Abstract: A main chamber is provided through which a workpiece is loaded or unloaded. A second chamber is provided within the main chamber to cover the workpiece during evacuation and gas introduction processes performed within the main chamber. The second chamber protects the workpiece from floating dust deposited on parts within the main chamber and blown about by a turbulent flow of introduced or evacuated gas therein. The second chamber can be shaped like a bell jar and is made as small as possible. A driving circuit lifts the bell jar up and down. The gas pressure within the second chamber is maintained greater than or equal to that of the main chamber by a pressure control circuit to prevent dust intrusion into the second chamber. A slow leak circuit is provided as a pressure control device by forming a loose vacuum-seal between the second chamber and the main chamber. A gas introduction circuit and/or evacuation circuit may be connected to the second chamber.

Abstract: A spinner mainly used for spinning treatment of a semiconductor wafer, having a means for generating supersonic power to be transmitted to a supersonic vibration transducer embedded inside a spinning disk so that the supersonic vibration is applied to a processing liquid material dispensed on a work piece held on the center portion of the rotating spinning disk. As a result, particles or air bubbles of small size involved in the layer of liquid material are effectively removed from the liquid layer, resulting in improving fabrication yield and reliability of the product.