Abstract: A loading unit which elevates a substrate holder holding a plurality of substrates to be subjected to heat treatment with respect to a cylindrical processing container whose bottom portion is opened and closed by a cap, includes, a loading housing, an elevator mechanism elevating the substrate holder, a shutter closing an opening of the bottom of the processing container, a substrate moving and loading mechanism having an elevatable moving and loading arm, a first partitioning box installed to surround the elevator mechanism and a moving space of the elevated substrate holder and provided with a cooling gas injecting means, a second partitioning box connected to the first partitioning box and is installed to surround the substrate moving and loading mechanism and a moving space of the substrate moving and loading mechanism, and a third partitioning box connected to the first partitioning box and is installed to surround the shutter.

Abstract: A vertical thermal processing apparatus including: a substrate supporter; a transfer mechanism to transfer substrates between the substrate supporter and a container; and a thermal processing furnace to process substrates that have been loaded thereinto with the substrate supporter. The substrate supporter includes: support columns located at intervals therebetween to surround the substrates, supporting parts for substrate and supporting parts for annular plate provided at the support columns in a tier-like manner, for alternately supporting peripheral parts of the substrates and of annular plates at predetermined intervals therebetween, and annular plates to be supported by the supporting parts for annular plate, when seen from a direction in which the substrates are transferred. Each of the annular plates has an intermediate part having a thickness smaller than thicknesses of the peripheral parts thereof to be supported by the support columns.

Abstract: A loading unit which elevates a substrate holder holding a plurality of substrates to be subjected to heat treatment with respect to a cylindrical processing container whose bottom portion is opened and closed by a cap, includes, a loading housing, an elevator mechanism elevating the substrate holder, a shutter closing an opening of the bottom of the processing container, a substrate moving and loading mechanism having an elevatable moving and loading arm, a first partitioning box installed to surround the elevator mechanism and a moving space of the elevated substrate holder and provided with a cooling gas injecting means, a second partitioning box connected to the first partitioning box and is installed to surround the substrate moving and loading mechanism and a moving space of the substrate moving and loading mechanism, and a third partitioning box connected to the first partitioning box and is installed to surround the shutter.

Abstract: A substrate support instrument includes a first support instrument portion and a second support instrument portion detachably combined with each other. Each of the first support instrument portion and second support instrument portion includes: a ceiling plate and a bottom plate facing each other upward and downward; a support pillar disposed in plurality along a peripheral edge portion of each of the ceiling plate and bottom plate, and configured to connect the ceiling plate and the bottom plate; and a support part disposed at a position corresponding to each of the support pillars, and configured to support a bottom of each substrate. In the support part, a height position is set such that a substrate supported in the first support instrument portion and a substrate supported in the second support instrument portion are alternately arranged, when the first support instrument portion is combined with the second support instrument portion.

Abstract: A vertical thermal processing apparatus including: a substrate supporter; a transfer mechanism to transfer substrates between the substrate supporter and a container; and a thermal processing furnace to process substrates that have been loaded thereinto with the substrate supporter. The substrate supporter includes: support columns located at intervals therebetween to surround the substrates, supporting parts for substrate and supporting parts for annular plate provided at the support columns in a tier-like manner, for alternately supporting peripheral parts of the substrates and of annular plates at predetermined intervals therebetween, and annular plates to be supported by the supporting parts for annular plate, when seen from a direction in which the substrates are transferred. Each of the annular plates has an intermediate part having a thickness smaller than thicknesses of the peripheral parts thereof to be supported by the support columns.

Abstract: A vertical heat-processing apparatus (1) includes a vertical heat-processing furnace (2) having a furnace port (3), a lid (5) movable up and down to open and close the furnace port, and a rotation mechanism (15) disposed on the lid to rotate a holder (13) that holds a number of target substrates (W). The rotation mechanism (15) includes a rotary shaft (16), and a support unit (19) that supports the rotary shaft (16) rotatably through a bearing (17) and sealing member (18). The rotary shaft (16) has a hollow structure with a thin wall, and is supplied with a cooling gas to flow inside and outside the rotary shaft. The support unit (19) has a cooling passage (32) surrounding an upper portion of the rotary shaft (16), and is supplied with a coolant to flow through the cooling passage.

Abstract: A vertical heat-processing apparatus (1) includes a vertical heat-processing furnace (2) having a furnace port (3), a lid (5) movable up and down to open and close the furnace port, and a rotation mechanism (15) disposed on the lid to rotate a holder (13) that holds a number of target substrates (W). The rotation mechanism (15) includes a rotary shaft (16), and a support unit (19) that supports the rotary shaft (16) rotatably through a bearing (17) and sealing member (18). The rotary shaft (16) has a hollow structure with a thin wall, and is supplied with a cooling gas to flow inside and outside the rotary shaft. The support unit (19) has a cooling passage (32) surrounding an upper portion of the rotary shaft (16), and is supplied with a coolant to flow through the cooling passage.