Patents by Inventor Katsuzo Kaminishi

Katsuzo Kaminishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6368515
    Abstract: In a method of manufacturing an ink-jet printer which uses a thin film sheet having adhesive layers respectively formed on the top and bottom sides, as an orifice plate, orifices are formed in the ink-ejecting side of the thin film sheet after the adhesive layer on that ink-ejecting side has been removed. This prevents the formation of the orifices from being adversely affected by any otherwise residual of the adhesive layer and can thus permit accurate formation of orifices of a desired shape. Even if helicon-wave dry etching which ensure fast etching using high-power energy is used to form orifices, therefore, no adhesive layer is thermally expanded to be a residual so that multiple orifices can be formed simultaneously and quickly.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: April 9, 2002
    Assignee: Casio Computer Co., Ltd.
    Inventors: Katsuzo Kaminishi, Junji Shiota, Ichiro Kohno, Kazuyoshi Arai
  • Patent number: 5600157
    Abstract: According to a first aspect of the invention, a light-emitting and light-sensing diode has a doped region with a depth not exceeding 2 .mu.m, for adequate sensitivity, and an impurity concentration of at least 5.times.10.sup.20 atoms/cm.sup.-3, for adequate emission. According to a second aspect of the invention, a light-emitting and light-sensing diode has a doped region with a deep part and a shallow part, and the area of the shallow part is increased to enhance the sensitivity of the diode. This may be done by providing the doped region with a meandering edge, or with one or more interior islands, or by forming the deep and shallow parts separately.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: February 4, 1997
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Ichimatsu Abiko, Yukio Nakamura, Katsuzo Kaminishi, Takatoku Shimizu, Kazuo Tokura, Yasuo Iguti, Hiroshi Furuya, Mituhiko Ogihara, Masumi Taninaka, Mio Chiba
  • Patent number: 4586063
    Abstract: A semiconductor device and a method of manufacturing the same are disclosed. The device comprises a GaAs semiconductor body, a source and a drain region formed in the semiconductor body, a channel region placed between the source and drain regions, a source and a drain electrodes provided by patterning treatment onto the surfaces of the source and drain regions and making ohmic contact thereto, and a gate electrode provided onto the surface of the channel region and consisting of a W-Al alloy.
    Type: Grant
    Filed: April 2, 1984
    Date of Patent: April 29, 1986
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Hiroshi Nakamura, Katsuzo Kaminishi, Toshio Nonaka, Toshimasa Ishida
  • Patent number: 4220874
    Abstract: The high frequency semiconductor device of the present comprises a pair of diodes and a transfer switch. The anode electrodes of the diodes are connected together and the transfer switch operates to connect the cathode electrode of one diode to ground and the cathode electrode of the other diode to a voltage source so as to forwardly bias one diode and reversely bias the other diode. By the selective operation of the transfer switch, the device operates either as a switch for passing high frequency signals or as an attenuator for high frequency signals.
    Type: Grant
    Filed: February 22, 1978
    Date of Patent: September 2, 1980
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Yutaka Iwata, Seiichi Takahashi, Katsuzo Kaminishi