Patents by Inventor Katsuya Kawakami
Katsuya Kawakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8585112Abstract: A sample conveying mechanism minimizes a risk of damage to a sample typified particularly by a photomask, and the sample conveying mechanism provides the sample retention mechanism for holding the sample so as to be suspended and is configured such that a portion close to a pattern surface of the sample is separated from a projection section of a flange for suspending the sample, thereby inhibiting a contact between the pattern surface and members configuring the conveying mechanism.Type: GrantFiled: July 29, 2009Date of Patent: November 19, 2013Assignee: Hitachi High-Technologies CorporationInventors: Katsuya Kawakami, Masahiro Tsunoda, Takashi Gunji, Hidetoshi Sato
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Patent number: 8278908Abstract: A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.Type: GrantFiled: March 3, 2009Date of Patent: October 2, 2012Assignee: Hitachi High-Technologies CorporationInventors: Masahiro Tsunoda, Kouki Miyahara, Katsuya Kawakami, Takashi Gunji
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Patent number: 8173971Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.Type: GrantFiled: May 26, 2010Date of Patent: May 8, 2012Assignee: Hitachi High-Technologies CorporationInventors: Takashi Gunji, Hidetoshi Sato, Katsuya Kawakami, Hideki Yatabe
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Publication number: 20110198512Abstract: An object of the invention is to provide a charged corpuscular beam apparatus which is equipped with a static elimination mechanism suitable for eliminating electric charges deposited on front and back surfaces of a specimen. To achieve the foregoing object, there is proposed a static elimination mechanism which includes a first ionizer for eliminating electric charges from the front surface of the specimen, and a second ionizer for eliminating electric charges from the back surface of the specimen. The first and second ionizers are disposed in a mini-environment, and are arranged along a downflow in the mini-environment. A specimen carrying mechanism is disposed so that the specimen can pass between the two ionizers.Type: ApplicationFiled: October 15, 2009Publication date: August 18, 2011Inventors: Koki Miyahara, Katsuya Kawakami, Masahiro Tsunoda, Takashi Gunji
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Publication number: 20110142578Abstract: A sample conveying mechanism minimizes a risk of damage to a sample typified particularly by a photomask, and the sample conveying mechanism provides the sample retention mechanism for holding the sample so as to be suspended and is configured such that a portion close to a pattern surface of the sample is separated from a projection section of a flange for suspending the sample, thereby inhibiting a contact between the pattern surface and members configuring the conveying mechanism.Type: ApplicationFiled: July 29, 2009Publication date: June 16, 2011Inventors: Katsuya Kawakami, Masahiro Tsunoda, Takashi Gunji, Hidetoshi Sato
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Publication number: 20100230592Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.Type: ApplicationFiled: May 26, 2010Publication date: September 16, 2010Applicant: Hitachi High-Technologies CorporationInventors: Takashi GUNJI, Hidetoshi Sato, Katsuya Kawakami, Hideko Yatabe
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Patent number: 7737416Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.Type: GrantFiled: February 27, 2008Date of Patent: June 15, 2010Assignee: Hitachi High-Technologies CorporationInventors: Takashi Gunji, Hidetoshi Sato, Katsuya Kawakami, Hideki Yatabe
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Publication number: 20090224749Abstract: A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.Type: ApplicationFiled: March 3, 2009Publication date: September 10, 2009Inventors: Masahiro Tsunoda, Kouki Miyahara, Katsuya Kawakami, Takashi Gunji
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Publication number: 20080203302Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.Type: ApplicationFiled: February 27, 2008Publication date: August 28, 2008Applicant: Hitachi High-Technologies CorporationInventors: Takashi Gunji, Hidetoshi Sato, Katsuya Kawakami, Hideki Yatabe
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Patent number: 6042667Abstract: A method of fabricating a ceramic multilayer substrate includes steps of laminating a plurality of green sheets including an inside green sheet formed with a conductor pattern and pressing a laminate of green sheets under a predetermined pressure together with sheet restricting members applied to opposite surfaces of the laminate respectively, thereby bonding the laminate and sheet restricting members together, each sheet restricting member having a smaller percent change in thickness than the green sheets during the bonding and a higher firing temperature than the green sheets, firing a bonded assemblage of the green sheets and sheet restricting members at a firing temperature of the green sheets, and removing the sheet restricting members from the opposite surfaces of a fired body.Type: GrantFiled: March 3, 1997Date of Patent: March 28, 2000Assignee: Sumotomo Metal Electronics Devices, Inc.Inventors: Satoru Adachi, Junzo Fukuta, Katsuya Kawakami, Seigo Ooiwa
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Patent number: 5847326Abstract: A low-temperature fired ceramic circuit substrate includes a plurality of laminated insulating layers each formed of a low-temperature fired ceramic fired at a temperature ranging between 800 and 1,000.degree. C., an inside layer wiring conductor formed of a conductive material of Ag system which is mainly composed of Ag, the inside layer wiring conductor being disposed in the inside insulating layer, a surface layer wiring conductor formed of a conductive material of Au system which is mainly composed of Au, the surface layer wiring conductor being disposed on the surface insulating layer, and an intermediate metal layer formed of a thick film paste of a conductive material of Au/Ag system which is mainly composed of Au/Ag, the intermediate metal layer being interposed between the inside layer wiring conductor and the surface layer wiring conductor.Type: GrantFiled: March 3, 1997Date of Patent: December 8, 1998Assignee: Sumitomo Metal Electronics Devices Inc.Inventors: Katsuya Kawakami, Junzo Fukuta