Patents by Inventor Katsutoshi Takagi
Katsutoshi Takagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240142707Abstract: A virtual image display device includes a display panel being a display element configured to emit image light, a light-guiding member including a first total reflection surface and a second total reflection surface, a first diffraction element being provided on a light incidence side in association with the light-guiding member, a second diffraction element being provided on a light emission side in association with the light-guiding member, and a stray light suppression filter being provided on an external side of an image extraction part provided with the second diffraction element and being configured to limit passage of diffracted light from the second diffraction element.Type: ApplicationFiled: October 25, 2023Publication date: May 2, 2024Applicant: SEIKO EPSON CORPORATIONInventors: Katsutoshi INOMOTO, Mitsutaka IDE, Masayuki TAKAGI, Takashi TAJIRI
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Patent number: 9212418Abstract: The invention relates to an Al—Ni—La system Al-based alloy sputtering target where a total area of an Al—Ni system intermetallic compound having an average particle diameter of 0.3 ?m to 3 ?m with respect to a total area of the entire Al—Ni system intermetallic compound is 70% or more in terms of an area fraction, and a total area of an Al—La system intermetallic compound having an average particle diameter of 0.2 ?m to 2 ?m with respect to a total area of the entire Al—La system intermetallic compound is 70% or more in terms of an area fraction.Type: GrantFiled: October 31, 2007Date of Patent: December 15, 2015Assignees: Kobe Steel, Ltd., KOBELCO RESEARCH INSTITUTE, INC.Inventors: Masaya Ehira, Katsutoshi Takagi, Toshihiro Kugimiya, Yoichiro Yoneda, Hiroshi Gotou
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Patent number: 8936856Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: GrantFiled: April 2, 2012Date of Patent: January 20, 2015Assignee: Kobe Steel, Ltd.Inventors: Yuuki Tauchi, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Patent number: 8580093Abstract: The present invention provides a technique capable of decreasing a generation of splashing upon depositing by using an Al—Ni—La—Cu alloy sputtering target comprising Ni, La, and Cu. The invention relates to an Al—Ni—La—Cu alloy sputtering target comprising Ni, La and Cu, in which (1) a total area of an Al—Ni intermetallic compound mainly comprising Al and Ni and having an average grain size of 0.3 ?m or more and 3 ?m or less is 70% or more by area ratio based on an entire area of the Al—Ni intermetallic compound, and (2) a total area of an Al—La—Cu intermetallic compound mainly comprising Al, La and Cu and having an average grain size of 0.2 ?m or more and 2 ?m or less is 70% or more by area ratio based on an entire area of the Al—La—Cu intermetallic compound, in a case where a portion of the sputtering target is observed within a range of from ¼t (t: thickness) to ¾t along a cross section vertical to a plane of the sputtering target by using a scanning electron microscope at a magnification of 2000.Type: GrantFiled: March 31, 2009Date of Patent: November 12, 2013Assignees: Kobelco Research Institute Inc., Kobe Steel, Ltd.Inventors: Katsutoshi Takagi, Masaya Ehira, Yuki Iwasaki, Hiroshi Goto
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Publication number: 20130233706Abstract: There is provided an Al-based alloy sputtering target, which can provide an enhanced deposition rate (or sputtering rate) when the sputtering target is used, and which can preferably prevent the occurrence of splashes. The Al-based alloy sputtering target of the present invention includes Ta and may preferably include an Al—Ta-based intermetallic compound containing Al and Ta, which compound has a mean particle diameter of from 0.005 ?m to 1.0 ?m and a mean interparticle distance of from 0.01 ?m to 10.0 ?m.Type: ApplicationFiled: October 5, 2011Publication date: September 12, 2013Applicants: Kobelco Research Institute Inc., Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventors: Katsushi Matsumoto, Katsutoshi Takagi, Yuichi Taketomi, Junichi Nakai, Hidetada Makino, Toshiaki Takagi
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Publication number: 20120196118Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: ApplicationFiled: April 2, 2012Publication date: August 2, 2012Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)Inventors: Yuuki TAUCHI, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Publication number: 20120181172Abstract: Disclosed is a metal oxide-metal composite sputtering target which is useful for the formation of a recording layer for an optical information recording medium, said recording layer containing a metal oxide and a metal. Specifically disclosed is a composite sputtering target containing a metal oxide (A) and a metal (B), wherein the maximum value of the circle-equivalent diameter of the metal oxide (A) is controlled to 200 ?m or less.Type: ApplicationFiled: September 15, 2010Publication date: July 19, 2012Applicant: KOBELCO RESEARCH INSTITUTE, INC.Inventors: Hitoshi Matsuzaki, Katsutoshi Takagi, Norihiro Jiko, Masaya Ehira
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Patent number: 8178174Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: GrantFiled: October 29, 2010Date of Patent: May 15, 2012Assignee: Kobe Steel, Ltd.Inventors: Yuuki Tauchi, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Patent number: 8172961Abstract: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 ?m or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.Type: GrantFiled: August 23, 2010Date of Patent: May 8, 2012Assignees: Kobe Steel, Ltd., Kobelco Research Institute, Inc.Inventors: Toshihiro Kugimiya, Katsutoshi Takagi, Hitoshi Matsuzaki, Kotaro Kitashita, Yoichiro Yoneda
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Patent number: 8163143Abstract: The present invention relates to an Al—Ni—La—Si system Al-based alloy sputtering target including Ni, La and Si, in which, when a section from (¼)t to (¾)t (t: thickness) in a cross section vertical to a plane of the sputtering target is observed with a scanning electron microscope at a magnification of 2000 times, (1) a total area of an Al—Ni system intermetallic compound having an average particle diameter of 0.3 ?m to 3 ?m with respect to a total area of the entire Al—Ni system intermetallic compound is 70% or more in terms of an area fraction, the Al—Ni system intermetallic compound being mainly composed of Al and Ni; and (2) a total area of an Al—Ni—La—Si system intermetallic compound having an average particle diameter of 0.2 ?m to 2 ?m with respect to a total area of the entire Al—Ni—La—Si system intermetallic compound is 70% or more in terms of an area fraction, the Al—Ni—La—Si system intermetallic compound being mainly composed of Al, Ni, La, and Si.Type: GrantFiled: July 14, 2008Date of Patent: April 24, 2012Assignees: Kobe Steel, Ltd., Kobelco Research Institute, Inc.Inventors: Katsutoshi Takagi, Yuki Iwasaki, Masaya Ehira, Akira Nanbu, Mototaka Ochi, Hiroshi Goto, Nobuyuki Kawakami
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Patent number: 8123875Abstract: An Ag sputtering target 6 has three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering target 6 in planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values A1 and B1 using the formula below, and selecting larger one of the values A1 and B1 as the three-dimensional fluctuation of the grain sizes. A1=(Dmax?Dave)/Dave×100(%) B1=(Dave<Dmin)/Dave×100(%) Dmax: maximum value among the grain sizes D at all the selected locations Dmin: minimum value among the grain sizes D at all the selected locations Dave: average value of the grain sizes D at all the selected locations.Type: GrantFiled: June 3, 2010Date of Patent: February 28, 2012Assignees: Kabushiki Kaisha Kobe Seiko Sho, Kobelco Research Institute, Inc.Inventors: Katsutoshi Takagi, Junichi Nakai, Yuuki Tauchi, Hitoshi Matsuzaki, Hideo Fujii
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Publication number: 20110048936Abstract: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 ?m or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.Type: ApplicationFiled: August 23, 2010Publication date: March 3, 2011Applicants: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.), KOBELCO RESEARCH INSTITUTE, INC.Inventors: Toshihiro KUGIMIYA, Katsutoshi Takagi, Hitoshi Matsuzaki, Kotaro Kitashita, Yoichiro Yoneda
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Publication number: 20110042135Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: ApplicationFiled: October 29, 2010Publication date: February 24, 2011Applicant: Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.)Inventors: Yuuki TAUCHI, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Patent number: 7871686Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: GrantFiled: July 31, 2008Date of Patent: January 18, 2011Assignee: Kobe Steel, Ltd.Inventors: Yuuki Tauchi, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Publication number: 20100264018Abstract: An Ag sputtering target 6 has three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering target 6 in planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values A1 and B1 using the formula below, and selecting larger one of the values A1 and B1 as the three-dimensional fluctuation of the grain sizes.Type: ApplicationFiled: June 3, 2010Publication date: October 21, 2010Applicants: Kabushiki Kaisha Kobe Seiko Sho, KOBELCO RESEARCH INSTITUTE, INC.Inventors: Katsutoshi TAKAGI, Junichi Nakai, Yuuki Tauchi, Hitoshi Matsuzaki, Hideo Fujii
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Patent number: 7803238Abstract: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 ?m or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.Type: GrantFiled: January 30, 2006Date of Patent: September 28, 2010Assignees: Kobe Steel, Ltd., Kobelco Research Institute, Inc.Inventors: Toshihiro Kugimiya, Katsutoshi Takagi, Hitoshi Matsuzaki, Kotaro Kitashita, Yoichiro Yoneda
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Patent number: 7776420Abstract: The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.Type: GrantFiled: December 23, 2008Date of Patent: August 17, 2010Assignee: Kobe Steel, Ltd.Inventors: Yuuki Tauchi, Katsutoshi Takagi, Junichi Nakai, Toshiki Sato
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Publication number: 20100202280Abstract: There are provided an aluminum-alloy reflection film for optical information-recording, having low thermal conductivity, low melting temperature, and high corrosion resistance, capable of coping with laser marking, an optical information-recording medium comprising the reflection film described, and an aluminum-alloy sputtering target for formation of the reflection film described. The invention includes (1) an aluminum-alloy reflection film for optical information-recording, containing an element Al as the main constituent, 1.0 to 10.0 at. % of at least one element selected from the group of rare earth elements, and 0.5 to 5.0 at. % of at least one element selected from the group consisting of elements Cr, Ta, Ti, Mo, V, W, Zr, Hf, Nb, and Ni, (2) an optical information-recording medium comprising any of the aluminum-alloy reflection films described as above, and (3) a sputtering target having the same composition as that for any of the aluminum-alloy reflection films described as above.Type: ApplicationFiled: April 26, 2010Publication date: August 12, 2010Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventors: Junichi NAKAI, Yuuki TAUCHI, Katsutoshi TAKAGI
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Patent number: RE43590Abstract: Disclosed is an electrode for semiconductor devices capable of suppressing the generation of hillocks and reducing the resistivity, which is suitable for an active matrixed liquid crystal display and the like in which a thin film transistor is used; its fabrication method; and a sputtering target for forming the electrode film for semiconductor devices. The electrode for semiconductor devices is made of an Al alloy containing the one or more alloying elements selected from Fe, Co, Ni, Ru, Rh and Ir, in a total amount from 0.1 to 10 At %, or one or more alloying elements selected from rare earth elements, in a total amount from 0.05 to 15 at %.Type: GrantFiled: May 9, 2006Date of Patent: August 21, 2012Assignee: Kobelco Research Institute, Inc.Inventors: Seigo Yamamoto, Katsutoshi Takagi, Eiji Iwamura, Kazuo Yoshikawa, Takashi Oonishi
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Patent number: RE44239Abstract: Disclosed is an electrode for semiconductor devices capable of suppressing the generation of hillocks and reducing the resistivity, which is suitable for an active matrixed liquid crystal display and the like in which a thin film transistor is used; its fabrication method; and a sputtering target for forming the electrode film for semiconductor devices. The electrode for semiconductor devices is made of an Al alloy containing the one or more alloying elements selected from Fe, Co, Ni, Ru, Rh and Ir, in a total amount from 0.1 to 10 At %, or one or more alloying elements selected from rare earth elements, in a total amount from 0.05 to 15 at %.Type: GrantFiled: May 9, 2006Date of Patent: May 28, 2013Assignee: Kobelco Research Institute, Inc.Inventors: Seigo Yamamoto, Katsutoshi Takagi, Eiji Iwamura, Kazuo Yoshikawa, Takashi Oonishi