Patents by Inventor Kaustav Banerjee

Kaustav Banerjee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11976369
    Abstract: In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion material on the wafer. A heatable bottom substrate disk includes a first heating mechanism. The heatable bottom substrate disk is fixed and heatable to a specified temperature. The wafer is placed on the heatable bottom substrate disk. A heatable top substrate disk comprising a second heating mechanism. The heatable top substrate disk is configured to move up and down along an x axis and an x prime axis to apply a mechanical pressure to the wafer on the heatable bottom substrate disk. While the heatable top substrate disk applies the mechanical pressure a chamber pressure is maintained at a specified low value.
    Type: Grant
    Filed: July 5, 2022
    Date of Patent: May 7, 2024
    Assignee: DESTINATION 2D INC.
    Inventors: Kaustav Banerjee, Ravi Iyengar, Satish Sundar, Nalin Rupesinghe
  • Publication number: 20240014071
    Abstract: An MLG (multilayer graphene) device layer structure is connected with a via. The structure includes an M1 MLG interconnect device layer upon a dielectric layer. Interlayer dielectric isolates the M1 MLG interconnect device layer. An M2 MLG interconnect device layer is upon the interlayer dielectric. A metal via penetrates through the M2 MLG interconnect device layer, the interlayer dielectric and the M1 MLG interconnect device layer and makes edge contact throughout the thickness of both M1 MLG and M2 MLG layers. A method diffuses carbon from a solid phase graphene precursor through a catalyst layer to deposit MLG on a dielectric or metal layer via application of mechanical pressure at a diffusion temperature to form MLG layers.
    Type: Application
    Filed: December 1, 2021
    Publication date: January 11, 2024
    Inventors: Kaustav Banerjee, Junkai Jiang, Kunjesh Agashiwala
  • Publication number: 20230313358
    Abstract: In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion material on the wafer. A heatable bottom substrate disk includes a first heating mechanism. The heatable bottom substrate disk is fixed and heatable to a specified temperature. The wafer is placed on the heatable bottom substrate disk. A heatable top substrate disk comprising a second heating mechanism. The heatable top substrate disk is configured to move up and down along an x axis and an x prime axis to apply a mechanical pressure to the wafer on the heatable bottom substrate disk. While the heatable top substrate disk applies the mechanical pressure a chamber pressure is maintained at a specified low value.
    Type: Application
    Filed: June 9, 2023
    Publication date: October 5, 2023
    Inventors: Kaustav BANERJEE, Ravi IYENGAR, Satish SUNDAR, Nalin RUPESINGHE
  • Publication number: 20230124085
    Abstract: A hybrid switch and memory cell includes a transistor device that has an atomically-thin semiconductor material channel, source/drain electrodes, and gate dielectric. The cell includes a resistive-random-access-memory having a thin conductive edge and a 2D insulator layer over the thin conductive edge, wherein the 2D insulator layer extends over the semiconductor channel and serves as the gate dielectric in the transistor device.
    Type: Application
    Filed: October 13, 2022
    Publication date: April 20, 2023
    Inventors: Kaustav Banerjee, Chao-Hui Yeh, Wei Cao, Arnab Pal
  • Patent number: 11631173
    Abstract: A method for training a convolutional neural network comprises sliding a first, a second and a third window in a predefined path simultaneously on each training image of a training data set, a binary image containing a highlighted region of interest of the each training image, and a labeled image containing a plurality of tags representing one or more features of interest of the each training image. A target matrix is obtained for each sample of the labeled image that lies within the highlighted region of interest. The target matrix is a probabilistic distribution of the plurality of tags that is based on a proportion of existence of a feature of interest represented by a tag in the each sample. The CNN is trained to recognize each sample to contain the proportion of the at least one feature of interest based on the target matrix of the each sample.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: April 18, 2023
    Inventors: Abhishek Biswas, Samudra Neel Saha, Kaustav Banerjee
  • Publication number: 20230105855
    Abstract: In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion material on the wafer. A heatable bottom substrate disk includes a first heating mechanism. The heatable bottom substrate disk is fixed and heatable to a specified temperature. The wafer is placed on the heatable bottom substrate disk. A heatable top substrate disk comprising a second heating mechanism. The heatable top substrate disk is configured to move up and down along an x axis and an x prime axis to apply a mechanical pressure to the wafer on the heatable bottom substrate disk. While the heatable top substrate disk applies the mechanical pressure a chamber pressure is maintained at a specified low value.
    Type: Application
    Filed: July 5, 2022
    Publication date: April 6, 2023
    Inventors: KAUSTAV BANERJEE, RAVI IYENGAR, SATISH SUNDAR, NALIN RUPESINGHE
  • Publication number: 20230008834
    Abstract: In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion material on the wafer. A heatable bottom substrate disk includes a first heating mechanism. The heatable bottom substrate disk is fixed and heatable to a specified temperature. The wafer is placed on the heatable bottom substrate disk. A heatable top substrate disk comprising a second heating mechanism. The heatable top substrate disk is configured to move up and down along an x axis and an x prime axis to apply a mechanical pressure to the wafer on the heatable bottom substrate disk. While the heatable top substrate disk applies the mechanical pressure a chamber pressure is maintained at a specified low value.
    Type: Application
    Filed: July 12, 2022
    Publication date: January 12, 2023
    Inventors: KAUSTAV BANERJEE, RAVI IYENGAR, NALIN RUPESINGHE, SATISH SUNDAR
  • Publication number: 20210065364
    Abstract: A method for training a convolutional neural network comprises sliding a first, a second and a third window in a predefined path simultaneously on each training image of a training data set, a binary image containing a highlighted region of interest of the each training image, and a labeled image containing a plurality of tags representing one or more features of interest of the each training image. A target matrix is obtained for each sample of the labeled image that lies within the highlighted region of interest. The target matrix is a probabilistic distribution of the plurality of tags that is based on a proportion of existence of a feature of interest represented by a tag in the each sample. The CNN is trained to recognize each sample to contain the proportion of the at least one feature of interest based on the target matrix of the each sample.
    Type: Application
    Filed: May 22, 2018
    Publication date: March 4, 2021
    Inventors: Abhishek Biswas, Samudra Neel Saha, Kaustav Banerjee