Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.

Abstract: A touch sensor pattern includes: a plurality of detection electrodes; a plurality of lead wires that are connected to the plurality of detection electrodes and a plurality of external connection terminals that are connected to the plurality of lead wires, in which each of the plurality of external connection terminals includes a first fine metal wire having a smaller line width than each of the plurality of lead wires, and an area per unit length of at least a part of each of the plurality of external connection terminals in an extension direction in a plan view is 5.5 times or less an area per unit length of each of the plurality of lead wires in a plan view.

Abstract: A touch sensor pattern includes: a plurality of detection electrodes; a plurality of lead wires that are connected to the plurality of detection electrodes; and a plurality of external connection terminals that are connected to the plurality of lead wires, in which each of the plurality of external connection terminals includes a first fine metal wire having a smaller line width than each of the plurality of lead wires, and an area per unit length of at least a part of each of the plurality of external connection terminals in an extension direction in a plan view is 5.5 times or less an area per unit length of each of the plurality of lead wires in a plan view.

Abstract: A touch sensor film includes: a plurality of detection electrodes; and a plurality of lead wires that are electrically connected to the plurality of detection electrodes, in which each of the plurality of detection electrodes has a mesh structure formed of a conductive thin wire, each of the plurality of detection electrodes includes a first connection terminal disposed at an outermost side of each of the plurality of detection electrodes and a second connection terminal disposed by spacing from the first connection terminal, and each of the plurality of lead wires extends up to the second connection terminal through the first connection terminal and electrically connect the first connection terminal and the second connection terminal to each other.

Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.

Abstract: A manufacturing method for a conductive substrate, with which a conductive substrate including a substrate and a conductive thin wire arranged on the substrate are manufactured, includes in the following order, a step 1 of forming a thin wire containing a metal on the substrate; a step 2 of bringing the thin wire into contact with a solution containing an organic acid; and a step 3 of subjecting the thin wire to a plating treatment to form a conductive thin wire.

Abstract: A touch panel has a transparent substrate, a conductive film; a protective layer which is provided on the conductive film to protect the conductive film; and a display device which has a display unit. the conductive film includes: a transparent substrate; a detecting portion provided on at least one surface of the transparent substrate and is provided with a mesh pattern formed of thin metallic wires; and a peripheral wiring portion provided on at least one surface of the transparent substrate and is electrically connected to the detecting portion, a region where the detecting portion is provided is set as a first region and a region other than the first region is set as a second region in the transparent substrate, a wire width change region is present in at least a part of a boundary region including a boundary line between the first region and the second region.

Abstract: A touch sensor film preventing moire occurring in accordance with deformation of a support is manufactured by performing roll transportation of an elongated transparent support 1 having a thickness smaller than 80 ?m using a plurality of pass rollers 4, 5, and 6; performing annealing treatment with respect to the support 1 at a temperature which is equal to or lower than a temperature obtained by adding 35° C. to a dynamic glass transition temperature of the support 1; and forming a mesh pattern formed of thin metal wires 8a on a surface of the support 1 subjected to the annealing treatment.

Abstract: A touch sensor film preventing moire occurring in accordance with deformation of a support is manufactured by performing roll transportation of an elongated transparent support 1 having a thickness smaller than 80 ?m using a plurality of pass rollers 4, 5, and 6; performing annealing treatment with respect to the support 1 at a temperature which is equal to or lower than a temperature obtained by adding 35° C. to a dynamic glass transition temperature of the support 1; and forming a mesh pattern formed of thin metal wires 8a on a surface of the support 1 subjected to the annealing treatment.

Abstract: A touch sensor film preventing moire occurring in accordance with deformation of a support is manufactured by performing roll transportation of an elongated transparent support 1 having a thickness smaller than 80 ?m using a plurality of pass rollers 4, 5, and 6; performing annealing treatment with respect to the support 1 at a temperature which is equal to or lower than a temperature obtained by adding 35° C. to a dynamic glass transition temperature of the support 1; and forming a mesh pattern formed of thin metal wires 8a on a surface of the support 1 subjected to the annealing treatment.

Abstract: A touch panel has a transparent substrate, a conductive film; a protective layer which is provided on the conductive film to protect the conductive film; and a display device which has a display unit. the conductive film includes: a transparent substrate; a detecting portion provided on at least one surface of the transparent substrate and is provided with a mesh pattern formed of thin metallic wires; and a peripheral wiring portion provided on at least one surface of the transparent substrate and is electrically connected to the detecting portion, a region where the detecting portion is provided is set as a first region and a region other than the first region is set as a second region in the transparent substrate, a wire width change region is present in at least a part of a boundary region including a boundary line between the first region and the second region.

Abstract: A conductive film is installed on the display unit of the display device. The conductive film has a first conductive portion having a first wiring pattern in which a plurality of first openings of congruent convex pentagons constituted by thin metallic wires are arranged, and a second conductive portion disposed in the form of a layer to overlap at least a part of the first conductive portion with a gap therebetween. The second conductive portion has a second wiring pattern in which a plurality of openings constituted by thin metallic wires are provided. When viewed in a lamination direction in which the first conductive portion and the second conductive portion overlap each other, a coefficient of variation of an opening area is less than 52% in an opening group formed by the first wiring pattern of the first conductive portion and the second wiring pattern of the second conductive portion.

Abstract: The touch panel includes an image display device, an adhesive layer formed by curing an ultraviolet-curable adhesive, a touch panel sensor, and a protective substrate in this order, the touch panel sensor includes any one polymer film of a cyclic olefin polymer film and a cyclic olefin copolymer film, an ultraviolet absorption layer is provided between the polymer film and the protective substrate, a transmittance of the ultraviolet absorption layer in a wavelength range of 200 to 340 nm is 5% or less, a transmittance of the ultraviolet absorption layer at a wavelength of 400 nm is 86% or more, and a transmittance of the ultraviolet absorption layer in a wavelength range of 400 to 800 nm is in a range of ±3% or less of the transmittance at a wavelength of 400 nm.

Abstract: A touch sensor film preventing moire occurring in accordance with deformation of a support is manufactured by performing roll transportation of an elongated transparent support 1 having a thickness smaller than 80 ?m using a plurality of pass rollers 4, 5, and 6; performing annealing treatment with respect to the support 1 at a temperature which is equal to or lower than a temperature obtained by adding 35° C. to a dynamic glass transition temperature of the support 1; and forming a mesh pattern formed of thin metal wires 8a on a surface of the support 1 subjected to the annealing treatment.

Abstract: Provided is a heat-shielding material including a substrate; a metal particle-containing layer which contains flat metal particles with a hexagonal shape or a circular shape; and a low refractive index layer with a refractive index of 1.45 or less, in which flat metal particles in which a principle planar surface of the flat metal particles is set with a planar orientation in a range of 0° to ±30° on average with respect to the other surface of the metal particle-containing layer are 50% by number or more of all the flat metal particles, the low refractive index layer is arranged on an uppermost surface on an indoor side when installing the heat-shielding material on a window glass, and the heat-shielding performance, visible light transmittance, and lightfastness in the heat-shielding material are excellent; and a window glass.

Abstract: The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.

Abstract: The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.

Abstract: A silver halide photographic material, includes transparent support having provided thereon a blue-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a red-sensitive silver halide emulsion layer, wherein the average equivalent-sphere diameter of the silver halide grains contained in each layers is 0.35 ?m or less, and an upper layer of the green-sensitive emulsion layer contains a fixed magenta dye, an upper layer or the red-sensitive emulsion layer contains a fixed cyan dye, and the green-sensitive layer contains a pyrazolotriazole, pyrazolopyrrole or 4-thio-pyrazolo-5-one coupler having a specific structure, and an image-recording method uses the photographic material.

Abstract: A stripping liquid for a semiconductor device is provided that includes an aqueous solution containing a quaternary ammonium hydroxide, an oxidizing agent, an alkanolamine, and an alkali metal hydroxide. There is also provided a stripping method that includes a stripping liquid preparation step of preparing the stripping liquid and a stripping step of removing at least one deposit selected from the group consisting of a photoresist, an anti-reflection film, and an etching residue by means of the stripping liquid obtained in the stripping liquid preparation step.

Abstract: A silver halide photographic material, includes transparent support having provided thereon a blue-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a red-sensitive silver halide emulsion layer, wherein the average equivalent-sphere diameter of the silver halide grains contained in each layers is 0.35 ?m or less, and an upper layer of the green-sensitive emulsion layer contains a fixed magenta dye, an upper layer or the red-sensitive emulsion layer contains a fixed cyan dye, and the green-sensitive layer contains a pyrazolotriazole, pyrazolopyrrole or 4-thio-pyrazolo-5-one coupler having a specific structure, and an image-recording method uses the photographic material.