochlorination of 3-chloropropionate derivatives having an isocyanate group under industrially advantageous and mild conditions, and the content of residual hydrolyzable chlorine can be reduced. A method for producing a (meth)acrylate derivative having an isocyanate group comprises performing dehydrochlorination of a 3-chloropropionate derivative having an isocyanate group in the presence of a basic nitrogen compound having a tertiary nitrogen, the tertiary nitrogen of the basic nitrogen compound having at least one group other than an aromatic ring group.

Abstract: There are provided a novel ethylenically unsaturated group-containing isocyanate compound, a process for producing the same, and a reactive monomer produced from the isocyanate compound, a reactive polymer and its use. The ethylenically unsaturated group-containing isocyanate compound according to the present invention is represented by formula (I).

Abstract: A process for preparing a high purity (meth)acryloyloxyalkyl isocyanate having a very small hydrolyzable chlorine content is provided. The high purity (meth)acryloyloxyalkyl isocyanate is prepared by subjecting a hydrolyzable chlorine containing (meth)acryloyloxyalkyl isocyanate to mixing treatment with an epoxy compound and an amine at a temperature of from 110 to 160° C. to prepare a mixture; and preparing a high purity (meth)acryloyloxyalkyl isocyanate from the resulting mixture with distillation. In particular, it is possible to effectively prevent (meth)acryloyloxyalkyl isocyanate from polymerization during the distillation by adding a polymerization inhibitor such as phenothiazine and the like.

Abstract: There are provided a novel ethylenically unsaturated group-containing isocyanate compound, a process for producing the same, and a reactive monomer produced from the isocyanate compound, a reactive polymer and its use. The ethylenically unsaturated group-containing isocyanate compound according to the present invention is represented by formula (I).

Abstract: There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizeable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2?CH—COO—R—NCO??(1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).

Abstract: The invention aims to provide a method whereby (meth)acrylate derivatives having an isocyanate group can be obtained in high yield by dehydrochlorination of 3-chloropropionate derivatives having an isocyanate group under industrially advantageous and mild conditions, and the content of residual hydrolyzable chlorine can be reduced. A method for producing a (meth)acrylate derivative having an isocyanate group comprises performing dehydrochlorination of a 3-chloropropionate derivative having an isocyanate group in the presence of a basic nitrogen compound having a tertiary nitrogen, the tertiary nitrogen of the basic nitrogen compound having at least one group other than an aromatic ring group.

Abstract: The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.

Abstract: A process for preparing a high purity (meth)acryloyloxyalkyl isocyanate having a very small hydrolyzable chlorine content is provided. The high purity (meth)acryloyloxyalkyl isocyanate is prepared by subjecting a hydrolyzable chlorine containing (meth)acryloyloxyalkyl isocyanate to mixing treatment with an epoxy compound and an amine at a temperature of from 110 to 160° C. to prepare a mixture; and preparing a high purity (meth)acryloyloxyalkyl isocyanate from the resulting mixture with distillation. In particular, it is possible to effectively prevent (meth)acryloyloxyalkyl isocyanate from polymerization during the distillation by adding a polymerization inhibitor such as phenothiazine and the like.

Abstract: The present invention provides a stabilized (meth)acryloyloxyalkyl isocyanate, a process for stabilization thereof and a process for preparation of the same. More particularly, it provides a (meth)acryloyloxyalkyl isocyanate having a small hydrolyzable chlorine content and good storage stability, a process for stabilizing a (meth)acryloyloxyalkyl isocyanate prepared using phosgene which process comprises decreasing the amount of a hydrolyzable chlorine with purification and a process for preparation of a stabilized (meth)acryloyloxyalkyl isocyanate. An acidic gas such as carbon dioxide or the like was forcedly dissolved in (meth)acryloyloxyalkyl isocyanate, particularly (meth)acryloyloxyalkyl isocyanate which content of hydrolyzable chlorine is decreased with purification and thereby the storage stability of the (meth)acryloyloxyalkyl isocyanate is improved.

Abstract: A process for producing a fluorinated benzonitrile comprising hydrogenolyzing a fluorinated dicyanobenzene substituted with 1 to 4 fluorine atoms and having the remainder which may be substituted with a chlorine atom in the presence of a catalyst to cause hydrodecyanation of only the cyano group of one side and a process for producing a fluorinated benzyl alcohol comprising reducing the fluorinated benzonitrile and hydrolyzing the fluorinated benzonitrile and reducing the resultant corresponding fluorinated benzoic acid to convert the cyano group to a hydroxymethyl group.