Abstract: The field of view of an objective lens is divided into two areas, and a transmission image of a photomask and a composite image obtained by optically synthesizing a transmission image and a reflection image of the photomask are picked up in parallel. A drop image generated at an edge portion of a pattern portion in the composite image is deleted by limiter processing or masking processing, or is deleted by using primary-differentiated signals of a composite image signal and a transmission image signal.

Abstract: The field of view of an objective lens is divided into two areas, and a transmission image of a photomask and a composite image obtained by optically synthesizing a transmission image and a reflection image of the photomask are picked up in parallel. A drop image generated at an edge portion of a pattern portion in the composite image is deleted by limiter processing or masking processing, or is deleted by using primary-differentiated signals of a composite image signal and a transmission image signal.

Abstract: A pattern inspection method includes the steps of: copying design data representative of a design pattern in a storage unit; generating index data and storing the index data in the storage unit, the index data indicating data at what position of the design pattern is stored at which location of the storage unit; picking up an image of a real pattern on a stage and generating real pattern data; reading the design data by using the index data in accordance with a position on the real pattern; generating design pattern data in accordance with the read design data; and comparing the real pattern data with the design pattern data to detect any defect in the real pattern data. A pattern inspection method and system is provided which can perform die-to-database inspection at high speed.