Abstract: According to one aspect of the technique, there is provided a technique, including: a process chamber in which a substrate is processed; a memory that stores recipe information describing a procedure that executes the processing of the substrate, process data accumulated during the processing of a plurality of substrates, variation quality data calculated from the process data, and comparison data to be compared with the variation quality data; a monitor configured to monitor the process data; an analyzer configured to compare the variation quality data with the comparison data to obtain a reproduction index indicating a reproducibility of the comparison data, and calculate a correction value of setting information included in the recipe information when the reproduction index is smaller than a predetermined value; and a controller configured to be capable of correcting the setting information included in the recipe information with the correction value.

Abstract: A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Abstract: There is provided a technique, which includes: at least one substrate processing apparatus including a controller configured to be capable of controlling processing of a substrate according to a recipe including at least one step and a first memory configured to be capable of storing data of the at least one substrate processing apparatus that is reported during the processing of the substrate; and a data manager connected to the at least one substrate processing apparatus, configured to acquire the data, and configured to be capable of specifying the number of the at least one step that is included in the data to be acquired such that the data falls within a predefined data acquirable range.

Abstract: There is provided a configuration that includes: a main controller configured to, when executing a process recipe including a specific step of executing a sub-recipe, control a process controller to execute the sub-recipe a predetermined number of times to perform a predetermined process to a substrate: and a device management controller configured to collect device data during an execution of the process, recipe and store the device data in a storage part. The device management controller is further configured to: search the storage part; acquire the device data in a designated step among respective steps constituting the sub-recipe for a number of times of execution of the sub-recipe; calculate a first standard deviation of the device data acquired for the number of times of execution; and compare the first standard deviation with a threshold value and generate an alarm when the first standard deviation exceeds the threshold value.

Abstract: According to one aspect of the technique, there is provided a technique, including: a process chamber in which a substrate is processed; a memory that stores recipe information describing a procedure that executes the processing of the substrate, process data accumulated during the processing of a plurality of substrates, variation quality data calculated from the process data, and comparison data to be compared with the variation quality data; a monitor configured to monitor the process data; an analyzer configured to compare the variation quality data with the comparison data to obtain a reproduction index indicating a reproducibility of the comparison data, and calculate a correction value of setting information included in the recipe information when the reproduction index is smaller than a predetermined value; and a controller configured to be capable of correcting the setting information included in the recipe information with the correction value.

Abstract: There is provided a technique that includes: a first storage configured to store request data from a terminal apparatus; a second storage configured to store information from a processing apparatus; and a controller configured to be capable of searching one of the first storage and the second storage based on the received request data and acquiring information of the processing apparatus corresponding to contents of the request data by using at least one selected from the group of the first storage and the second storage.

Abstract: According to one aspect of the technique, there is provided a technique, including: a process chamber in which a substrate is processed; a memory that stores recipe information describing a procedure that executes the processing of the substrate, process data accumulated during the processing of a plurality of substrates, variation quality data calculated from the process data, and comparison data to be compared with the variation quality data; a monitor configured to monitor the process data; an analyzer configured to compare the variation quality data with the comparison data to obtain a reproduction index indicating a reproducibility of the comparison data, and calculate a correction value of setting information included in the recipe information when the reproduction index is smaller than a predetermined value; and a controller configured to be capable of correcting the setting information included in the recipe information with the correction value.

Abstract: A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Abstract: A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Abstract: A substrate processing apparatus includes an operating unit for transmitting apparatus data to a memory, the apparatus data being required while a recipe for processing a substrate is executed; and a data matching unit for comparing the apparatus data stored in the memory. When an error occurs in the substrate processing apparatus, the operating unit transmits data representing the error to the data matching unit. The data matching unit includes: a selection unit for selecting first apparatus data which was acquired when the recipe was executed without an occurrence of the error, and stored in the memory; an acquisition unit for acquiring first and second apparatus data from the memory, the first apparatus data being acquired when an error did not occur and the second apparatus data being acquired when an error occurred; and a calculation unit for comparing the first and second apparatus data and calculating a difference therebetween.

Abstract: There is provided a configuration that includes a device-status-monitoring controller that stores, in a storage section, device data generated by the apparatus; an analysis-support controller that acquires the device data related to abnormality analysis information from the storage section based on basic information that includes: information that defines an abnormal event, at least one of the device data corresponding to the abnormal event, and step information indicating a step where the at least one of the device data is generated; and recipe-specific information that includes at least a recipe name; and a display device that displays the device data related to the abnormality analysis information in a manner that goes back to a past time from a time when a latest recipe specified by the recipe name is executed.

Abstract: There is provided a technique for detecting a fault of a device from an error in device data. According to the technique described herein, there is provided a substrate processing apparatus including: a pipe heater configured to heat a gas pipe; a temperature detecting unit provided at the pipe heater and configured to detect a temperature of the gas pipe; a control unit configured to control the pipe heater based on device data representing the temperature of the gas pipe measured by the temperature detecting unit by executing a process control program to adjust an electrical power applied to the pipe heater; a memory unit configured to store a monitored item table; and a device status monitoring unit configured to execute a device status monitoring program.

Abstract: There is provided a configuration that includes: a main controller configured to, when executing a process recipe including a specific step of executing a sub-recipe, control a process controller to execute the sub-recipe a predetermined number of times to perform a predetermined process to a substrate: and a device management controller configured to collect device data during an execution of the process, recipe and store the device data in a storage part. The device management controller is further configured to: search the storage part; acquire the device data in a designated step among respective steps constituting the sub-recipe for a number of times of execution of the sub-recipe; calculate a first standard deviation of the device data acquired for the number of times of execution; and compare he first standard deviation with a threshold value and generate an alarm when the first standard deviation exceeds the threshold value.

Abstract: A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Abstract: A management apparatus includes: a manipulation & display unit including a user interface for selecting a reference device information, and configured to display: a difference between the device information obtained from the substrate processing device and the reference device information selected via the user interface; a content of the reference device information; and a content of the device information, and further configured to receive a command for modifying the device information; and a control unit configured to modify the device information based on the command received from the manipulation & display unit and configured to transmit a modified device information to the substrate processing device.

Abstract: There is provided a configuration that includes a device-status-monitoring controller that stores, in a storage section, device data generated by the apparatus; an analysis-support controller that acquires the device data related to abnormality analysis information from the storage section based on basic information that includes: information that defines an abnormal event, at least one of the device data corresponding to the abnormal event, and step information indicating a step where the at least one of the device data is generated; and recipe-specific information that includes at least a recipe name; and a display device that displays the device data related to the abnormality analysis information in a manner that goes back to a past time from a time when a latest recipe specified by the recipe name is executed.

Abstract: There is provided a technique for detecting a fault of a device from an error in device data. According to the technique described herein, there is provided a substrate processing apparatus including: a pipe heater configured to heat a gas pipe; a temperature detecting unit provided at the pipe heater and configured to detect a temperature of the gas pipe; a control unit configured to control the pipe heater based on device data representing the temperature of the gas pipe measured by the temperature detecting unit by executing a process control program to adjust an electrical power applied to the pipe heater; a memory unit configured to store a monitored item table; and a device status monitoring unit configured to execute a device status monitoring program.

Abstract: A substrate processing apparatus includes an operating unit for transmitting apparatus data to a memory, the apparatus data being required while a recipe for processing a substrate is executed; and a data matching unit for comparing the apparatus data stored in the memory. When an error occurs in the substrate processing apparatus, the operating unit transmits data representing the error to the data matching unit. The data matching unit includes: a selection unit for selecting first apparatus data which was acquired when the recipe was executed without an occurrence of the error, and stored in the memory; an acquisition unit for acquiring first and second apparatus data from the memory, the first apparatus data being acquired when an error did not occur and the second apparatus data being acquired when an error occurred; and a calculation unit for comparing the first and second apparatus data and calculating a difference therebetween.

Abstract: A substrate processing apparatus includes a device management controller including a parts management control part configured to monitor the state of parts constituting the apparatus, a device state monitoring control part configured to monitor integrity of device data obtained from an operation state of the parts constituting the apparatus, and a data matching control part configured to monitor facility data provided from a factory facility to the apparatus. The device management controller is configured to derive information evaluating the operation state of the apparatus based on a plurality of monitoring result data selected from a group consisting of maintenance timing monitoring result data acquired by the parts management control part, device state monitoring result data acquired by the device state monitoring control part, and utility monitoring result data acquired by the data matching control part.

Abstract: A management device includes a measurement data storage unit configured to store measurement data transmitted from a substrate processing apparatus; a setting unit configured to set an item of the measurement data as a determination target, reference data, and upper and lower limit values with respect to the reference data; a counting unit configured to count the number of times that the value of the measurement data corresponding to the item exceeds the upper and lower limit values; and a determining unit configured to determine that the measurement data as a determination target is abnormal, when the counted number exceeds a predetermined value.