Patents by Inventor Katsuyoshi Oh-Ishi

Katsuyoshi Oh-Ishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7828879
    Abstract: A carbon dioxide-absorbing material containing lithium titanate, the lithium titanate comprising 70 mol % or more of Li4TiO4 and 30 mol % or less of Li2TiO3. Furthermore, the carbon dioxide-absorbing material is obtained by the method for producing a carbon dioxide-absorbing material described below. That is, the absorbing material is obtained by the production method which produces the same by mixing given raw materials such that the atomic ratio between lithium and titanium is from 3.5 to 5.0, and subjecting the resulting mixture to heat treatment. The method for absorbing carbon dioxide includes a carbon dioxide absorption step. The apparatus for absorbing carbon dioxide is provided with carbon dioxide absorption means that absorbs carbon dioxide in the carbon dioxide-absorbing material.
    Type: Grant
    Filed: September 15, 2006
    Date of Patent: November 9, 2010
    Assignee: Chuo University
    Inventors: Katsuyoshi Oh-Ishi, Nobuaki Togashi
  • Publication number: 20090107334
    Abstract: A carbon dioxide-absorbing material that can greatly improve an absorption amount of carbon dioxide up to near the theoretical value, a method for producing the carbon dioxide-absorbing material, a method of absorbing carbon dioxide using the carbon dioxide-absorbing material, and an apparatus for absorbing carbon dioxide are provided. The carbon dioxide-absorbing-material of the present invention contains lithium titanate, the lithium titanate comprising 70 mol % or more of Li4TiO4 and 30 mol % or less of Li2TiO3. Furthermore, the carbon dioxide-absorbing material of the invention is obtained by the method for producing a carbon dioxide-absorbing material of the invention described below. That is, the absorbing material is obtained by the production method of the invention which produces the same by mixing given raw materials such that the atomic ratio between lithium and titanium is from 3.5 to 5.0, and subjecting the resulting mixture to heat treatment.
    Type: Application
    Filed: September 15, 2006
    Publication date: April 30, 2009
    Applicant: Chuo University
    Inventors: Katsuyoshi Oh-ishi, Nobuaki Togashi
  • Patent number: 5641718
    Abstract: Disclosed is a sintered aluminum nitride composition and a circuit substrate for use in semiconductor device. The sintered aluminum nitride composition comprises: aluminum nitride; a first component given by a compound containing an element which is selected from the group consisting of alkaline earth elements and group IIIa elements of the periodic table; a second component made of either a simple silicon or a silicon-containig compound; and a third component made of either a simple manganese or a manganese-containing compound. The circuit substrate has an insulating layer which is compoesd of the above-described sintered aluminum nitride composition, and an electrically conductive layer containing an electrically conductive material and the same components as those of the insulating layer.
    Type: Grant
    Filed: August 30, 1995
    Date of Patent: June 24, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akihiro Horiguchi, Katsuyoshi Oh-Ishi, Mitsuo Kasori, Hiroyasu Sumino, Fumio Ueno, Jun Monma, Kazuo Kimura
  • Patent number: 5622769
    Abstract: According to this invention, there is disclosed a thermal conductivity substrate which includes an aluminum nitride sintered body and a coating layer formed on the body of aluminum phosphate and having a surface roughness of 1 .mu.m or less, and which has excellent humidity resistance and chemical resistance.
    Type: Grant
    Filed: February 10, 1994
    Date of Patent: April 22, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shoji Kozuka, Masaru Hayashi, Katsuyoshi Oh-Ishi, Takaaki Yasumoto, Nobuo Iwase, Hiroshi Endo, Koji Yamakawa, Kaoru Koiwa, Kiyoshi Iyogi
  • Patent number: 5616956
    Abstract: Disclosed is a circuit substrate and a semiconductor device to which the circuit substrate is applied. The circuit substrate has an insulating layer and an electrically conductive layer. The insulating layer is composed of a sintered aluminum nitride composition containing: aluminum nitride; a first component given by a compound containing an element which is selected from the group consisting of group IIa elements and group IIIa elements of the periodic table; a second component given by either a simple boron or a boron compound; and a third component give by either a simple manganese or a manganese compound. The electrically conductive layer contains: a conductive component given by a metal or an electrically conductive compound for exhibiting electric conductivity; aluminum nitride; the first component; the second component; and the third component.
    Type: Grant
    Filed: September 7, 1995
    Date of Patent: April 1, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akihiro Horiguchi, Jun Monma, Kazuo Kimura, Katsuyoshi Oh-Ishi, Fumio Ueno, Mitsuo Kasori, Hiroyasu Sumino
  • Patent number: 5509558
    Abstract: A metal oxide resistor for suppressing variations in resistivity in use in an atmosphere at a high temperature or humidity. Such a metal oxide resistor includes a sintered body in which carbon particles having an average grain size of 1 .mu.m or less exist in the grain boundaries of metal oxide particles in an amount of 0.05 to 3 wt %, and electrodes formed on at least two opposing surfaces of the sintered body.
    Type: Grant
    Filed: July 15, 1994
    Date of Patent: April 23, 1996
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Tungaloy Co., Ltd.
    Inventors: Motomasa Imai, Naoki Shutoh, Katsuyoshi Oh-Ishi, Fumio Ueno, Hideo Ohkuma, Yuji Katsumura, Masaki Kobayashi, Toshiyuki Takahashi
  • Patent number: 5500395
    Abstract: Disclosed is an aluminum nitride sintered body which has a high thermal conductivity and a high strength and which can be manufactured through low-temperature, short-time sintering. This aluminum nitride sintered body has an average grain size of aluminum nitride grains of 2 .mu.m or less, a thermal conductivity of 80 W/m.K or more, and a relative density of 98% or more.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: March 19, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Fumio Ueno, Mitsuo Kasori, Akihiro Horiguchi, Katsuyoshi Oh-Ishi
  • Patent number: 5409869
    Abstract: Disclosed is an aluminum nitride sintered body which has a high thermal conductivity and a high strength and which can be manufactured through low-temperature, short-time sintering. This aluminum nitride sintered body has an average grain size of aluminum nitride grains of 2 .mu.m or less, a thermal conductivity of 80 W/m.K or more, and a relative density of 98% or more.
    Type: Grant
    Filed: November 18, 1993
    Date of Patent: April 25, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Fumio Ueno, Mitsuo Kasori, Akihiro Horiguchi, Katsuyoshi Oh-Ishi