Patents by Inventor Kayla Elise Ivey

Kayla Elise Ivey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ALCOHOL CONTAINING NON-ANTIMICROBIAL CLEANSING COMPOSITION
    Publication number: 20230248625
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Application
    Filed: April 17, 2023
    Publication date: August 10, 2023
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • Alcohol containing non-antimicrobial cleansing composition
    Patent number: 11660258
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: May 30, 2023
    Assignee: GOJO Industries, Inc.
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • Alcohol containing non-antimicrobial cleansing composition
    Patent number: 11633334
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Grant
    Filed: November 19, 2021
    Date of Patent: April 25, 2023
    Assignee: GOJO Industries, Inc.
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • ALCOHOL CONTAINING NON-ANTIMICROBIAL CLEANSING COMPOSITION
    Publication number: 20220079851
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Application
    Filed: November 19, 2021
    Publication date: March 17, 2022
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • ALCOHOL CONTAINING NON-ANTIMICROBIAL CLEANSING COMPOSITION
    Publication number: 20220062137
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Application
    Filed: October 22, 2021
    Publication date: March 3, 2022
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • Alcohol containing non-antimicrobial cleansing composition
    Patent number: 11185483
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: November 30, 2021
    Assignee: GOJO Industries, Inc.
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh
  • ALCOHOL CONTAINING NON-ANTIMICROBIAL CLEANSING COMPOSITION
    Publication number: 20180311128
    Abstract: A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C1-C8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.
    Type: Application
    Filed: May 1, 2018
    Publication date: November 1, 2018
    Inventors: Amanda Jo Copeland, Venkatesan Padyachi, James Bingham, Nick Ciavarella, Kayla Elise Ivey, Carey Jaros, Daniel Willis, Jessica Rae Tittl, Srini Venkatesh