Abstract: The present invention provides a method for on-axis visualization of a target placed in a photon beam, the method comprising: placing the target in the path of the photon beam; selecting a mirror with an external reflecting surface; placing the mirror on a mirror support so that the surface faces the target; placing a reflective microscope so as to collect photons emanating from the target that have been reflected by said surface; counting and analyzing photons collected by the microscope with a CCD camera; and storing and analyzing data collected by the camera.

Abstract: The present invention provides a method for on-axis visualization of a target placed in a photon beam, the method comprising: placing the target in the path of the photon beam; selecting a mirror with an external reflecting surface; placing the mirror on a mirror support so that the surface faces the target; placing a reflective microscope so as to collect photons emanating from the target that have been reflected by said surface; counting and analyzing photons collected by the microscope with a CCD camera; and storing and analyzing data collected by the camera.

Abstract: A device for creating nano-sized features on a substrate having an extreme ultra violet source, and a mask positioned between the extreme ultra violet source and a photosentive material coated substrate for limiting the wavelengths transmitted to the substrate, thereby forming nano-sized features on the substrate. A method of forming nano-sized features on a substrate by inserting a pre-designed mask between an extreme ultra violet source and a photosensitive material coated substrate, and illuminating the extreme ultra violet source through the mask onto the substrate, thereby etching the nano-features onto the substrate.