Patents by Inventor Katsuyoshi Aikawa

Katsuyoshi Aikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11085113
    Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: August 10, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hitoshi Kato, Shigehiro Miura, Hiroyuki Kikuchi, Katsuyoshi Aikawa
  • Patent number: 10683573
    Abstract: A film forming apparatus of forming a film by supplying a process gas onto a substrate includes a rotation table having a loading region and is configured to revolve the substrate loaded on the loading region; a process gas supply mechanism configured to supply the process gas to a gas supply region to perform film formation on the substrate repeatedly passing through the gas supply region a plurality of times by revolution of the substrate; a first gear disposed on the other surface side of the rotation table and rotated in a rotation direction of the rotation table; a second gear configured with planetary gears engaging with the first gear, disposed to be revolved together with the loading region, and configured to rotate the loading region so as to allow the substrate to be rotated.
    Type: Grant
    Filed: November 10, 2015
    Date of Patent: June 16, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hitoshi Kato, Shigehiro Miura, Hiroyuki Kikuchi, Katsuyoshi Aikawa
  • Patent number: 10428425
    Abstract: A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: October 1, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Katsuhiko Oyama, Kiichi Takahashi, Yasushi Takeuchi, Katsuyoshi Aikawa
  • Publication number: 20180327906
    Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.
    Type: Application
    Filed: June 28, 2018
    Publication date: November 15, 2018
    Inventors: Hitoshi KATO, Shigehiro MIURA, Hiroyuki KIKUCHI, Katsuyoshi AIKAWA
  • Patent number: 10072336
    Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: September 11, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hitoshi Kato, Shigehiro Miura, Hiroyuki Kikuchi, Katsuyoshi Aikawa
  • Publication number: 20170241018
    Abstract: A film deposition apparatus includes a chamber and a turntable provided in the chamber. The turntable includes a concave portion in its upper surface. A bottom portion of the concave portion has a through hole. A substrate supporting member is detachably placed on the concave portion so that a lower surface thereof is exposed from the through hole, and includes a substrate receiving portion. A drive mechanism moves up and down and rotates the turntable. A rotary unit rotatable by air is provided under the turntable. An air supply unit is provided. A controller causes the drive mechanism to rotate and move down the turntable so that the rotary unit supports the exposed lower surface of the substrate supporting member. The controller causes the air supply unit to supply air to the rotary unit so that the substrate supporting member rotates a predetermined angle relative to the turntable.
    Type: Application
    Filed: February 16, 2017
    Publication date: August 24, 2017
    Inventors: Katsuhiko OYAMA, Kiichi TAKAHASHI, Yasushi TAKEUCHI, Katsuyoshi AIKAWA
  • Publication number: 20170211181
    Abstract: A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.
    Type: Application
    Filed: January 24, 2017
    Publication date: July 27, 2017
    Inventors: Katsuhiko OYAMA, Kiichi TAKAHASHI, Yasushi TAKEUCHI, Katsuyoshi AIKAWA
  • Patent number: 9404184
    Abstract: A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light upwards, an illumination reflecting plate provided above the illumination device and including a reflecting surface to reflect the light from the illumination device towards the window, and a reflection restricting part provided on the reflecting surface to form a shadow in a predetermined region that includes the target inside the chamber.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: August 2, 2016
    Assignee: Tokyo Electron Limited
    Inventor: Katsuyoshi Aikawa
  • Publication number: 20160138159
    Abstract: A film forming apparatus of forming a film by supplying a process gas onto a substrate includes a rotation table having a loading region and is configured to revolve the substrate loaded on the loading region; a process gas supply mechanism configured to supply the process gas to a gas supply region to perform film formation on the substrate repeatedly passing through the gas supply region a plurality of times by revolution of the substrate; a first gear disposed on the other surface side of the rotation table and rotated in a rotation direction of the rotation table; a second gear configured with planetary gears engaging with the first gear, disposed to be revolved together with the loading region, and configured to rotate the loading region so as to allow the substrate to be rotated.
    Type: Application
    Filed: November 10, 2015
    Publication date: May 19, 2016
    Inventors: Hitoshi KATO, Shigehiro MIURA, Hiroyuki KIKUCHI, Katsuyoshi AIKAWA
  • Publication number: 20160122872
    Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.
    Type: Application
    Filed: October 29, 2015
    Publication date: May 5, 2016
    Inventors: Hitoshi KATO, Shigehiro MIURA, Hiroyuki KIKUCHI, Katsuyoshi AIKAWA
  • Patent number: 8854449
    Abstract: A substrate position detection method includes rotating the susceptor so that the substrate receiving portion is moved into an image taking area of a imaging apparatus; detecting first two position detection marks provided in the process chamber so that the first two position detection marks are within the image taking area, wherein a first perpendicular bisector of the first two position detection marks passes through a rotational center of the susceptor; detecting second two position detection marks provided in the susceptor so that the second two position detection marks can be within the image taking area, wherein a second perpendicular bisector of the second two position detection marks passes through the rotational center of the susceptor and a center of the substrate receiving portion; and determining whether the substrate receiving portion is positioned in a predetermined range in accordance with the detected first two and second two position detection marks.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: October 7, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Katsuyoshi Aikawa, Manabu Honma
  • Publication number: 20140174351
    Abstract: A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light upwards, an illumination reflecting plate provided above the illumination device and including a reflecting surface to reflect the light from the illumination device towards the window, and a reflection restricting part provided on the reflecting surface to form a shadow in a predetermined region that includes the target inside the chamber.
    Type: Application
    Filed: December 12, 2013
    Publication date: June 26, 2014
    Applicant: Tokyo Electron Limited
    Inventor: Katsuyoshi AIKAWA
  • Patent number: 8394200
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: March 12, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiroyuki Matsuura, Toshiki Takahashi, Jun Sato, Katsuyoshi Aikawa, Katsutoshi Ishii
  • Publication number: 20130047923
    Abstract: A disclosed film deposition apparatus which forms a film on a substrate inside a vacuum chamber including a turntable having a substrate mounting area, includes an antenna facing the substrate mounting area for converting the plasma generating gas to plasma, a Faraday shield intervening between the antenna and the substrate to prevent an electric field of an electromagnetic field from passing therethrough, the Faraday shield including slits arranged on the conductive plate parallel to the antenna, the slits being opened on the conductive plate in perpendicular to a direction of arranging the slits to enable a magnetic field to reach the substrate, a window opened in an area of the conductive plate surrounded by the slits, an inner conductive path between the slits and the window and grounded, and an outer conductive path on a side opposite to the window relative to the slits and surrounds the slits.
    Type: Application
    Filed: August 17, 2012
    Publication date: February 28, 2013
    Applicant: Tokyo Electron Limited
    Inventors: Hitoshi KATO, Takeshi KOBAYASHI, Shigehiro USHIKUBO, Katsuyoshi AIKAWA
  • Publication number: 20120075460
    Abstract: A substrate position detection method includes rotating the susceptor so that the substrate receiving portion is moved into an image taking area of a imaging apparatus; detecting first two position detection marks provided in the process chamber so that the first two position detection marks are within the image taking area, wherein a first perpendicular bisector of the first two position detection marks passes through a rotational center of the susceptor; detecting second two position detection marks provided in the susceptor so that the second two position detection marks can be within the image taking area, wherein a second perpendicular bisector of the second two position detection marks passes through the rotational center of the susceptor and a center of the substrate receiving portion; and determining whether the substrate receiving portion is positioned in a predetermined range in accordance with the detected first two and second two position detection marks.
    Type: Application
    Filed: September 20, 2011
    Publication date: March 29, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Katsuyoshi AIKAWA, Manabu HONMA
  • Publication number: 20100124610
    Abstract: A disclosed substrate position detection apparatus includes an imaging portion configured to take an image of a substrate subject to a position detection; a panel member provided between the imaging portion and the substrate and including a first opening that ensures a field of view for the imaging portion with respect to the substrate, the panel member having a light scattering property; a first illuminating portion configured to illuminate the panel member; and a processing portion capable of determining a position of the substrate in accordance with the image taken through the first opening by the imaging portion.
    Type: Application
    Filed: November 13, 2009
    Publication date: May 20, 2010
    Inventors: KATSUYOSHI AIKAWA, MANABU HONMA
  • Publication number: 20100055312
    Abstract: In a film deposition apparatus which deposits a thin film on a substrate by supplying first and second reactive gases in a vacuum chamber, there are provided a turntable, a first reactive gas supplying portion and a second reactive gas supplying portion which are arranged to extend from circumferential positions of the turntable to a center of rotation of the turntable, a first separation gas supplying portion arranged between the first and second reactive gas supplying portions, a first space having a first height and including the first separation gas supplying portion, a second space having a second height and including the second reactive gas supplying portion, a third space having a height lower than the first height and the second height and including the first separation gas supplying portion, a position detecting unit detecting a rotation position of the turntable, and a detection part arranged at a circumferential portion of the turntable and detected by the position detecting unit.
    Type: Application
    Filed: September 2, 2009
    Publication date: March 4, 2010
    Inventors: HITOSHI KATO, Manabu Honma, Tomoki Haneishi, Katsuyoshi Aikawa
  • Publication number: 20090078201
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.
    Type: Application
    Filed: November 25, 2008
    Publication date: March 26, 2009
    Inventors: Hiroyuki Matsuura, Toshiki Takahashi, Jun Sato, Katsuyoshi Aikawa, Katsutoshi Ishii
  • Publication number: 20070240644
    Abstract: A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.
    Type: Application
    Filed: March 22, 2007
    Publication date: October 18, 2007
    Inventors: Hiroyuki Matsuura, Toshiki Takahashi, Jun Sato, Katsuyoshi Aikawa, Katsutoshi Ishii
  • Patent number: 7022335
    Abstract: A suppository of retaining in a lower region of rectum, which contains a suppository base containing: (A) a fatty acid triglyceride, (B) one or more C14-18 fatty acid glycerides, and (C) a base ingredient for retaining the suppository in the lower region of rectum, has quite high safety, does not melt by the body temperature when it is held by the fingers before insertion into the rectum so that it is easy to handle, does not deform by elevation of temperature during storage, and prevents stimulation to the rectum mucosa such as congestive hemorrhage and expansion of the rectum mucosa after the insertion.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: April 4, 2006
    Assignee: Taisho Pharmaceutical Co., Ltd.
    Inventors: Seiichi Hori, Katsuyoshi Aikawa