Abstract: A process for producing an iron ore having a sulfur content reduced to 0.08% or less, which includes a step of subjecting an iron ore containing sulfur in an amount of more than 0.08% and 2% or less to a flotation. The flotation satisfies any one of the following (1) to (3): (1) a xanthate-based compound and a salt of an amine compound are used as collectors, (2) a xanthate-based compound is used as a collector and a substance which releases a sulfur ion in water is used as an activator, or (3) a xanthate-based compound and a salt of an amine compound are used as collectors and a substance which releases a sulfur ion in water is used as an activator.

Abstract: A method for upgrading an ilmenite ore for yielding a high-TiO2-content titanium source by separating and removing an iron component from ilmenite (FeTiO3), which includes an oxidation step of oxidizing a starting ilmenite; after the oxidation step, a reduction step of reducing the treated ilmenite; and after the reduction step, an extraction step of dissolving the iron component with an acid, to thereby remove the iron component. Also disclosed is a production method for producing a high-TiO2-content titanium source, which includes upgrading an ilmenite ore as described above, and a high-TiO2-content titanium source produced through the production method.

Abstract: A process for producing an iron ore having a sulfur content reduced to 0.08% or less, which includes a step of subjecting an iron ore containing sulfur in an amount of more than 0.08% and 2% or less to a flotation. The flotation satisfies any one of the following (1) to (3): (1) a xanthate-based compound and a salt of an amine compound are used as collectors, (2) a xanthate-based compound is used as a collector and a substance which releases a sulfur ion in water is used as an activator, or (3) a xanthate-based compound and a salt of an amine compound are used as collectors and a substance which releases a sulfur ion in water is used as an activator.

Abstract: The first purpose of the present invention is to provide a method for producing metallic iron, whereby, in the production of metallic iron by heating an agglomerate, which comprises an iron oxide-containing material and a carbonaceous reductant, in a movable hearth type heating furnace, metallic iron can be efficiently collected from a reduced product containing metallic iron and a slag, said reduced product being obtained by heating the agglomerate.

Abstract: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.

Abstract: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.

Abstract: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.

Abstract: Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.

Abstract: Anodic oxidation coatings are selectively removed from anodic oxidation-treated aluminum or aluminum alloy members by immersion in a solution composition. By using a remover composition characterized by containing phosphoric acid and a molybdate salt, it is possible to selectively remove the anodic oxidation coatings from the aluminum or aluminum alloy members without substantially dissolving the basis metal aluminum or aluminum alloy.

Abstract: A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including carbon dioxide, an additive for removing the residues and a co-solvent dissolving the additive in said carbon dioxide at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. A composition for removing residues from the microstructure of an object is also provided.

Abstract: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.

Abstract: The present invention provides a method for cleaning a microstructure capable of efficiently removing pollutants such as resist residue without causing damage to a substance such as a low-k film which is necessary for a semiconductor wafer. The cleaning method includes fluidizing a cleaning agent composition essentially containing carbon dioxide and a cleaning component under high pressure, and bringing the cleaning agent composition into contact with a microstructure to remove a substance adhering to the microstructure, wherein hydrogen fluoride is used as the cleaning component.

Abstract: In a high pressure processing method for removing an unnecessary substrate on the surface of the surface of a workpiece by bringing it into contact with supercritical carbon dioxide and additives in a high-pressure chamber, removing the unnecessary substance on the workpiece, first rinsing and second rinsing are performed under a substantially same pressure with continuous flowing of supercritical carbon dioxide.

Abstract: A method impregnates a material with an agent, by forming an agent-containing phase having a low density and containing an agent and carbon dioxide in a supercritical or subcritical state, and increasing the density of the agent-containing phase. This method can effectively impregnate a material having fine voids or pores with an agent in a short time by using supercritical or subcritical carbon dioxide.

Abstract: A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including CO2, an additive for removing the residues and a co-solvent dissolving the additive in said CO2 at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. An apparatus for implementing the process is also provided.

Abstract: Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.

Abstract: In a high pressure processing method for removing an unnecessary substrate on the surface of the surface of a workpiece by bringing it into contact with supercritical carbon dioxide and additives in a high-pressure chamber, removing the unnecessary substance on the workpiece, first rinsing and second rinsing are performed under a substantially same pressure with continuous flowing of supercritical carbon dioxide.

Abstract: A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including carbon dioxide, an additive for removing the residues and a co-solvent dissolving the additive in said carbon dioxide at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. A composition for removing residues from the microstructure of an object is also provided.

Abstract: Disclosed is a drying method constituted such that, in a case of including the cleaning step using the water-containing solvent, substituting a water on a microstructure by a fluorocarbon type solvent having the water substitution solvent proper value X of from 0.01 to 10 defined by the formula (1) and further substituting by a fluorocarbon type solvent which may be identical with or different from the fluorocarbon type solvent described above, enabling steps up to the drying with liquefied/critical carbon dioxide to be conducted rapidly and to prevent collapse or swell of a photoresist pattern.

Abstract: A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including CO2, an additive for removing the residues and a co-solvent dissolving the additive in said CO2 at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. An apparatus for implementing the process is also provided.