Patents by Inventor Kay Fujimori

Kay Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7175757
    Abstract: In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.
    Type: Grant
    Filed: September 25, 2003
    Date of Patent: February 13, 2007
    Assignee: Fujimori Technical Laboratory Inc.
    Inventors: Yuki Hamada, Kay Fujimori
  • Publication number: 20050109651
    Abstract: A wrapping member for wrapping a glass substrate to be used in production of a FPD such as a liquid crystal display and a plasma display and a method of transferring a glass substrate for FPD, in which the wrapping member for wrapping either one or both of the surfaces of the glass substrate for FPD before transfer is made of a water-soluble film material dissolved in water, so that preprocessing of each of the glass substrates in the production line of the FPD may be simplified and so that the outer shape of a package formed by packing the glass substrates in a transfer box and a lid for closing the transfer box is reduced to an extent enabling a plurality of the glass substrates to be transferred at a high efficiency.
    Type: Application
    Filed: October 29, 2004
    Publication date: May 26, 2005
    Applicant: Fujimori Technical Laboratory Inc.
    Inventor: Kay Fujimori
  • Publication number: 20050067334
    Abstract: In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.
    Type: Application
    Filed: September 25, 2003
    Publication date: March 31, 2005
    Applicant: Fujimori Technical Laboratory Inc.
    Inventors: Yuki Hamada, Kay Fujimori