Abstract: Embodiments disclosed herein relate to an apparatus for aligning and securing a transferable substrate support. In one embodiment, a substrate support assembly includes a transferable substrate support. The transferable substrate support includes one or more first separable contact terminals disposed on a surface of the transferable substrate support. Each of the first separable contact terminals includes a detachable connection region and an electrical connection region, and the electrical connection region is coupled to an electrical element disposed within the transferable substrate support. The detachable connection region of each of the one or more first separable contact terminals is configured to detachably connect and disconnect with a corresponding pin of one or more pins of a supporting pedestal by repositioning the supporting pedestal relative to the transferable substrate support in a first direction.

Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing environment of the processing chamber. A textured skin is conformable to the exterior surface. The textured skin has a first side configured to be disposed against the exterior surface and a second side facing away from the first side. The second side has a plurality of engineered features configured to enhance adhesion of material deposited on the textured skin during use of the processing chamber.

Abstract: The present disclosure generally relates to methods of electro-chemically forming yttria or yttrium oxide. The methods may include the optional preparation of a an electrochemical bath, the electrodepositon of yttria or yttrium oxide onto a substrate, removal of solvent form the surface of the substrate, and post treatment of the substrate having the electrodeposited yttria or yttrium oxide thereon.

Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing environment of the processing chamber. A textured skin is conformable to the exterior surface. The textured skin has a first side configured to be disposed against the exterior surface and a second side facing away from the first side. The second side has a plurality of engineered features configured to enhance adhesion of material deposited on the textured skin during use of the processing chamber.

Abstract: The present disclosure generally relates to methods of electro-chemically forming yttria or yttrium oxide. The methods may include the optional preparation of a an electrochemical bath, the electrodepositon of yttria or yttrium oxide onto a substrate, removal of solvent form the surface of the substrate, and post treatment of the substrate having the electrodeposited yttria or yttrium oxide thereon.

Abstract: Implementations described herein generally relate to additive manufacturing. More particularly, implementations disclosed herein relate to formulations and processes for forming articles via a three-dimensional printing (or 3D printing) process. In one implementation, a method of additive manufacturing is provided. The method comprises dispensing a first layer of a feed material over a platen. The feed material includes a powder mixture comprising a plurality of particulates comprising a first material and a plurality of particulates comprising a second material different from the first material. The method further comprises directing a laser beam to heat the feed material at locations specified by data stored in a computer readable medium. The laser beam heats the feed material to a temperature sufficient to fuse at least the second material.

Abstract: Embodiments of the invention generally provide methods for forming a silicon-based photovoltaic device. In one embodiment, a method includes forming a pattern inhibitor layer on a back surface of a substrate, wherein the pattern inhibitor layer covers a first portion of the back surface and a second portion of the back surface remains substantially free of the pattern inhibitor layer. The method further includes forming a passivation layer containing aluminum oxide on the second portion of the back surface and maintaining the pattern inhibitor layer substantially free of the passivation layer during a selective atomic layer deposition (S-ALD) process. Additionally, the method includes removing the pattern inhibitor layer from the back surface to reveal the first portion of the back surface and subsequently forming a contact layer on the first portion of the back surface.

Abstract: Oxidation-resistant ferritic steel alloys for high temperature applications consist essentially of chromium (Cr) in an amount from about 18 to about 25 atom percent, tungsten (W) in an amount from about 0.5 to about 2 atom percent, manganese (Mn) in an amount less than about 0.8 atom percent, aluminum (Al) in an amount less than about 0.2 atom percent, silicon (Si) in an amount less than about 0.1 atom percent, and rare earth metals that includes neodymium (Nd) in an amount from about 0.002 to about 0.2 atom percent with the balance being iron (Fe). Also disclosed herein are solid oxide fuel cells that include separators formed for the oxidation resistant ferritic alloys.

Abstract: Oxidation-resistant ferritic steel alloys for high temperature applications consist essentially of chromium (Cr) in an amount from about 18 to about 25 atom percent, tungsten (W) in an amount from about 0.5 to about 2 atom percent, manganese (Mn) in an amount less than about 0.8 atom percent, aluminum (Al) in an amount less than about 0.2 atom percent, silicon (Si) in an amount less than about 0.1 atom percent, and rare earth metals that includes neodymium (Nd) in an amount from about 0.002 to about 0.2 atom percent with the balance being iron (Fe). Also disclosed herein are solid oxide fuel cells that include separators formed for the oxidation resistant ferritic alloys.

Abstract: Disclosed herein is a composition comprising iron; about 18 to about 30 wt % chromium; up to about 7 wt % tungsten; up to about 1.5 wt % manganese; up to about 1 wt % aluminum; about 0.02 to about 0.1 wt % of a rare earth metal and/or yttrium; wherein the weight percents are based on the total weight of the composition. Disclosed herein too is a method comprising melting together a composition comprising iron; about 18 to about 30 wt % chromium; up to about 7 wt % tungsten; up to about 1.5 wt % manganese; up to about 1 wt % aluminum; about 0.02 to about 0.1 wt % of a rare earth metal and/or yttrium; wherein the weight percents are based on the total weight of the composition; casting the composition; and rolling the composition.

Abstract: A thermally controlled chamber liner comprising a passage having an inlet and outlet adapted to flow a fluid through the one or more fluid passages formed at least partially therein. The chamber liner may comprise a first liner, a second liner or both a first liner and a second liner. The thermally controlled chamber liner maintains a predetermined temperature by running fluid from a temperature controlled, fluid source through the fluid passages. By maintaining a predetermined temperature, deposition of films on the chamber liner is discouraged and particulate generation due to stress cracking of deposited films is minimized.

Abstract: An alloy for an interconnect for a fuel cell is provided. The alloy comprises iron at least about 60 weight percent, chromium in the range of about 15 to about 30 weight percent and tungsten in the range of about 3 to about 4.5 weight percent. The alloy also includes at least one element selected from the group consisting of aluminum, yttrium, zirconium, lanthanum, manganese, molybdenum, nickel, vanadium, tantalum, and titanium.

Abstract: In one aspect, a fuel cell assembly comprises a plurality of fuel cells. Each of the fuel cells includes an anode layer, a cathode layer and an electrolyte interposed therebetween. The fuel cell further comprises a conducting layer in intimate contact with at least one of the cathode layer and the anode layer. The conducting layer is configured to facilitate transport of electrons from the anode layer and the cathode layer.

Abstract: The present invention provides a temperature controlled energy transparent window or electrode used to advantage in a substrate processing system. The invention also provides methods associated with controlling lid temperature during processing and for controlling etching processes. In a preferred embodiment the invention provides a fluid supply system for the lid which allows the fluid to flow through a feedthrough and into and out of a channel formed in the window or electrode. The fluid supply system may also mount the window or electrode to a retaining ring which secures the window or electrode to the chamber. In another aspect the invention provides a bonded window or electrode having a first and second plate having a channel formed in the plates so that when the plates are bonded together they form a channel therein through which a temperature controlling fluid can be flowed. An external control system preferably regulates the temperature of the fluid.

Abstract: A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate for introducing a process gas into the reactor is supported on the chamber enclosure member and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.

Abstract: A thermally controlled chamber liner comprising a passage having an inlet and outlet adapted to flow a fluid through the one or more fluid passages formed at least partially therein. The chamber liner may comprise a first liner, a second liner or both a first liner and a second liner. The thermally controlled chamber liner maintains a predetermined temperature by running fluid from a temperature controlled, fluid source through the fluid passages. By maintaining a predetermined temperature, deposition of films on the chamber liner is discouraged and particulate generation due to stress cracking of deposited films is minimized.

Abstract: A substrate support assembly 30 comprises a substrate support 38 and a collar 130 which may comprise at least one slit 150. The slit allows for thermal expansion compensation in the support assembly 30. The collar 130 may, for example, protect the dielectric 45 from erosion in a process chamber 25. In one version, the collar 130 comprises a clamping ring 200 on the dielectric 45.