Patents by Inventor Katsuya Nakai
Katsuya Nakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11225446Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: GrantFiled: April 8, 2021Date of Patent: January 18, 2022Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
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Publication number: 20210221757Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: ApplicationFiled: April 8, 2021Publication date: July 22, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
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Patent number: 11001545Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: GrantFiled: February 2, 2018Date of Patent: May 11, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
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Publication number: 20200172456Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.Type: ApplicationFiled: February 7, 2020Publication date: June 4, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shingo NAKAMURA, Yuusuke ETOU, Seiji TAKUBO, Katsuya NAKAI
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Patent number: 10597343Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.Type: GrantFiled: June 3, 2016Date of Patent: March 24, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shingo Nakamura, Yuusuke Etou, Seiji Takubo, Katsuya Nakai
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Publication number: 20200010389Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: ApplicationFiled: February 2, 2018Publication date: January 9, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
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Publication number: 20180141886Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.Type: ApplicationFiled: June 3, 2016Publication date: May 24, 2018Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shingo NAKAMURA, Yuusuke ETOU, Seiji TAKUBO, Katsuya NAKAI
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Patent number: 8157899Abstract: A particulate material processing apparatus has a vessel and a processing tank. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The upper part of the processing tank has lower gas permeability than the lower part of the processing tank.Type: GrantFiled: November 14, 2008Date of Patent: April 17, 2012Assignee: Daikin Industries, Ltd.Inventors: Tomohiro Isogai, Katsuya Nakai, Tatsuo Suzuki, Taku Hirakawa, Hiroyuki Shimada
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Patent number: 8007736Abstract: A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.Type: GrantFiled: November 17, 2008Date of Patent: August 30, 2011Assignee: Daikin Industries, Ltd.Inventors: Taku Hirakawa, Tomohiro Isogai, Katsuya Nakai, Tatsuo Suzuki, Hiroyuki Shimada
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Patent number: 7566762Abstract: The present invention relates to a process for preparing a fluoropolymer containing at least one kind of fluoroolefin, which comprises carrying out polymerization in the presence of a surfactant represented by the formula (1): (wherein R1 and R2 may be the same or different respectively, and represent an alkyl group or an alkenyl group, R3 is a hydrogen atom, an alkyl group or an alkenyl group, the total carbon number of R1 to R3 is 2 to 25, L? is a group represented by —SO3?, —OSO3?, —PO3?, —OPO3? or —COO?, and M+ is a monovalent cation). Thereby, polymerization can be carried out with excellent production efficiency in the presence of a small amount of a surfactant, and a fluoropolymer can be prepared without lowering various physical properties such as water resistance by the surfactant.Type: GrantFiled: December 22, 2004Date of Patent: July 28, 2009Assignee: Daikin Industries, Ltd.Inventors: Masao Otsuka, Satoshi Tokuno, Katsuya Nakai
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Publication number: 20090126571Abstract: A particulate material processing apparatus has a vessel and a processing tank. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The upper part of the processing tank has lower gas permeability than the lower part of the processing tank.Type: ApplicationFiled: November 14, 2008Publication date: May 21, 2009Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tomohiro Isogai, Katsuya Nakai, Tatsuo Suzuki, Taku Hirakawa, Hiroyuki Shimada
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Publication number: 20090126217Abstract: A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.Type: ApplicationFiled: November 17, 2008Publication date: May 21, 2009Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Taku Hirakawa, Tomohiro Isogai, Katsuya Nakai, Tatsuo Suzuki, Hiroyuki Shimada
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Publication number: 20070149733Abstract: The present invention relates to a process for preparing a fluoropolymer containing at least one kind of fluoroolefin, which comprises carrying out polymerization in the presence of a surfactant represented by the formula (1): (wherein R1 and R2 may be the same or different respectively, and represent an alkyl group or an alkenyl group, R3 is a hydrogen atom, an alkyl group or an alkenyl group, the total carbon number of R1 to R3 is 2 to 25, L? is a group represented by —SO3?, —OSO3?, —PO3?, —OPO3? or —COO?, and M+ is a monovalent cation). Thereby, polymerization can be carried out with excellent production efficiency in the presence of a small amount of a surfactant, and a fluoropolymer can be prepared without lowering various physical properties such as water resistance by the surfactant.Type: ApplicationFiled: December 22, 2004Publication date: June 28, 2007Inventors: Masao Otsuka, Satoshi Tokuno, Katsuya Nakai
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Patent number: 4860523Abstract: The hermetic packaging apparatus comprises a nozzle for reducing pressure in a thermoplastic packaging bag containing certain contents, the nozzle reduces pressure in the packaging bag by the pressure control of the air pump and the water sucked from the contents is directed to a strainer tank. Thereafter, the nozzle moves backward, the opening of the packaging bag is heated by a heating element, and an airtight pressure connecting bar is pressured downward so that the opening portion is heat-sealed by the airtight pressure connecting bar and the sealing base.Type: GrantFiled: October 30, 1987Date of Patent: August 29, 1989Assignees: Sharp Kabushiki Kaisha, Nihon Dennetsu Co., Ltd.Inventors: Iwao Teteishi, Yoshiyuki Ogura, Takeshi Hashimoto, Tuguyoshi Ritou, Katsufumi Kajiyama, Fumiaki Shimizu, Kenji Tanaka, Yutaka Aibara, Hiroaki Kataoka, Katsuya Nakai, Takashi Yoshikawa, Masaaki Kanamori, Masao Miyajima, Shuzo Seki, Sadanobu Takahashi