Abstract: A transparent conductive film, includes: an organic polymer film substrate; at least one undercoat layer formed on the organic polymer film substrate by a dry process; and a transparent conductive coating provided on at least one surface of the organic polymer film substrate with the undercoat layer interposed therebetween, wherein the transparent conductive coating is a crystalline coating of an indium-based complex oxide having a content of a tetravalent metal element oxide of 7 to 15% by weight as calculated by the formula {(the amount of the tetravalent metal element oxide)/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100(%), the transparent conductive coating has a thickness in the range of 10 to 40 nm, and the transparent conductive coating has a specific resistance of 1.3×10?4 to 2.8×10?4 ?·cm.

Abstract: Disclosed is a manufacturing method for a transparent electroconductive film having excellent light-transmitting properties and low specific resistance. The present invention provides a method of manufacturing a transparent electroconductive film which comprises a film substrate and a crystallized indium tin oxide layer formed on the film substrate. The method comprises: a step of placing the film substrate in a sputtering apparatus using an indium tin oxide as a target material, and depositing indium tin oxide including amorphous parts on the film substrate by a magnetron sputtering process in which a horizontal magnetic field on the target material is set to 50 mT or more; and a step of, after the step of depositing indium tin oxide including amorphous parts, subjecting the indium tin oxide including amorphous parts to a heating treatment to thereby crystallize the indium tin oxide including amorphous parts to form the crystallized indium tin oxide layer.

Abstract: A transparent conductive film includes a film base, and a polycrystalline layer of indium tin oxide formed on the film base. The polycrystalline layer has a gradient of a density of tin oxide in a thickness direction thereof. A maximum value of the density of tin oxide in the thickness direction of the polycrystalline layer is 6 wt % to 12 wt %. The polycrystalline layer has a thickness of 10 nm to 35 nm. An average value of maximum sizes of crystal grains composing the polycrystalline layer is 380 nm to 730 nm.

Abstract: A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V·S, and a carrier density of from 2×1020/cm3 to 6×1020/cm3.

Abstract: There is provided an infrared ray reflective substrate including an infrared ray reflective layer, a protective layer disposed on a surface of the infrared ray reflective layer and a transparent substrate that supports the infrared ray reflective layer from a rear surface side thereof, wherein the protective layer is formed from a polycycloolefin layer.

Abstract: A dye-sensitized solar cell of a polymer resin type is provided, which is excellent in sealability. A counter electrode substrate provided with an electrically conductive transparent electrode layer and a working electrode substrate provided with an electrically conductive transparent electrode layer are opposed to each other with the electrode layers facing inward. A space defined between the substrates is sealed with a seal member disposed along peripheries of inner surfaces of the substrates. An electrolyte solution is filled in the sealed space. The substrates are each made of a polymer resin material. Inorganic layers are provided between the substrates and the electrode layers. The seal member is composed of a material obtained by curing a photopolymerizable composition essentially comprising a specific hydrogenated elastomer derivative. The inorganic layers each have a portion coated with a (meth)acryloxyalkylsilane silane coupling agent in contact with the seal member.

Abstract: A transparent conductive film comprising: an organic polymer film substrate; an Al2O3 thin film formed on the organic polymer film substrate; and a ZnO-based thin film that is formed on the Al2O3 thin film and comprises ZnO doped with at least one of Ga and Al. The transparent conductive film has a low resistance value, even when the thickness of the ZnO-based thin film is reduced (particularly to about 150 nm or less), and shows a low rate of resistance change even in a hot and humid environment.

Abstract: the transparent conductive film of the present invention is a transparent conductive film, comprising: an organic polymer film substrate; a first oxide thin film with a high visible-light transmittance formed on the organic polymer film substrate; and a ZnO-based transparent conductive thin film formed on the first oxide thin film, wherein the first oxide thin film has an oxygen content corresponding to 60 to 90% of the stoichiometric value before the ZnO-based transparent conductive thin film is formed. The transparent conductive film exhibits low resistance even when the ZnO-based transparent conductive thin film is relatively thin (particularly 100 nm or less in thickness), and has a low rate of change in resistance value even under a humidification and heating environment.

Abstract: A transparent conductive film comprising: an organic polymer film substrate; an Al2O3 thin film formed on the organic polymer film substrate; and a ZnO-based thin film that is formed on the Al2O3 thin film and comprises ZnO doped with at least one of Ga and Al. The transparent conductive film has a low resistance value, even when the thickness of the ZnO-based thin film is reduced (particularly to about 150 nm or less), and shows a low rate of resistance change even in a hot and humid environment.

Abstract: A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V·S, and a carrier density of from 2×1020/cm3 to 6×1020/cm3.

Abstract: A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In—Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V-S, and a carrier density of from 2×1020/cm3 to 6×1020/cm3.

Abstract: In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film units consisting of a high-refractive-index thin film and a silver transparent conductive thin film. When the silver transparent conductive thin films are deposited by a vacuum dry process, the temperature T(K) of the transparent substrate at the time of film deposition is set to be in a range 340?T?410, whereby the transparent laminate having a standard deviation of visible light transmittance which is not larger than 5% in a wave range of from 450 to 650 nm can be produced.

Abstract: A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V·S, and a carrier density of from 2×1020/cm3 to 6×1020/cm3.

Abstract: A transparent laminate is constituted by a transparent substrate, a low refractive index transparent thin film formed on a surface of the transparent substrate, between three and five combination layers laminated successively on a surface of the first low refractive index transparent thin film, another high refractive index transparent thin film formed on a surface of the combination layers, and an outermost layer. The combination layers has high refractive index transparent thin films and silver type transparent electrical conductor thin films, each combination layer having one high refractive index transparent thin film and one silver type transparent electrical conductor thin film. The outermost layer is stuck through a transparent adhesive agent layer onto a surface of the high refractive index transparent thin film farthest from the transparent substrate.

Abstract: A method of sticking a transparent electromagnetic wave shield film onto a front surface of a plasma display panel is disclosed. The plasma display panel has a level difference in a thickness direction thereof. The plasma display panel is mounted on an attachment adapted to an outer shape of the plasma display. The level difference is eliminated apparently, and the transparent electromagnetic wave shield film is stuck onto the front surface of the plasma display panel.

Abstract: A filter for a plasma display panel wherein the filter has a laminated body, as a constituent element, in which n units (3≦n≦10) each consisting of a metallic oxide film and a silver transparent electric-conductor film are successively laminated unit after unit on a surface of a transparent film base, and a metallic oxide film is formed on the units as an outermost layer of the laminated body, each metallic oxide film having optical transparency of a refractive index of 1.5 to 2.7, each silver transparent electric-conductor film having a thickness set substantially to a fixed value in a range of from 5 to 20 nm, each of the metallic oxide film put directly on the surface of the base and the outermost-layer metallic oxide film having a thickness 5/2 (1±0.

Abstract: In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film units consisting of a high-refractive-index thin film and a silver transparent conductive thin film. When the silver transparent conductive thin films are deposited by a vacuum dry process, the temperature T(K) of the transparent substrate at the time of film deposition is set to be in a range 340≦T≦410, whereby the transparent laminate having a standard deviation of visible light transmittance which is not larger than 5% in a wave range of from 450 to 650 nm can be produced.

Abstract: There is provided a transparent laminate which comprises a transparent substrate, and four to five units each of a high refractive index transparent film and a silver type transparent electrical conductor film. The units are laminated successively on a surface of the transparent substrate, and one high refractive index transparent film is further disposed as an outermost layer. The high refractive index transparent film is an optically transparent film having a refractive index of from 1.5 to 2.7. The silver type transparent electrical conductor film has a thickness in a range of from 5 to 20 nm. A thickness of the silver type transparent electrical conductor film disposed in a first layer with reference to the transparent substrate is substantially equal to a thickness of the silver type transparent electrical conductor film in an outermost layer with reference to the transparent substrate. A thickness of the silver type transparent electrical conductor film in each of other layers is 3/2(1±0.

Abstract: A transparent laminate is constituted as follows. A low refractive index transparent film is formed on a surface of the transparent substrate. n units (3≦n≦5) of high refractive index transparent films and silver type transparent electrical are laminated successively on a surface of the low refractive index transparent film. Another high refractive index transparent film is formed on a surface of the n units, and another low refractive index transparent film is formed on a surface of the other high refractive index transparent film. Each of the low refractive index transparent films is an optically transparent film having a refractive index nL in a range of from 1.3 to 1.6 and each of the high refractive index transparent films is an optically transparent film having a refractive index nH in a range of from 1.9 to 2.5.

Abstract: A polarizing plate is disclosed, comprising a polarizing film and a protective layer bonded through an adhesive layer to at least one surface of the polarizing film, wherein the protective layer is a polyester film in which the minimum or maximum refractive index in a direction in parallel with the plane of the film is nearly equal to that in the direction of the film thickness and the retardation is at least 10 .mu.m. On this polarizing plate, colored interference fringes are not formed at all even if it is looked at from any direction. Thus, the polarizing plate is suitable for use in the circumstance that it is exposed to the air, or in a display wherein a liquid crystal is used.